Chemical liquid and chemical liquid storage body

ABSTRACT

The present invention provides a chemical liquid having excellent defect suppressing properties. The present invention further provides a chemical liquid storage body containing the chemical liquid. The chemical liquid of the present invention is a chemical liquid containing a compound other than an alkane and an alkene, and one or more organic solvents selected from the group consisting of decane and undecane, in which the chemical liquid further contains one or more organic components selected from the group consisting of alkanes having 12 to 50 carbon atoms and alkenes having 12 to 50 carbon atoms, and a content of the organic component is 0.10 to 1,000,000 mass ppt with respect to a total mass of the chemical liquid.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a Continuation of PCT International Application No.PCT/JP2019/026947 filed on Jul. 8, 2019, which claims priority under 35U.S.C. § 119(a) to Japanese Patent Application No. 2018-131747 filed onJul. 11, 2018. Each of the above applications is hereby expresslyincorporated by reference, in its entirety, into the presentapplication.

BACKGROUND OF THE INVENTION 1. Field of the Invention

The present invention relates to a chemical liquid and a chemical liquidstorage body.

2. Description of the Related Art

In a case where semiconductor devices are manufactured by a wiringforming process including photolithography, as a prewet solution, aresist solution (resist composition), a developer, a rinsing solution, apeeling solution, a chemical mechanical polishing (CMP) slurry, awashing solution used after CMP, or the like, or as a diluent thereof, achemical liquid containing water and/or an organic solvent is used.

In recent years, advances in photolithography technology have led to theminiaturization of patterns. As a method of miniaturizing a pattern, amethod of shortening the wavelength of the exposure light source isused, and as the exposure light source, ultraviolet rays, KrF excimerlaser, ArF excimer laser, etc., which have been conventionally used, arereplaced with a shorter wavelength. Attempts have been made to form apattern using a certain EUV (extreme ultraviolet ray) or the like.

With the miniaturization of the pattern, the chemical liquid used inthis process is required to have further defect suppressing properties.

As a conventional chemical liquid used for pattern formation, JP2015-084122A discloses “a method for manufacturing an organic treatmentliquid for patterning a chemically amplified resist film capable ofreducing the generation of particles in the pattern formation technique(paragraph “0010”)”.

SUMMARY OF THE INVENTION

As a result of examining an organic treatment liquid (chemical liquid)for patterning manufactured by the manufacturing method, the inventorsof the present invention found room for improvement in defectsuppressing properties.

It is therefore an object of the present invention to provide a chemicalliquid having excellent defect suppressing properties. Another object isto provide a chemical liquid storage body containing the chemicalliquid.

In order to achieve the aforementioned objects, the inventors of thepresent invention carried out an intensive examination, and have foundthat the objects can be achieved by the following constitution.

[1]

A chemical liquid containing a compound other than an alkane and analkene, and one or more organic solvents selected from the groupconsisting of decane and undecane,

wherein the chemical liquid further contains one or more organiccomponents selected from the group consisting of alkanes having 12 to 50carbon atoms and alkenes having 12 to 50 carbon atoms, and

a content of the organic component is 0.10 to 1,000,000 mass ppt withrespect to a total mass of the chemical liquid.

[2]

The chemical liquid according to [1], wherein the organic componentcontained in the chemical liquid is two or more organic components.

[3]

The chemical liquid according to [1] or [2], wherein the chemical liquidcontains both one or more of the alkanes having 12 to 50 carbon atomsand one or more of the alkenes having 12 to 50 carbon atoms.

[4]

The chemical liquid according to any one of [1] to [3], wherein theorganic solvent has a Hansen solubility parameter distance to eicoseneof 3 to 20 MPa^(0.5).

[5]

The chemical liquid according to any one of [1] to [3], wherein theorganic solvent contained in the chemical liquid has a content of anorganic solvent having a Hansen solubility parameter distance toeicosene of 3 to 20 MPa^(0.5) of 20% to 80% by mass with respect to thetotal mass of the chemical liquid, and

the organic solvent contained in the chemical liquid has a content of anorganic solvent having a Hansen solubility parameter distance toeicosene of not 3 to 20 MPa^(0.5) of 20% to 80% by mass with respect tothe total mass of the chemical liquid.

[6]

The chemical liquid according to any one of [1] to [5], wherein theorganic solvent contained in the chemical liquid is one or more organicsolvents selected from the group consisting of propylene glycolmonomethyl ether acetate, propylene glycol monomethyl ether,cyclohexanone, ethyl lactate, propylene carbonate, isopropanol,4-methyl-2-pentanol, butyl acetate, methyl methoxypropionate, propyleneglycol monoethyl ether, propylene glycol monopropyl ether,cyclopentanone, γ-butyrolactone, diisoamyl ether, isoamyl acetate,dimethyl sulfoxide, N-methylpyrrolidone, diethylene glycol, ethyleneglycol, dipropylene glycol, propylene glycol, ethylene carbonate,sulfolane, cycloheptanone, 2-heptanone, butyl butyrate, isobutylisobutyrate, pentyl propionate, isopentyl propionate, ethylcyclohexane,mesitylene, decane, undecane, 3,7-dimethyl-3-octanol, 2-ethyl-1-hexanol,1-octanol, 2-octanol, ethyl acetoacetate, dimethyl malonate, methylpyruvate, and dimethyl oxalate.

[7]

The chemical liquid according to any one of [1] to [6], wherein acontent of the organic component is 1 to 150 mass ppt with respect tothe total mass of the chemical liquid.

[8]

The chemical liquid according to any one of [1] to [7], furthercontaining a metal component, wherein a content of the metal componentis 0.01 to 500 mass ppt with respect to the total mass of the chemicalliquid.

[9]

The chemical liquid according to any one of [1] to [7], furthercontaining a metal component, wherein a mass ratio of the content of theorganic component to a content of the metal component is 0.001 to 10000.

[10]

The chemical liquid according to [8] or [9], wherein a mass ratio of thecontent of the organic component to the content of the metal componentis 0.05 to 2000.

[11]

The chemical liquid according to any one of [8] to [10], wherein a massratio of the content of the organic component to the content of themetal component is 0.1 to 100.

[12]

The chemical liquid according to any one of [8] to [11], wherein themetal component contains metal particles and metal ions.

[13]

The chemical liquid according to [12], wherein a mass ratio of thecontent of the organic component to a content of the metal particles is0.01 to 1000.

[14]

The chemical liquid according to [12] or [13], wherein the mass ratio ofthe content of the organic component to a content of the metal particlesis 0.1 to 10.

[15]

The chemical liquid according to any one of [12] to [14], wherein a massratio of the content of the organic component to a content of the metalparticles is 0.28 to 3.5.

[16]

The chemical liquid according to any one of [12] to [15], wherein a massratio of the content of the organic component to a content of the metalions is 0.01 to 1000.

[17]

The chemical liquid according to any one of [12] to [16], wherein a massratio of the content of the organic component to a content of the metalions is 0.1 to 5.

[18]

The chemical liquid according to any one of [12] to [17], wherein a massratio of the content of the organic component to a content of the metalions is 0.2 to 1.3.

[19]

The chemical liquid according to any one of [1] to [18], wherein theorganic component contained in the chemical liquid is two or moreorganic components, and one or more of the two or more organiccomponents have a boiling point of 380° C. or higher.

[20]

The chemical liquid according to any one of [1] to [19], wherein theorganic component contained in the chemical liquid is two or moreorganic components selected from the group consisting of alkanes having12 to 50 carbon atoms,

among the two or more alkanes having 12 to 50 carbon atoms, any one ofalkanes having 16 to 34 carbon atoms has a largest mass content.

[21]

A chemical liquid storage body comprising a container and the chemicalliquid according to any one of [1] to [20] stored in the container,

wherein a liquid contact portion in contact with the chemical liquid inthe container is an electropolished stainless steel or a fluororesin.

[22]

The chemical liquid storage body according to [21], wherein a voidvolume calculated by the expression (1) is 2% to 50% by volume:

void volume={1−(volume of the chemical liquid in the container/volume ofthe container)}×100.  Expression (1):

According to the present invention, it is possible to provide a chemicalliquid having excellent defect suppressing properties. Further, it ispossible to provide a chemical liquid storage body containing thechemical liquid.

DESCRIPTION OF THE PREFERRED EMBODIMENTS

Hereinafter, the present invention will be specifically described.

The following constituents will be described based on typicalembodiments of the present invention in some cases, but the presentinvention is not limited to the embodiments.

In the present specification, a range of numerical values describedusing “to” means a range including the numerical values listed beforeand after “to” as a lower limit value and an upper limit valuerespectively.

Further, in the present invention, “ppm” means “parts-per-million(10⁻⁶)”, “ppb” means “parts-per-billion (10⁻⁹)”, “ppt” means“parts-per-trillion (10⁻¹²)”, and “ppq” means “parts-per-quadrillion(10⁻¹⁵)”.

Further, in the present invention, regarding the description of a group(atomic group), in a case where whether the group is substituted orunsubstituted is not described, as long as the effects of the presentinvention are not impaired, the group includes a group which does nothave a substituent and a group which contains a substituent. Forexample, “hydrocarbon group” includes not only a hydrocarbon group whichdoes not have a substituent (unsubstituted hydrocarbon group) but also ahydrocarbon group which contains a substituent (substituted hydrocarbongroup). The same applies for each compound.

Further, in the present invention, “radiation” means, for example, farultraviolet rays, extreme ultraviolet (EUV), X-rays, electron beams, andthe like. Further, in the present invention, “light” means actinic raysor radiation. In the present invention, unless otherwise specified,“exposure” includes not only exposure, far ultraviolet rays, X-rays, andEUV, and the like, but also lithography by particle beams such asElectron beams or ion beams.

[Chemical Liquid]

The chemical liquid according to an embodiment of the present inventioncontains a compound other than an alkane and an alkene, and one or moreorganic solvents selected from the group consisting of decane andundecane.

The chemical liquid further contains an organic component.

The organic component is one or more selected from the group consistingof alkanes having 12 to 50 carbon atoms and alkenes having 12 to 50carbon atoms.

Further, the content of the organic component is 0.10 to 1,000,000 massppt with respect to the total mass of the chemical liquid.

It is unclear what mechanism enables the chemical liquid according to anembodiment of the present invention to achieve the above objects.According to the inventors of the present invention, presumably, themechanism may be as below. The following mechanism is merely based onpresumption, and in a case where the effects of the present inventionare obtained by other mechanisms, they are also included in the scope ofthe present invention.

The chemical liquid contains a small amount of impurities that are mixedin during the processes of storage and transfer through pipe, and suchimpurities are likely to cause various defects. The various defects are,for example, defects that occur in a case where the chemical liquid isapplied to a manufacturing process of a semiconductor device. Morespecific examples thereof include metal residue defects in a case wherethe chemical liquid is used as a prewet solution or a rinsing solution,defects that form cross-links between patterns in a case where thechemical liquid is used as a pattern developer, and defects such asthose described above that occur in a case where the chemical liquid isused as a pipe washing solution and a prewet solution, rinsing solution,or developer is transferred to the washed pipe thereafter and used.

Since the chemical liquid of the present invention contains apredetermined amount of an organic component in advance, it behaves likea saturated solution, and impurities (particularly, impurities that arelikely to cause defects) are hardly mixed into the chemical liquid.Since the organic components, alkanes and alkenes, have a predeterminednumber or more of carbon atoms, their affinity for impurities in theliquid contact portion on containers, pipes, and the like used in thecase of storing and transferring chemical liquids or the like, isappropriately suppressed, thereby preventing the elution of impuritiesderived from the liquid contact portion.

On the other hand, the organic components, alkanes and alkenes, have apredetermined number or less of carbon atoms, and it is possible toprevent the organic components themselves from causing defects.

Based on such a mechanism, the inventors of the present inventionpresume that various processes using the chemical liquid of the presentinvention have been able to suppress the occurrence of defects in thefinal product.

[Organic Solvent]

The chemical liquid of the present invention (hereinafter, also simplyreferred to as “chemical liquid”) contains a compound other than analkane and an alkene, and one or more organic solvents selected from thegroup consisting of decane and undecane. In other words, in the presentspecification, alkanes and alkenes are not included in the organicsolvent except decane and undecane.

In the present specification, an organic solvent is intended to refer toan organic compound which is contained in the chemical liquid in anamount more than 10000 mass ppm per component with respect to the totalmass of the chemical liquid. That is, in the present specification, aliquid organic compound contained in the chemical liquid in an amountgreater than 10000 mass ppm with respect to the total mass of thechemical liquid corresponds to an organic solvent.

In addition, the organic solvent which the chemical liquid must containis a compound other than an alkane and an alkene, decane, and/orundecane.

The organic solvent is preferably a compound other than an alkane and analkene.

Further, in the present specification, “liquid” means that the compoundstays in liquid form at 25° C. under atmospheric pressure.

The content of the organic solvent in the chemical liquid is notparticularly limited. Generally, the content of the organic solvent withrespect to the total mass of the chemical liquid is preferably 98.0% bymass or more, more preferably greater than 99.0% by mass, still morepreferably 99.9% by mass or more, and particularly preferably 99.99% bymass or more. The upper limit is less than 100% by mass.

The organic solvent may be used alone or in combination of two or more.In a case where two or more organic solvents are used, the total contentthereof is preferably within the above range.

The organic solvent preferably has a Hansen solubility parameterdistance to eicosene of 3 to 20 MPa^(0.5) from the viewpoint that defectsuppressing properties are more excellent in a case where the chemicalliquid is applied to various processes (for example, applied as a prewetsolution, a developer, a rinsing solution, or a washing solution forwashing equipment with which these liquids come into contact)(hereinafter, also simply referred to as “defect suppressing propertiesof the chemical liquid”).

In a case where the organic solvent has a Hansen solubility parameterdistance to eicosene of 3 MPa^(0.5) or more, it is considered thatelution of the organic components or the like from a filter or the likeused in purifying the chemical liquid can be appropriately suppressed,and the content of the organic components of the chemical liquid can beeasily controlled to be equal to or less than the upper limit allowed bythe chemical liquid of the present invention. Further, it is easy toprevent unintended impurities (especially organic impurities with smallpolarity) from the environment (such as air and container and pipe usedin the case of storing and transferring liquid or the like) from beingtaken into the chemical liquid.

In a case where the organic solvent has a Hansen solubility parameterdistance to eicosene of 20 MPa^(0.5) or less, it is considered that thesolubility to the organic component contained in the chemical liquid isgood, and in a case where the chemical liquid is applied to a wafer orthe like, it is easy to prevent the organic components from aggregatingon the wafer and causing defects.

In a case where two or more organic solvents are used, at least onethereof preferably satisfies the range of the Hansen solubilityparameter, at least two thereof more preferably satisfy the range of theHansen solubility parameter, and all of them still more preferablysatisfy the range of the Hansen solubility parameter.

In a case where two or more organic solvents are used, the weightedaverage value of the Hansen solubility parameter based on the molarratio of the content of each organic solvent preferably satisfies therange of the Hansen solubility parameter.

For example, the organic solvent in the chemical liquid is preferablyonly the organic solvent substantially satisfying the range of theHansen solubility parameter. The expression that the organic solvent inthe chemical liquid is substantially only the organic solvent satisfyingthe range of the Hansen solubility parameter means that the content ofthe organic solvent satisfying the range of the Hansen solubilityparameter is 99% by mass or more (preferably 99.9% by mass or more) withrespect to the total mass of the organic solvent.

Further, for example, the organic solvent is also preferably a mixedsolvent containing both an organic solvent satisfying the range of theHansen solubility parameter and an organic solvent not satisfying therange of the Hansen solubility parameter.

In this case, it is preferable that the chemical liquid (mixed solvent)contains 20% to 80% by mass (preferably 30% to 70% by mass) of anorganic solvent satisfying the range of the Hansen solubility parameterwith respect to the total mass of the chemical liquid, and contains 20%to 80% by mass (preferably 30% to 70% by mass) of an organic solvent notsatisfying the range of the Hansen solubility parameter with respect tothe total mass of the chemical liquid.

It is considered that in a case where the content of the organic solventsatisfying the range of the Hansen solubility parameter and the contentof the organic solvent not satisfying the range of the Hansen solubilityparameter are each within a certain range, the affinity of the chemicalliquid as a whole to the metallic material and the organic material canbe adjusted to an appropriate range, so that the effects of the presentinvention become superior to those in a case where the content of theorganic solvent not satisfying the range of the Hansen solubilityparameter is too small or excessive (for example, in the case of being1% by mass or more and less than 20% by mass, or more than 80% by masswith respect to the total mass of the chemical liquid (mixed solvent)).

In a case where the organic solvent not satisfying the range of theHansen solubility parameter is contained an inadequate amount (forexample, more than 1% by mass and less than 20% by mass), the inadequateamount of the organic solvent not satisfying the range of the Hansensolubility parameter is likely to act in the direction of precipitatingorganic impurities and/or ionic metal components having a relativelylarge polarity and the like, which are unintentionally mixed(contamination) from the environment, contained in the chemical liquid.On the other hand, it is considered that in a case where the content ofthe organic solvent not satisfying the range of the Hansen solubilityparameter is 20% by mass or more, the action of making these componentsless likely to be taken in from the environment is more preferentialthan the action of precipitation described above, and the defectsuppressing properties of the chemical liquid as a whole are improved.

It is considered that in a case where the content of the organic solventnot satisfying the range of the Hansen solubility parameter is 80% bymass or less, an excessive intake of organic impurities and/orparticulate metal components having a small polarity from theenvironment can be suppressed and the defect suppressing properties areimproved.

Further, the total content of the organic solvent satisfying the rangeof the Hansen solubility parameter and the organic solvent notsatisfying the range of the Hansen solubility parameter is preferably98.0% by mass or more, more preferably 99.0% by mass or more, still morepreferably more than 99.9% by mass, and particularly preferably 99.99%by mass or more with respect to the total mass of the chemical liquid.The upper limit value is less than 100% by mass.

The Hansen solubility parameter distance to eicosene in the organicsolvent not satisfying the range of the Hansen solubility parameter isnot 3 to 20 MPa^(0.5).

In the organic solvent not satisfying the range of the Hansen solubilityparameter, the Hansen solubility parameter distance to eicosene is 0MPa^(0.5) or more and less than 3 MPa^(0.5) (preferably greater than 0MPa^(0.5) and less than 3 MPa^(0.5)), or greater than 20 MPa^(0.5)(preferably greater than 20 MPa^(0.5) and 50 MPa^(0.5) or less).

The Hansen solubility parameter distance to eicosane of the organicsolvent is preferably 5 to 25 MPa^(0.5) from the viewpoint that thedefect suppressing properties of the chemical liquid are more excellent.

The estimation mechanism is the same as that described above regardingthe Hansen solubility parameter distance to eicosene of the organicsolvent.

In a case where two or more organic solvents are used, at least onethereof preferably satisfies the range of the Hansen solubilityparameter, at least two thereof more preferably satisfy the range of theHansen solubility parameter, and all of them still more preferablysatisfy the range of the Hansen solubility parameter. Further, thecontent of the organic solvent satisfying the range of the Hansensolubility parameter is preferably 50% by mass or more and less than100% by mass, more preferably 80% by mass or more and less than 100% bymass, and still more preferably 95% by mass or more and less than 100%by mass with respect to the total mass of the chemical liquid.

In a case where two or more organic solvents are used, the weightedaverage value of the Hansen solubility parameter based on the molarratio of the content of each organic solvent preferably satisfies therange of the Hansen solubility parameter.

In the present specification, the Hansen solubility parameter isintended to refer to the Hansen solubility parameter described in“Hansen Solubility Parameters: A Users Handbook, Second Edition” (pages1-310, CRC Press, published in 2007) and the like. That is, the Hansensolubility parameter represents the solubility by a multidimensionalvector (dispersion force element (δd), polar force element (δp), andhydrogen bonding component (δh)), and these three parameters areconsidered to be coordinates of a point in a three-dimensional spacecalled Hansen space.

The Hansen solubility parameter distance is the distance in the Hansenspace between two compounds, and the Hansen solubility parameterdistance is calculated by the following formula:

(Ra)²=4(δd2−δd1)²+(δp2−δp1)²+(δh2−δh1)²

Ra: Hansen solubility parameter distance between the first compound andthe second compound (unit: MPa^(0.5))

δd1: Dispersion force element of the first compound (unit: MPa^(0.5))

δd2: Dispersion force element of the second compound (unit: MPa^(0.5))

δp1: Polar force element of the first compound (unit: MPa^(0.5))

δp2: Polar force element of the second compound (unit: MPa^(0.5))

δh1: Hydrogen bonding component of the first compound (unit: MPa^(0.5))

δh2: Hydrogen bonding component of the second compound (unit: MPa^(0.5))

In the present specification, the Hansen solubility parameter of acompound is specifically calculated by using Hansen Solubility Parameterin Practice (HSPiP).

As the type of the organic solvent, known organic solvents can be usedwithout particular limitation. Examples of the organic solvents includealkylene glycol monoalkyl ether carboxylate, alkylene glycol monoalkylether, a lactic acid alkyl ester, alkoxyalkyl propionate, cyclic lactone(preferably having 4 to 10 carbon atoms), a monoketone compound whichmay have a ring (preferably having 4 to 10 carbon atoms), alkylenecarbonate, alkoxyalkyl acetate, alkyl pyruvate, dialkyl sulfoxide,cyclic sulfone, dialkyl ether, monohydric alcohol, glycol, acetic acidalkyl ester, and N-alkylpyrrolidone.

The organic solvent contained in the chemical liquid is preferably oneor more selected from the group consisting of propylene glycolmonomethyl ether acetate (PGMEA), propylene glycol monomethyl ether(PGME), cyclohexanone (CHN), ethyl lactate (EL), propylene carbonate(PC), isopropanol (IPA), 4-methyl-2-pentanol (MIBC), butyl acetate(nBA), methyl methoxypropionate, propylene glycol monoethyl ether,propylene glycol monopropyl ether, cyclopentanone, γ-butyrolactone,diisoamyl ether, isoamyl acetate, dimethyl sulfoxide,N-methylpyrrolidone, diethylene glycol, ethylene glycol, dipropyleneglycol, propylene glycol, ethylene carbonate, sulfolane, cycloheptanone,2-heptanone, butyl butyrate, isobutyl isobutyrate, pentyl propionate,isopentyl propionate, ethylcyclohexane, mesitylene, decane, undecane,3,7-dimethyl-3-octanol, 2-ethyl-1-hexanol, 1-octanol, 2-octanol, ethylacetoacetate, dimethyl malonate, methyl pyruvate, and dimethyl oxalate.

Examples of using two or more organic solvents include combined use ofPGMEA and PGME, and combined use of PGMEA and PC.

The type and the content of the organic solvent in the chemical liquidcan be measured using a gas chromatography mass spectrometer.

The C log P of the organic solvent is preferably 0.05 to 7.00, and morepreferably 0.07 to 2.00, from the viewpoint that the defect suppressingproperties of the chemical liquid are more excellent.

The C log P value is a value obtained by calculating the commonlogarithm log P of the partition coefficient P between 1-octanol andwater. Known methods and software can be used for calculating the C logP value, but unless otherwise specified, the present invention uses theC log P program incorporated in ChemBioDraw Ultra 12.0 manufactured byCambridgesoft.

In a case where two or more organic solvents are used, the weightedaverage value of C log P values based on the molar ratio of the contentof each organic solvent preferably satisfies the C log P value range.

[Organic Components]

The chemical liquid contains an organic component.

The organic component is one or more selected from the group consistingof alkanes having 12 to 50 carbon atoms and alkenes having 12 to 50carbon atoms.

The chemical liquid may contain one organic component alone or two ormore. The chemical liquid preferably contains two or more organiccomponents from the viewpoint that the defect suppressing properties ofthe chemical liquid are more excellent.

In a case where two or more organic components are contained, thechemical liquid preferably satisfies any one or more of the followingrequirements A to C and preferably the requirement C:

Requirement A: The chemical liquid contains two or more selected fromthe group consisting of alkanes having 12 to 50 carbon atoms.

Requirement B: The chemical liquid contains two or more selected fromthe group consisting of alkenes having 12 to 50 carbon atoms.

Requirement C: The chemical liquid contains one or more selected fromthe group consisting of alkanes having 12 to 50 carbon atoms and one ormore selected from the group consisting of alkenes having 12 to 50carbon atoms.

The content of the organic component is 0.10 to 1,000,000 mass ppt withrespect to the total mass of the chemical liquid from the viewpoint thatthe defect suppressing properties of the chemical liquid are moreexcellent, and is preferably 0.5 to 10,000 mass ppt, more preferably 0.5to 1,000 mass ppt, still more preferably 1 to 150 mass ppt, andparticularly preferably 1 to 60 mass ppt, from the point that the defectsuppressing properties of the chemical liquid are more excellent.

In a case where two or more organic components are used, the totalcontent thereof is preferably within the above range.

The C log P of the organic component is preferably 5.0 or more, morepreferably 8.0 to 26.0, and still more preferably 9.0 to 17.0, from theviewpoint that the defect suppressing properties of the chemical liquidare more excellent.

The C log P value is a value obtained by calculating the commonlogarithm log P of the partition coefficient P between 1-octanol andwater. Known methods and software can be used for calculating the C logP value, but unless otherwise specified, the present invention uses theC log P program incorporated in ChemBioDraw Ultra 12.0 manufactured byCambridgesoft.

The molecular weight of the organic component is preferably 200 to 600,and more preferably 220 to 450.

The boiling point of the organic component is usually 180° C. or higher,preferably 190° C. to 600° C., and more preferably 200° C. to 500° C.

Further, it is preferable that the chemical liquid contains two or moreorganic components, and at least one thereof has a boiling point of 380°C. or higher (preferably 380° C. to 480° C.).

In the present specification, the boiling point means the boiling pointat standard atmospheric pressure.

<Alkane>

The alkane having 12 to 50 carbon atoms as an organic component is acompound represented by C_(j)H_(2j+2) (j represents an integer of 12 to50 and two j have the same value).

The alkane may be linear or branched. Incidentally, the alkane having 12to 50 carbon atoms does not contain a cyclic structure. That is, thealkane is not a cycloalkane

The alkane preferably has 14 to 40 carbon atoms, and more preferably 16to 34 carbon atoms.

Further, the chemical liquid preferably contains two or more selectedfrom the group consisting of alkanes having 12 to 50 carbon atoms, andamong the two or more alkanes having 12 to 50 carbon atoms, any one ofalkanes having 16 to 34 carbon atoms preferably has a largest masscontent, from the viewpoint that the defect suppressing properties ofthe chemical liquid are more excellent.

In a case where the chemical liquid contains the alkane having 12 to 50carbon atoms, the content thereof is preferably 0.01 to 5,000 mass ppt,more preferably 0.5 to 1,000 mass ppt, and still more preferably 1 to 50mass ppt with respect to the total mass of the chemical liquid, from theviewpoint that the defect suppressing properties of the chemical liquidare more excellent.

In a case where two or more of the alkanes are contained, the totalcontent is preferably within the above range.

<Alkene>

The alkene having 12 to 50 carbon atoms as an organic component containsone or more C═C double bonds in the molecule.

The alkene having 12 to 50 carbon atoms containing one or more C═Cdouble bonds in the molecule is an alkene represented byC_(n)C_(2n+2−2x) (n is an integer of 12 to 50, and x represents aninteger of 1 or more and represents the number of C═C double bonds thealkene has). In C_(n)C_(2n+2−2x), two n have the same value, and“2n+2−2x” has a value of 4 or more.

The alkene having 12 to 50 carbon atoms may be linear or branched.Incidentally, the alkene having 12 to 50 carbon atoms does not contain acyclic structure. That is, the alkene having 12 to 50 carbon atoms isnot a cycloalkene.

In a case where the chemical liquid contains the alkene having 12 to 50carbon atoms, the content thereof is preferably 0.1 to 5,000 mass ppt,more preferably 0.5 to 1,000 mass ppt, and still more preferably 1 to 50mass ppt with respect to the total mass of the chemical liquid, from theviewpoint that the defect suppressing properties of the chemical liquidare more excellent.

In a case where two or more of the alkenes are used, the total contentthereof is preferably within the above range.

The alkene represented by C_(n)C_(2n+2−2x), where x is 1, preferably has14 to 40 carbon atoms, and more preferably has 16 to 34 carbon atoms,from the viewpoint that the defect suppressing properties of thechemical liquid are more excellent.

In a case where the chemical liquid contains the alkene represented byC_(n)C_(2n+2−2x), where x is 1, the content thereof is preferably 0.01to 5,000 mass ppt, more preferably 0.1 to 1,000 mass ppt, and still morepreferably 1 to 40 mass ppt with respect to the total mass of thechemical liquid.

In a case where two or more alkenes represented by C_(n)C_(2n+2−2x),where x is 1, are used, the total content is preferably within the aboverange.

The alkene represented by C_(n)C_(2n+2−2x), where x is 2 or more, has acarbon number (that is, n) of preferably 30 to 50, and more preferably30 to 40.

The number of double bonds (that is, x) is preferably 2 to 15, and morepreferably 2 to 10.

The alkene represented by C_(n)C_(2n+2−2x), where x is 2 or more, ispreferably squalene (C₃₀H₅₀), lycopene (C₄₀H₅₆), neurosporene (C₄₀H₅₈),phytoene (C₄₀H₆₄) or phytofluene (C₄₀H₆₂), and more preferably squalene.

In a case where the chemical liquid contains the alkene represented byC_(n)C_(2n+2−2x), where x is 2 or more, the content thereof ispreferably 0.01 to 5,000 mass ppt, more preferably 0.1 to 1,000 massppt, and still more preferably 1 to 10 mass ppt with respect to thetotal mass of the chemical liquid.

In a case where two or more alkenes represented by C_(n)C_(2n+2−2x),where x is 2 or more, are used, the total content is preferably withinthe above range.

The content of the organic component in the chemical liquid can bemeasured by using a gas chromatography mass spectrometry (GCMS) device.

[Metal Component]

The chemical liquid may contain a metal component.

In the present invention, the metal component includes metal particlesand metal ions, for example, in the case of being referred to as thecontent of the metal component, it indicates the total content of themetal particles and metal ions.

The chemical liquid may contain either one of the metal particles or themetal ions, or may contain both of them. The chemical liquid preferablycontains both metal particles and metal ions.

Examples of the metal element in the metal component include Na(sodium), K (potassium), Ca (calcium), Fe (iron), Cu (copper), Mg(magnesium), Mn (manganese), Li (lithium), Al (aluminum), Cr (chromium),Ni (nickel), Ti (titanium), and Zr (zirconium). The metal component maycontain one or two or more metal elements.

The metal particles may be a simple substance or an alloy, and the metalmay be present in a form associated with an organic substance.

The metal component may be a metal component that is inevitablycontained in each component (raw material) contained in the chemicalliquid, or may be a metal component that is inevitably contained duringthe production, storage and/or transfer of the treatment liquid, or maybe intentionally added.

In a case where the chemical liquid contains the metal component, thecontent thereof is preferably 0.01 to 500 mass ppt, more preferably 0.01to 250 mass ppt, and still more preferably 0.01 to 100 mass ppt withrespect to the total mass of the chemical liquid, from the viewpointthat the defect suppressing properties of the chemical liquid are moreexcellent.

It is considered that in a case where the content of the metal componentis 0.01 mass ppt or more, it is easy to prevent the organic compound thechemical liquid may contain (especially polar organic compound) frombeing aggregated into particles on the substrate or the like to form adefect.

Further, in a case where the content of the metal component is less than500 mass ppt, it is easy to avoid an increase in the occurrence ofdefects derived from the metal component.

In a case where the chemical liquid contains metal ions, the contentthereof is preferably 0.01 to 400 mass ppt, and more preferably 0.01 to200 mass ppt, and still more preferably 0.01 to 80 mass ppt with respectto the total mass of the chemical liquid, from the viewpoint that thedefect suppressing properties of the chemical liquid are more excellent.

In a case where the chemical liquid contains metal particles, thecontent thereof is preferably 0.01 to 400 mass ppt, more preferably 0.01to 150 mass ppt, and still more preferably 0.01 to 40 mass ppt withrespect to the total mass of the chemical liquid, from the viewpointthat the defect suppressing properties of the chemical liquid are moreexcellent.

Further, in a case where the chemical liquid contains the metalcomponent, the mass ratio of the content of the organic component to thecontent of the metal component (mass content of organic component/masscontent of metal component) is preferably 0.001 to 10000, morepreferably 0.05 to 2000, still more preferably 0.1 to 2000, andparticularly preferably 0.1 to 100, from the viewpoint that the defectsuppressing properties of the chemical liquid are more excellent.

In a case where the chemical liquid contains metal particles, the massratio of the content of the organic component to the content of themetal particles (mass content of the organic component/mass content ofmetal particles) is preferably 0.01 to 30000, more preferably 0.1 to6000, still more preferably 0.1 to 1000, particularly preferably 0.1 to10, and most preferably 0.28 to 3.5, from the viewpoint that the defectsuppressing properties of the chemical liquid are more excellent.

In a case where the chemical liquid contains metal ions, the mass ratioof the content of the organic component to the content of the metal ion(mass content of organic component/mass content of metal ion) ispreferably 0.01 to 10000, more preferably 0.1 to 2500, still morepreferably 0.01 to 1000, particularly preferably 0.1 to 5, and mostpreferably 0.2 to 1.3, from the viewpoint that the defect suppressingproperties of the chemical liquid are more excellent.

The type and the content of the specific metal ions and the specificmetal particles in the chemical liquid can be measured by Single NanoParticle Inductively Coupled Plasma Mass Spectrometry (SP-ICP-MS).

The device used in SP-ICP-MS is the same as the device used in generalinductively coupled plasma mass spectrometry (ICP-MS). The onlydifference between SP-ICP-MS and ICP-MS is how to analyze data. WithSP-ICP-MS, data can be analyzed using commercial software.

With ICP-MS, the content of metal components as a measurement target ismeasured regardless of the way the metal components are present.Accordingly, the total mass of metal particles and metal ions as ameasurement target is quantified as the content of metal components.

With SP-ICP-MS, the content of metal particles can be measured.Accordingly, by subtracting the content of metal particles from thecontent of metal components in the sample, the content of metal ions inthe sample can be calculated.

Examples of the device for SP-ICP-MS include Agilent 8800 triplequadrupole inductively coupled plasma mass spectrometry (ICP-MS, forsemiconductor analysis, option #200) manufactured by AgilentTechnologies, Inc. By using this device, the content of metal particlescan be measured by the method described in Examples. As devices otherthan the above, NexION350S manufactured by PerkinElmer Inc. and Agilent8900 manufactured by Agilent Technologies, Inc can also be used.

[Other Components]

The chemical liquid may contain other components other than the above.Examples of the other components include other organic compounds, water,and resins.

<Water>

The chemical liquid may contain water. The water is not particularlylimited, and for example, distilled water, ion-exchanged water, purewater, and the like can be used.

Water may be added to the chemical liquid, or may be unintentionallymixed in the chemical liquid in the manufacturing process of thechemical liquid. Examples of the case of unintentional mixing in themanufacturing process of the chemical liquid include, but are notlimited to, a case where water is contained in a raw material (forexample, an organic solvent) used for manufacturing the chemical liquid,and a case where water is mixed in the manufacturing process of thechemical liquid (for example, contamination).

The content of water in the chemical liquid is not particularly limited.Generally, the content of water is preferably 0.05% to 2.0% by mass withrespect to the total mass of the chemical liquid. The content of waterin the chemical liquid means the content of water measured using anapparatus utilizing a Karl Fischer moisture content measurement methodas the measurement principle.

<Resin>

The chemical liquid may further contain a resin. The resin is morepreferably a resin P containing a group which decomposes by the actionof an acid to generate a polar group (repeating unit containing anacid-decomposable group). The resin is more preferably a resincontaining a repeating unit represented by the formula (AI) describedlater, which is a resin whose solubility in a developer containing anorganic solvent as a main component is reduced by the action of an acid.The resin containing a repeating unit represented by the formula (AI)described later contains a group that decomposes by the action of anacid to generate an alkali-soluble group.

Examples of the polar group include alkali-soluble groups. Examples ofthe alkali-soluble group include a carboxy group, a fluorinated alcoholgroup (preferably a hexafluoroisopropanol group), a phenolic hydroxylgroup, and a sulfo group.

In the acid-decomposable group, the polar group is protected by a groupcapable of leaving with an acid (acid-leaving group). Examples of theacid-leaving group include —C(R₃₆)(R₃₇)(R₃₈), —C(R₃₆)(R₃₇)(OR₃₉), and—C(R₀₁)(R₀₂)(OR₃₉).

In the formula, R₃₆ to R₃₉ each independently represent an alkyl group,a cycloalkyl group, an aryl group, an aralkyl group, or an alkenylgroup. R₃₆ and R₃₇ may be bonded to each other to form a ring.

R₀₁ and R₀₂ each independently represent a hydrogen atom, an alkylgroup, a cycloalkyl group, an aryl group, an aralkyl group, or analkenyl group.

Hereinafter, the resin P whose solubility in a developer containing anorganic solvent as a main component is reduced by the action of an acidwill be described in detail.

(Formula (AI): Repeating unit containing an acid-decomposable group)

The resin P preferably contains a repeating unit represented by theformula (AI).

In the formula (AI),

Xa₁ represents a hydrogen atom or an alkyl group which may have asubstituent.

T represents a single bond or a divalent linking group.

Ra₁ to Ra₃ each independently represent an alkyl group (linear orbranched) or a cycloalkyl group (monocyclic or polycyclic).

Two of Ra₁ to Ra₃ may be bonded to each other to form a cycloalkyl group(monocyclic or polycyclic).

The content of the repeating unit containing an acid-decomposable group(preferably the repeating unit represented by the formula (AI)) ispreferably 20% to 90 mol %, more preferably 25% to 85 mol %, and stillmore preferably 30% to 80 mol % with respect to all the repeating unitsin the resin P.

Further, the resin P may contain other repeating units in addition tothe repeating unit containing an acid-decomposable group. Examples ofthe other repeating unit include a repeating unit containing a lactonestructure, a repeating unit containing a phenolic hydroxyl group, arepeating unit containing a polar group, and a repeating unit containinga silicon atom in a side chain.

The weight-average molecular weight of the resin P is preferably 1,000to 200,000, more preferably 3,000 to 20,000, and still more preferably5,000 to 15,000 in terms of polystyrene as determined by the GPC (Gelpermeation chromatography) method. In a case where the weight-averagemolecular weight is 1,000 to 200,000, deterioration in heat resistanceand dry etching resistance, deterioration in developability, anddeterioration in film formability due to high viscosity can beprevented.

The dispersity (molecular weight distribution) is usually 1 to 5,preferably 1 to 3, more preferably 1.2 to 3.0, and still more preferably1.2 to 2.0.

The content of the resin P in the chemical liquid is preferably 50% to99.9% by mass and more preferably 60% to 99.0% by mass in the totalsolid content.

Further, in the chemical liquid, the resin P may be used as a singleresin, or a plurality of kinds.

Any of known components such as an acid generator, a basic compound, aquencher, a hydrophobic resin, a surfactant, and a solvent can be usedin the chemical liquid as long as they do not conflict with therequirements of the present invention. The chemical liquid may alsocontain, for example, a component contained in an actinic ray-sensitiveor radiation-sensitive resin composition described in JP2013-195844A,JP2016-057645A, JP2015-207006A, WO2014/148241, JP2016-188385A,JP2017-219818A, and the like.

<Other Organic Compounds>

The chemical liquid may contain other organic compounds other than thosedescribed above.

The other organic compound means an organic compound which is neither analkane having 12 to 50 carbon atoms nor an alkene having 12 to 50 carbonatoms, and has a content of 10000 mass ppm or less with respect to thetotal mass of the chemical liquid.

Examples of the other organic compounds include alkanes having less than12 carbon atoms and alkenes having less than 12 carbon atoms.

Other organic compounds may be added to the chemical liquid or may beunintentionally mixed in the manufacturing process of the chemicalliquid. Examples of the case of unintentional mixing in themanufacturing process of the chemical liquid include, but are notlimited to, a case where another organic compound is contained in a rawmaterial (for example, an organic solvent) used for manufacturing thechemical liquid, and a case where another organic compound is mixed inthe manufacturing process of the chemical liquid (for example,contamination).

In a case where the chemical liquid contains other organic compounds,the content is preferably 0.001 to 10,000 mass ppt, more preferably 0.1to 80 mass ppt, and still more preferably 1 to 15 mass ppt with respectto the total mass of the chemical liquid.

The content of other organic compounds in the chemical liquid can bemeasured by using a gas chromatography mass spectrometry (GCMS) device.

<Use of Chemical Liquid>

The chemical liquid according to the embodiment is preferably used formanufacturing a semiconductor device.

Specifically, in the manufacturing process of a semiconductor deviceincluding a lithography step, an etching step, an ion implantation step,a peeling step, and the like, the chemical liquid is used to treatorganic substance after completion of each step or before the next stepis performed, and it is suitably used as a prewet solution, a developer,a rinsing solution, a peeling solution, and the like. For example, itcan be used for rinsing the edge lines of a semiconductor substratebefore and after being coated with the resist application.

Alternatively, the chemical liquid may be used as a diluent or the likefor the resin contained in the resist liquid. In addition, it may bealso be diluted with another organic solvent and/or water, and the like.

Further, the chemical liquid can be used for other uses other thanmanufacturing of semiconductor devices, and can also be used as adeveloper such as polyimide, resist for sensors, and resist for lenses,and rinsing solution, and the like.

Further, the chemical liquid can also be used as a solvent for medicaluses or washing uses. For example, the chemical liquid can be suitablyused for washing containers, pipes, substrates (for example, a wafer andglass), and the like.

As the washing use, it is also preferable to use the washing solution(such as pipe washing solution and container washing solution) forwashing the pipes, container, and the like with which the liquid such asthe prewet solution as described above comes into contact.

In particular, the chemical liquid exerts a more excellent effect whenin the case of being applied to the prewet solution, the developer, andthe rinsing solution in the pattern formation. Further, even in the caseof being applied to a pipe washing solution used for pipes used fortransferring these liquids, a more excellent effect is exerted.

<Method for Manufacturing Chemical Liquid>

As the method for manufacturing the chemical liquid, known methods canbe used without particular limitation. In particular, the method formanufacturing a chemical liquid preferably includes a filtration step offiltering a substance to be purified containing an organic solvent usinga filter to obtain a chemical liquid, from the viewpoint of obtaining achemical liquid exhibiting more excellent effects of the presentinvention.

The substance to be purified used in the filtration step may be procuredby purchasing or the like, or may be obtained by reacting raw materials.The substance to be purified preferably has a low content of impurities.Examples of commercially available products of such a substance to bepurified include the substances called “high-purity grade products”.

As the method for obtaining a substance to be purified (typically, asubstance to be purified containing an organic solvent) by reacting rawmaterials, known methods can be used without particular limitation.Examples thereof include a method for obtaining an organic solvent byreacting a single raw material or a plurality of raw materials in thepresence of a catalyst.

More specific examples of the method include a method for obtainingbutyl acetate by reacting acetic acid and n-butanol in the presence ofsulfuric acid; a method for obtaining 1-hexanol by reacting ethylene,oxygen, and water in the presence of Al(C₂H₅)₃; a method for obtaining4-methyl-2-pentanol by reacting cis-4-methyl-2-pentene in the presenceof Diisopinocamphenyl borane (Ipc2BH); a method for obtaining propyleneglycol 1-monomethyl ether 2-acetate (PGMEA) by reacting propylene oxide,methanol and acetic acid in the presence of sulfuric acid; a method forobtaining isopropyl alcohol (IPA) by reacting acetone and hydrogen inthe presence of copper oxide-zinc oxide-aluminum oxide; and a method forobtaining ethyl lactate by reacting lactic acid and ethanol.

<Filtration Step>

The method for manufacturing a chemical liquid according to theembodiment of the present invention includes a filtration step offiltering the substance to be purified using a filter to obtain achemical liquid. The method of filtering the substance to be purifiedusing a filter is not particularly limited, but it is preferable to passthe substance to be purified through (pass through) a filter unit havinga housing and a filter cartridge accommodated in the housing with orwithout pressure.

Filter Pore Size

The pore size of the filter is not particularly limited, and a filterhaving a pore size that is normally used for filtering the substance tobe purified can be used. Among others, the pore size of the filter ispreferably 200 nm or less, more preferably 20 nm or less, still morepreferably 10 nm or less, particularly preferably 5 nm or less, and mostpreferably 3 nm or less, from the viewpoint of ease of controlling thenumber of particles (such as metal particles) contained in the chemicalliquid within a desired range. The lower limit value is not particularlylimited, but is preferably 1 nm or more in general from the viewpoint ofproductivity.

In the present specification, the pore size of and pore sizedistribution of a filter mean the pore size and pore size distributionas determined by the bubble point of isopropanol (IPA) or HFE-7200(“NOVEC 7200”, manufactured by 3M Company, hydrofluoroether, C₄F₉OC₂H₅).

The pore size of the filter is preferably 5.0 nm or less from theviewpoint of easier controlling of the number of particles contained inthe chemical liquid. Hereinafter, a filter having a pore size of 5 nm orless is also referred to as a “fine pore size filter”.

The fine pore size filter may be used alone or may be used with a filterhaving another pore size. In particular, it is preferable to use afilter having a larger pore size in combination from the viewpoint ofbeing more excellent in productivity. In this case, clogging of the finepore size filter can be prevented by passing the substance to bepurified, which has been previously filtered through a filter having alarger fine pore size, through the fine pore size filter.

In other words, in a case where one filter is used, the pore size of thefilter is preferably 5.0 nm or less, and in a case where two or morefilters are used, the pore size of the filter having the smallest poresize is 5.0 nm or less.

The configuration in which two or more filters having different poresizes are sequentially used is not particularly limited, and examplesthereof include a method in which the filter units described above aresequentially arranged along the pipe line through which the substance tobe purified is transferred. At this time, in a case where an attempt ismade to keep the flow rate of the substance to be purified per unit timeconstant in the entire pipeline, a larger pressure may be applied to thefilter unit having a smaller pore size than to the filter unit having alarger pore size. In this case, it is preferable to place a pressureregulating valve, a damper, or the like between the filter units to keepthe pressure applied to the filter unit having a small pore sizeconstant, or to place a filter unit in which the same filter isaccommodated in parallel along the pipe line to increase the filteringarea. By doing so, the number of particles in the chemical liquid can becontrolled more stably.

Filter Material

As the material for the filter, known materials for the filter can beused without particular limitation. Specific examples thereof include,in the case of resins, polyamide such as nylon (for example, 6-nylon and6,6-nylon); polyolefin such as polyethylene and polypropylene;polystyrene; polyimide; polyamide imide; poly(meth)acrylate;polyfluorocarbons such as polytetrafluoroethylene,perfluoroalkoxyalkane, perfluoroethylene propene copolymer,ethylene-tetrafluoroethylene copolymer, ethylene-chlorotrifluoroethylenecopolymer, polychlorotrifluoroethylene, polyvinylidene fluoride, andpolyvinyl fluoride; polyvinyl alcohol; polyester; cellulose; andcellulose acetate. Particularly, at least one selected from the groupconsisting of nylon (among them, 6,6-nylon is preferable), polyolefin(among them, polyethylene is preferable), poly(meth)acrylate, andpolyfluorocarbon (among them, polytetrafluoroethylene (PTFE) andperfluoroalkoxyalkane (PFA) are preferable) is preferable from theviewpoint of obtaining further improved solvent resistance and obtainingthe chemical liquid obtained having more excellent defect suppressingproperty. These polymers may be used alone or in combination of two ormore.

Further, in addition to the resin, diatomite, glass, or the like mayalso be used.

In addition, a polymer (such as nylon-grafted UPE) obtained bygraft-copolymerizing a polyamide (for example, nylon such as nylon-6 ornylon-6,6) onto a polyolefin (such as UPE described later) may be usedas a material for the filter.

The filter may be a surface-treated filter. As the surface treatmentmethod, known methods can be used without particular limitation.Examples of the surface treatment method include a chemical modificationtreatment, a plasma treatment, a hydrophobization treatment, coating, agas treatment, and sintering.

Plasma treatment is preferred due to the hydrophilic nature of thefilter surface. The water contact angle on the surface of the filtermaterial hydrophilized by plasma treatment is not particularly limited,but the static contact angle at 25° C. as measured by a contact anglemeter is preferably 60° or less, more preferably 50° or less, and stillmore preferably 30° or less.

As the chemical modification treatment, a method of introducing an ionexchange group into a base material is preferable.

That is, the filter is preferably obtained by using various materialsexemplified above as a base material and introducing an ion exchangegroup into the base material. Typically, it is preferable that thefilter includes a layer, which contains a base material having an ionexchange group, on a surface of the base material described above.Although the surface-modified base material is not particularly limited,a filter obtained by introducing ion exchange groups into theaforementioned polymer is preferable from the viewpoint of easiermanufacturing.

Examples of the ion exchange group include a cation exchange group suchas a sulfonic acid group, a carboxy group, and a phosphoric acid group,and an anion exchange group such as a quaternary ammonium group. Themethod of introducing the ion exchange group into the polymer is notparticularly limited, and examples thereof include a method of reactinga compound containing an ion exchange group and a polymerizable groupwith a polymer such that the compound is grafted on the polymertypically.

Although the method of introducing the ion exchange group is notparticularly limited, the aforementioned fibers of the resin areirradiated with ionizing radiation (such as α-Ray, β-ray, γ-ray, X-ray,and electron beam) to form an active portion (radical) in the resin. Theresin after the irradiation is immersed in a monomer-containing solutionto graft-polymerize a monomer on the base material. As a result, thismonomer is bonded to the polyolefin fiber generating a polymer as agraft polymerization side chain. The resin containing the generatedpolymer as a side chain is brought into contact and reacted with acompound containing an anion exchange group or a cation exchange groupto introduce an ion exchange group into the graft-polymerized side chainpolymer to obtain a final product.

Further, the filter may have a structure obtained by combining a wovenor non-woven fabric having an ion exchange group formed by a radiationgraft-polymerization method with a conventional glass wool, a woven ornon-woven filter material.

The use of a filter containing an ion exchange group makes it easy tocontrol the content of particles containing metal atoms in a chemicalliquid within a desired range. The material of the filter containing anion exchange group is not particularly limited, and examples thereofinclude a material obtained by introducing an ion exchange group intopolyfluorocarbon or polyolefin, of which more preferred is a materialobtained by introducing an ion exchange group into polyfluorocarbon.

The pore size of the filter containing an ion exchange group is notparticularly limited, but is preferably 1 to 30 nm, and more preferably5 to 20 nm. The filter containing an ion exchange group may also serveas the filter having the smallest pore size described above, or may beused separately from the filter having the smallest pore size. Amongothers, the filtration step is preferably configured to use a filtercontaining an ion exchange group and a filter having the smallest poresize without an ion exchange group, from the viewpoint of obtaining achemical liquid exhibiting more excellent effects of the presentinvention.

The material of the filter having the smallest pore size described aboveis not particularly limited, but is preferably, generally, at least oneselected from the group consisting of polyfluorocarbon and polyolefin,and more preferably polyolefin, from the viewpoint of solvent resistanceand the like.

Therefore, as the filter used in the filtration step, two or morefilters made of different materials may be used, and for example, two ormore selected from the group consisting of filters made of polyolefin,polyfluorocarbon, polyamide, and a material obtained by introducing anion exchange group thereto may be used.

Filter Pore Structure

The pore structure of the filter is not particularly limited and may beappropriately selected according to the components in the substance tobe purified. In the present specification, the pore structure of thefilters means the pore size distribution, the positional distribution ofpores in the filters, the shape of pores, and the like, and is typicallycontrollable by the method for manufacturing the filter.

For example, a porous membrane can be obtained by forming a powder ofresin or the like by sintering, and a fibrous membrane can be obtainedby forming by a method such as electrospinning, electroblowing, andmeltblowing. These have different pore structures.

“Porous membrane” means a membrane that retains components in thesubstance to be purified such as gels, particles, colloids, cells, andpoly-oligomers, but allows components substantially smaller than thepores to pass through the pores. The retention of components in thesubstance to be purified by the porous membrane may depend on operatingconditions, such as surface velocity, surfactant usage, pH, andcombinations thereof, and may depend on the pore size and structure ofthe porous membrane and the size and structure (such as hard particlesor gels) of the particles to be removed.

In a case where the substance to be purified contains particles that arenegatively charged, a filter made of polyamide functions as anon-sieving membrane for the removal of such particles. Examples oftypical non-sieving membranes include, but are not limited to, nylonmembranes such as nylon-6 membranes and nylon-6,6 membranes.

As used herein, the retention mechanism by “non-sieving” refers toretention caused by a mechanism such as interference, diffusion, andadsorption, which are unrelated to the pressure drop and the pore sizeof the filter.

Non-sieving retention includes retention mechanisms such asinterference, diffusion and adsorption, which remove particles to beremoved in the substance to be purified regardless of the pressure dropof the filter or the pore size of the filter. Adsorption of particles tothe filter surface can be mediated by, for example, intermolecular Vander Waals forces and electrostatic forces. An interference effect occursin a case where particles moving in a non-sieving membrane layer withserpentine paths cannot change direction enough to avoid contacting withthe non-sieving membrane. Particle transport by diffusion arisesprimarily from the random or Brownian motion of small particles, whichcreates a certain probability that the particles will collide with thefilter material. In a case where there is no repulsive force between theparticles and the filter, the non-sieving retention mechanism can beactivated.

Ultra high molecular weight polyethylene (UPE) filters are typicallysieving membranes. Sieving membrane means a membrane that capturesparticles primarily via a sieving retention mechanism, or a membraneoptimized to capture particles via a sieving retention mechanism.

Typical examples of sieving membranes include, but are not limited to,polytetrafluoroethylene (PTFE) membranes and UPE membranes.

The “sieving retention mechanism” refers to the retention resulting fromthat the particles to be removed are larger than the pore size of theporous membrane. Sieve retention force is enhanced by forming a filtercake (aggregation of particles to be removed on the surface of themembrane). The filter cake effectively functions a secondary filter.

The material of the fibrous membrane is not particularly limited as longas it is a polymer capable of forming the fibrous membrane. Examples ofthe polymer include polyamide. Examples of the polyamide include nylon 6and nylon 6,6. The polymer forming the fibrous membrane may bepoly(ether sulfone). In a case where the fibrous membrane is on theprimary side of the porous membrane, the surface energy of the fibrousmembrane is preferably higher than the polymer which is the material ofthe porous membrane on the secondary side. Such a combination includes,for example, a case where the material of the fibrous membrane is nylonand the porous membrane is polyethylene (UPE).

As the method for manufacturing the fibrous membrane, known methods canbe used without particular limitation. Examples of the method formanufacturing the fibrous membrane include electrospinning,electroblowing, and meltblowing.

The pore structure of the porous membrane (Porous membrane containing,for example, UPE and PTFE) is not particularly limited, but the poreshapes include, for example, a lace-like shape, a string-like shape, anda node-like shape.

The size distribution of pores in the porous membrane and the positiondistribution in the membrane are not particularly limited. The sizedistribution may be smaller and the distribution position in themembrane may be symmetric. Further, the size distribution may be largerand the distribution position in the membrane may be asymmetric (theaforementioned membrane is also referred to as “asymmetric porousmembrane”). In asymmetric porous membranes, the size of the pores variesin the membrane, typically increasing in pore size from one surface ofthe membrane to the other surface of the membrane. At this time, thesurface on the side with a large number of pores having a larger poresize is referred to as the “open side”, and the surface on the side witha large number of pores having a smaller pore size is also referred toas the “tight side”.

Further, examples of the asymmetric porous membrane include a membranein which the size of pores is minimized at a certain position within thethickness of the membrane (this is also referred to as “hourglassshape”).

Using the asymmetric porous membrane with larger sized pores on theprimary side, in other words, with the primary side as the open side,the pre-filtration effect can be produced.

The porous membrane may include a thermoplastic polymer such aspolyethersulfone (PESU), perfluoroalkoxyalkane (PFA, copolymer oftetrafluoroethylene and perfluoroether), polyamides, and polyolefins, ormay include polytetrafluoroethylene and the like.

Among them, the material of the porous membrane is preferably ultra highmolecular weight polyethylene. Ultra high molecular weight polyethylenemeans thermoplastic polyethylene having an extremely long chain, andpreferably has a molecular weight of 1 million or more, typically 2 to 6million.

As the filter used in the filtration step, two or more filters havingdifferent pore structures may be used, or a porous membrane filter and afibrous membrane filter may be used in combination. Specific examplesthereof include a method using a nylon fibrous membrane filter and a UPEporous membrane filter.

Further, it is preferable to thoroughly wash the filter before use.

In the case of using an unwashed filter (or a filter that has not beensufficiently washed), impurities contained in the filter are likely tobe brought into the chemical liquid.

Examples of the impurities contained in the filter include, theaforementioned organic components, and in a case where the filtrationstep is performed using an unwashed filter (or a filter that has notbeen sufficiently washed), the content of the organic components in thechemical liquid may exceed the allowable range as the chemical liquid ofthe present invention.

For example, in a case where a polyolefin such as UPE and apolyfluorocarbon such as PTFE are used for the filter, the filter islikely to contain alkanes having 12 to 50 carbon atoms as impurities.

Further, in a case where a polyamide, such as nylon, a polyimide, or apolymer obtained by graft-copolymerizing a polyamide (such as nylon)onto a polyolefin (such as UPE) is used as the filter, the filter islikely to contain alkenes having 12 to 50 carbon atoms as impurities.

Examples of the method of washing the filter include a method ofimmersing the filter in an organic solvent having a low impurity content(for example, an organic solvent obtained by distillation purification(such as PGMEA)) for one week or more. In this case, the liquidtemperature of the organic solvent is preferably 30° C. to 90° C.

The substance to be purified may be filtered using a filter with anadjusted degree of washing, and the resulting chemical liquid may alsobe adjusted so as to contain a desired amount of the organic componentderived from the filter.

As described above, the filtration step according to the embodiment ofthe present invention may be a multistage filtration step in which thesubstance to be purified is passed through two or more filters which aredifferent from each other in at least one selected from the groupconsisting of the material of the filter, the pore size and the porestructure.

Further, the substance to be purified may be passed through the samefilter a plurality of times, or the substance to be purified may bepassed through a plurality of filters of the same kind.

There is no particular limitation on the material of the liquid contactportion (meaning the inner wall surface or the like at which thesubstance to be purified and the chemical liquid may come into contactwith each other) of the purifier used in the filtration step of thepurification device used in the filtration step, but is preferablyformed from at least one selected from the group consisting ofnonmetallic materials (such as fluororesin) and electropolished metallicmaterials (such as stainless steel) (hereinafter, these are alsocollectively referred to as “corrosion-resistant material”). Forexample, the expression “the liquid contact portion of the manufacturingtank is formed from a corrosion-resistant material” means that themanufacturing tank itself consists of a corrosion-resistant material, orthat the inner wall surface of the manufacturing tank is coated with acorrosion-resistant material.

As the nonmetallic material, known materials can be used withoutparticular limitation.

Examples of the nonmetallic material include, but are not limited to, atleast one material selected from the group consisting of a polyethyleneresin, a polypropylene resin, a polyethylene-polypropylene resin, and afluororesin (for example, a tetrafluoroethylene resin, atetrafluoroethylene-perfluoroalkyl vinyl ether copolymer resin, atetrafluoroethylene-hexafluoropropylene copolymer resin, atetrafluoroethylene-ethylene copolymer resin, a chlorotrifluoroethylene-ethylene copolymer resin, a vinylidene fluoride resin, achlorotrifluoroethylene copolymer resin, and a vinyl fluoride resin).

As the metallic material, known materials can be used without particularlimitation.

Examples of the metallic material include, but are not limited to, ametallic material in which the total content of chromium and nickel withrespect to the total mass of the metallic material is more than 25% bymass, and more preferably 30% by mass or more with respect to the totalmass of the metallic material. The upper limit value of the totalcontent of chromium and nickel in the metallic material is notparticularly limited, but is preferably 90% by mass or less in general.

Examples of the metallic material include stainless steel and anickel-chromium alloy.

As the stainless steel, known stainless steel can be used withoutparticular limitation. Among those, the stainless steel is preferably analloy containing nickel in an amount of 8% by mass or more ispreferable, and more preferably austenite-based stainless steelcontaining nickel in an amount of 8% by mass or more. Examples of theaustenite-based stainless steel include steel use stainless (SUS) 304(Ni content: 8% by mass, Cr content: 18% by mass), SUS304L (Ni content:9% by mass, Cr content: 18% by mass), SUS316 (Ni content: 10% by mass,Cr content: 16% by mass), and SUS316L (Ni content: 12% by mass, Crcontent: 16% by mass).

As the nickel-chromium alloy, known nickel-chromium alloys can be usedwithout particular limitation. Among those, the nickel-chromium alloy ispreferably a nickel-chromium alloy in which the nickel content is 40% to75% by mass and the chromium content is 1% to 30% by mass.

Examples of the nickel-chromium alloy include HASTELLOY (trade name, thesame applies below), MONEL (trade name, the same applies below), andINCONEL (trade name, the same applies below). More specific examplesthereof include HASTELLOY C-276 (Ni content: 63% by mass, Cr content:16% by mass), HASTELLOY C (Ni content: 60% by mass, Cr content: 17% bymass), and HASTELLOY C-22 (Ni content: 61% by mass, Cr content: 22% bymass).

Further, the nickel-chromium alloy may further contain boron, silicon,tungsten, molybdenum, copper, cobalt, and the like in addition to theaforementioned alloy, as necessary.

As the method for electropolishing the metallic material, known methodscan be used without particular limitation. For example, it is possibleto use the methods described in paragraphs “0011” to “0014” inJP2015-227501A, paragraphs “0036” to “0042” in JP2008-264929A, and thelike.

Presumably, the chromium content in the passivation layer on the surfaceof the electropolished metallic material is higher than the chromiumcontent in the matrix. Therefore, it is presumed that in a case where apurification device in which the liquid contact portion is formed fromthe electropolished metallic material is used, metal-containingparticles are less likely to flow out into the substance to be purified.

The metallic material may have undergone buffing. As the buffing method,known methods can be used without particular limitation. The size ofabrasive grains used for finishing the buffing is not particularlylimited, but is preferably equal to or smaller than #400 from theviewpoint that such grains make it easy to further reduce the surfaceasperity of the metallic material. The buffing is preferably performedbefore the electropolishing.

<Other Steps>

The method for manufacturing the chemical liquid may further include astep other than the filtration step. Examples of steps other than thefiltration step include a distillation step, a reaction step, and acharge removing step.

(Distillation Step)

The distillation step is a step of distilling a substance to be purifiedcontaining an organic solvent to obtain a distilled substance to bepurified. As the method for purifying the substance to be purified,known methods can be used without particular limitation. A typicalexample thereof is a method in which a distillation column is placed onthe primary side of the purification device used in the filtration stepand the distilled substance to be purified is introduced into amanufacturing tank.

At this time, the liquid contact portion of the distillation column isnot particularly limited, but it is preferably formed of acorrosion-resistant material described above.

(Reaction Step)

The reaction step is a step of reacting the raw materials to produce asubstance to be purified containing an organic solvent which is thereaction product. As the method for producing the substance to bepurified, known methods can be used without particular limitation. Atypical example thereof is a method in which a reactor is placed on theprimary side of a manufacturing tank (or a distillation column) of apurification device used in a filtration step, and a reaction product isintroduced into the manufacturing tank (or a distillation column).

At this time, the liquid contact portion of the manufacturing tank isnot particularly limited, but is preferably formed of acorrosion-resistant material described above.

(Charge Removing Step)

The charge removing step is a step of removing charge from the substanceto be purified to reduce the charging potential of the substance to bepurified.

As the charge removing method, known charge removing methods can be usedwithout particular limitation. Examples of the charge removing methodinclude a method for bringing the substance to be purified into contactwith a conductive material.

The contact time for which the substance to be purified is brought intocontact with a conductive material is preferably 0.001 to 60 seconds,more preferably 0.001 to 1 second, and still more preferably 0.01 to 0.1seconds. Examples of the conductive material include stainless steel,gold, platinum, diamond, and glassy carbon.

Examples of the method for bringing the substance to be purified intocontact with a conductive material include a method for disposing agrounded mesh consisting of a conductive material in the interior of apipe line and passing the substance to be purified through the mesh.

During the purification of the substance to be purified, it ispreferable to perform all the accompanying activities, such as theopening of a container, washing of a container and a device, storage ofa solution, analysis, and the like in a clean room. The clean room ispreferably a clean room with a cleanliness of class 4 or higher definedby International Standard ISO 14644-1:2015 defined by InternationalOrganization for Standardization. The clean room preferably meets any ofInternational Organization for Standardization (ISO) class 1, ISO class2, ISO class 3, or ISO class 4, more preferably meets ISO class 1 or ISOclass 2, and still more preferably meets ISO class 1.

Although the preservation temperature of the chemical liquid is notparticularly limited, the preservation temperature is preferably 4° C.or higher from the viewpoint that impurities contained in the chemicalliquid in a trace amount are less likely to elute and the more excellenteffect of the present invention can be obtained.

[Chemical Liquid Storage Body]

The chemical liquid manufactured by the purification method may bestored in a container and preserved until use.

Such a container and the chemical liquid stored in the container arecollectively referred to as a chemical liquid storage body. The chemicalliquid is taken out from the preserved chemical liquid storage body andused.

The container for preserving the above chemical liquid is preferably acontainer having a high degree of cleanliness and little elution ofimpurities for use in manufacturing semiconductor devices.

Specific examples of usable containers include, but are not limited to,“Clean Bottle” series manufactured by Aicello Chemical Co., Ltd. and“Pure Bottle” manufactured by Kodama plastics Co., Ltd.

The container to be used is also preferably a multi-layer bottle havingan inner wall with a six-layer structure made of six kinds of resins ora seven-layer structure made of six kinds of resins for the purpose ofpreventing impurities from entering the chemical liquid (contamination).Examples of these containers include containers described inJP2015-123351A.

The liquid contact portion of the container may be a corrosion-resistantmaterial (preferably electropolished stainless steel or fluororesin)described above or glass. From the viewpoint that the more excellenteffect of the present invention can be obtained, it is preferable that90% or more of the area of the liquid contact portion consists of theabove materials, and it is more preferable that the entire liquidcontact portion consists of the materials.

The void volume of the chemical liquid storage body in the container ispreferably 2% to 80% by volume, more preferably 2% to 50% by volume, andstill more preferably 5% to 30% by volume.

The void volume is calculated according to the expression (1).

void volume={1−(volume of the chemical liquid in the container/volume ofthe container)}×100  Expression (1):

The container volume is synonymous with the internal volume (capacity)of the container.

In a case where the void volume is relatively small, the amount oforganic compounds in the air can be reduced because there is less air inthe voids, which reduces the amount of organic compounds in the airmixing into the chemical liquid, so that the composition of the storedchemical liquid can be easily stabilized.

In a case where the void volume is 2% by volume or more, the chemicalliquid can be easily handled because there is an appropriate space.

EXAMPLES

Hereinafter, the present invention will be more specifically describedbased on examples. The materials, the amount and proportion of thematerials used, the details of treatments, the procedure of treatments,and the like shown in the following examples can be appropriatelymodified as long as the gist of the present invention is maintained.Accordingly, the scope of the present invention is not limited to thefollowing examples.

At the time of preparation of chemical liquids of Examples andComparative Examples, all of the handling of containers and thepreparation, filling, preservation, analysis, and measurement ofchemical liquids were performed in a clean room that meets a level equalto or lower than the ISO Class 2 or 1. In order to improve themeasurement accuracy, in the measurement of the content of the organiccomponent and the measurement of the content of the metal component, ina case where the measurement of components at the detection limit orbelow by normal measurement is performed, the chemical liquid wasconcentrated and then measured, and the contents were calculated byconverting it to the concentration of the solution before concentration.

[Preparation of Chemical Liquid]

[Preparation of Filter]

The filters used for the purification of the chemical liquid were allfilters washed with a washing solution obtained by distillationpurification of commercially available propylene glycol monomethyl etheracetate (PGMEA). In the washing, the entire filter unit containing thefilter was immersed in PGMEA to wash the entire liquid contact portion.Further, the washing period (immersion period) was set to one week ormore. The liquid temperature of PGMEA was maintained at 30° C. duringthe washing.

The following filters were used as filters.

-   -   UPE: ultra high molecular weight polyethylene filter,        manufactured by Entegris, pore size 3 nm    -   PTFE: polytetrafluoroethylene filter, manufactured by Entegris,        pore size 10 nm    -   Nylon: nylon filter, manufactured by PALL, pore size 5 nm    -   Nylon-grafted UPE: Nylon/ultra high molecular weight        polyethylene graft copolymer filter, manufactured by Entegris,        pore size 3 nm    -   Polyimide: polyimide filter, manufactured by Entegris, pore size        10 nm

[Purification]

<Substance to be Purified>

The following organic solvents were used as substances to be purifiedfor the manufacture of the chemical liquids of Examples and ComparativeExamples. Commercially available products were used for all of thefollowing organic solvents.

The values in parentheses indicate the Hansen solubility parameterdistances to eicosene (unit: MPa^(0.5)) in the case of using the organicsolvent alone.

-   -   PGMEA: propylene glycol monomethyl ether acetate (9.5)    -   CHN: cyclohexanone (9.1)    -   EL: ethyl lactate (12.9)    -   PGME: propylene glycol monomethyl ether (11.0)    -   PC: propylene carbonate (19.1)    -   MMP: methyl methoxypropionate (8.8)    -   IPA: isopropanol (15.8)    -   MIBC: 4-methyl-2-pentanol (11.1)    -   NBA: butyl acetate (5.6)    -   MeOH: methanol (23.7)    -   Undecane: undecane (1.8)    -   Butyl butyrate: butyl butyrate (4.6)    -   Isoamyl Ether: isoamyl ether (diisoamyl ether) (2.1)    -   Ethylcyclohexane: ethylcyclohexane (1.8)    -   IAA: isoamyl acetate (6.0)    -   Isobutyl isobutyrate: isobutyl isobutyrate (3.6)    -   Methyl Malonate: dimethyl malonate (10.3)

In the case of using two organic solvents in combination, the organicsolvents were purchased before mixing and predetermined amounts thereofwere mixed to obtain the substance to be purified.

In the case of using two organic solvents are used in combination, thenumerical value described indicates the mixing ratio (mass ratio) of theorganic solvent.

For example, the description “PGME/PGMEA=7/3” means a 7:3 mixture (massratio) of PGMEA and PGME, wherein the Hansen solubility parameterdistance to eicosene (the weighted average value of the Hansensolubility parameter based on the molar ratio of the content of eachorganic solvent) in all such mixtures is 11.0 MPa^(0.5).

<Container>

The following containers were used as the containers for storing thechemical liquids.

-   -   EP-SUS: container of which a liquid contact portion is        electropolished stainless steel        -   PFA: container of which a liquid contact portion is coated            with perfluoroalkoxyalkane

One selected from the substances to be purified was distilled, and thesubstance to be purified having been purified by distillation wasfurther passed through the filter subjected to the washing one or moretimes, and then stored in various containers at a predetermined voidvolume.

In addition, in the course of purification, stainless steel pipes inwhich the liquid contact portion was electropolished or stainless steelpipes in which the liquid contact portion was not electropolished wereused as the pipe for transferring the substance to be purified and thechemical liquid.

The type of substance to be purified, the type of filter, the washingperiod of the filter, the number of times of passage, the type of pipe,and the length of the pipe (distance of transfer by pipe) wereappropriately changed to obtain the chemical liquids shown in Table 1.

However, the chemical liquid with a total hydrocarbon content of morethan 1,000,000 mass ppt, such as Comparative Example AB01, was preparedby passing the chemical liquid through a filter that had not beensubjected to the above-mentioned washing process.

Further, chemical liquids containing an alkane and/or an alkene havingless than 12 carbon atoms, such as Comparative Example HB07, wereprepared by adding an alkane and an alkene having 6 and 10 carbon atomsto the substance to be purified after passing through a filter so as tohave the contents shown in Table 1.

Hereinafter, the numbers of Examples or Comparative Examples areconsistent with the numbers of the chemical liquids. For example, thechemical liquid prepared in Example AA01 and used for the test isreferred to as chemical liquid AA01.

[Analysis]

The content of the organic component and the metal component of thechemical liquid was measured by the method shown below.

<Content of Organic Components>

The content of organic components in various chemical liquids wasanalyzed using a gas chromatography mass spectrometry (GC/MS) device.

<Content of Metal Component>

The content of metal components (metal ions and metal particles) in thechemical liquid was measured by a method using ICP-MS and SP-ICP-MS.

The equipment used was the following apparatus.

-   -   Manufacturer: PerkinElmer    -   Model: NexION 350S

The following analysis software was used for the analysis.

-   -   Syngistix Nano Application Module for “SP-ICP-MS”    -   Syngistix for ICP-MS software

In addition, among the alkanes or alkenes detected from the chemicalliquid, all of the alkanes or alkenes having 20 or more carbon atoms hada boiling point of 380° C. or higher.

The following table shows the manufacturing conditions of the chemicalliquid in each Example, the contents of the organic component and themetal component.

Tables 1a1 to 1a19 list the types of organic solvents and filters usedin the manufacture of the chemical liquids.

Tables 1b1 to 1b19 list the alkane contents in the chemical liquids.

Tables 1c1 to 1c19 list the alkene contents in the chemical liquids.

Tables 1d1 to 1d19 list the metal component content in the chemicalliquids and the like.

In Tables 1a1 to 1a19, the values described in the lower columns of the“HSP distance to eicosane” and the “HSP distance to eicosene” mean theHansen solubility parameter distance to eicosane or eicosene of theorganic solvent used (unit: MPa^(0.5)).

In a system in which two or more organic solvents are mixed, it meansthe weighted average value of Hansen solubility parameters based on themolar ratio of the content of each organic solvent.

The column “C log P” shows the C log P value of the organic solventused.

In a system in which two or more organic solvents are mixed, it meansthe weighted average value of C log P value based on the molar ratio ofthe content of each organic solvent.

In Tables 1b1 to 1b19 and Tables 1c1 to 1c19, the values described inthe lower columns of the carbon numbers of alkanes and alkenesrepresented by C_(k)H_(2k) (alkenes containing one or more C═C doublebonds) indicate the content of alkanes or alkenes represented byC_(k)H_(2k) of each number of carbon atoms. For example, in Table 1b1,the chemical liquid AA01 contains 2 mass ppt of the alkane having 18carbon atoms with respect to the total mass of the chemical liquid.

It should be noted that, of the alkanes and alkenes represented byC_(k)H_(2k) having 12 to 50 carbon atoms, the contents of the alkanesand alkenes represented by C_(k)H_(2k) having an unlisted carbon numberare omitted.

The value of “0” described for the content of alkane and alkene meansthat the content of those alkane and alkene was less than 0.001 mass ppt(detection limit) with respect to the total mass of the chemical liquid.In this case, it is considered that the chemical liquid does not containthe alkane and alkene having a content of “0”.

In Tables 1b1 to 1b19 and Tables 1c1 to 1c19, the “total amount” columnindicates the total content of alkanes having 12 to 50 carbon atoms inthe chemical liquid and the total content of alkenes having 12 to 50carbon atoms in the chemical liquid, respectively. That is, even in acase where the chemical liquid contains an alkane or alkene having 6 or10 carbon atoms, the contents thereof are not added up for thecalculation in the “total amount” column.

In Tables 1b1 to 1b19, the values described in the lower columns of thecolumn of “maximum carbon number” indicate the number of carbon atoms ofthe alkane having the largest mass content among the alkanes of eachnumber of carbon atoms contained in the chemical liquid.

In Tables 1c1 to 1c19, the values described in the lower columns of thecolumn of “C_(n) H_(m)” indicate the content of alkenes containing twoor more C═C double bonds. Only squalene (C log P: 12.9) was detected asthe alkene containing two or more C═C double bonds.

The values described in the lower columns of the “total amount oforganic components” column in Tables 1d1 to 1d19 indicate the totalcontent of organic components in the chemical liquid. That is, even in acase where the chemical liquid contains an alkane or alkene having 6 or10 carbon atoms, their contents thereof are not added up for thecalculation in the “total amount of organic components” column.

The values described in the lower columns of the “Ratio 1 to 3” columnof Tables 1d1 to 1d19 respectively indicate the “mass ratio of thecontent of the organic component to the content of the metal component”,the “mass ratio of the content of the organic component to the contentof the metal particles”, and the “mass ratio of the content of theorganic component to the content of the metal ions” in the chemicalliquids.

TABLE 1 Container Organic solvent Void HSP distance to HSP distance tovolume [% Table 1a1 Type ClogP eicosane eicosene Filter Type by volume]Example AA01 PGMEA 0.60 11.3 9.5 UPE EP-SUS 10 Example AA02 PGMEA 0.6011.3 9.5 PTFE EP-SUS 10 Example AA03 PGMEA 0.60 11.3 9.5 Nylon EP-SUS 10Example AA04 PGMEA 0.60 11.3 9.5 Nylon-grafted UPE EP-SUS 10 ExampleAA05 PGMEA 0.60 11.3 9.5 Polyimide EP-SUS 10 Example AA06 PGMEA 0.6011.3 9.5 Polyamide EP-SUS 10 Example AA07 PGMEA 0.60 11.3 9.5 UPE EP-SUS10 Example AA08 PGMEA 0.60 11.3 9.5 UPE EP-SUS 10 Example AA09 PGMEA0.60 11.3 9.5 UPE EP-SUS 10 Example AA10 PGMEA 0.60 11.3 9.5 NylonEP-SUS 10 Example AA11 PGMEA 0.60 11.3 9.5 Nylon EP-SUS 10 Example AA12PGMEA 0.60 11.3 9.5 Nylon EP-SUS 10 Example AA13 PGMEA 0.60 11.3 9.5 UPEEP-SUS 10 Example AA14 PGMEA 0.60 11.3 9.5 PTFE EP-SUS 10 Example AA15PGMEA 0.60 11.3 9.5 Nylon EP-SUS 10 Example AA16 PGMEA 0.60 11.3 9.5 UPEEP-SUS 30 Example AA17 PGMEA 0.60 11.3 9.5 UPE EP-SUS 50 Example AA18PGMEA 0.60 11.3 9.5 PTFE EP-SUS 30 Example AA19 PGMEA 0.60 11.3 9.5 PTFEEP-SUS 50 Example AA20 PGMEA 0.60 11.3 9.5 UPE PFA 10 Example AA21 PGMEA0.60 11.3 9.5 PTFE PFA 10 Example AA22 PGMEA 0.60 11.3 9.5 Nylon PFA 10Comparative PGMEA 0.60 11.3 9.5 UPE EP-SUS 10 Example AB01 ComparativePGMEA 0.60 11.3 9.5 UPE EP-SUS 10 Example AB02 Comparative PGMEA 0.6011.3 9.5 PTFE EP-SUS 10 Example AB03 Comparative PGMEA 0.60 11.3 9.5PTFE EP-SUS 10 Example AB04 Comparative PGMEA 0.60 11.3 9.5 Nylon EP-SUS10 Example AB05 Comparative PGMEA 0.60 11.3 9.5 Nylon EP-SUS 10 ExampleAB06 Comparative PGMEA 0.60 11.3 9.5 UPE EP-SUS 10 Example AB07Comparative PGMEA 0.60 11.3 9.5 Nylon EP-SUS 10 Example AB08 ComparativePGMEA 0.60 11.3 9.5 Nylon EP-SUS 10 Example AB09

TABLE 2 Maximum Table 1b1 Alkane content (mass ppt) (upper column carbonnumber/lower column ClogP) contained Chemical 6 10 12 14 16 18 20 30 4050 Total carbon liquid   3.9   6.0   7.0   8.1   9.2   10.2   11.3  16.6   21.9   27.1 amount number AA01 0 0 0 1 1 2 2 4 1 0 34 28 AA02 00 0 1 1 2 1 1 0 0 12 18 AA03 0 0 1 1 2 1 0 0 0 0 5 16 AA04 0 0 1 1 2 2 21 0 0 16 18 AA05 0 0 1 1 2 2 2 1 0 0 16 18 AA06 0 0 1 2 3 2 2 1 0 0 1816 AA07 0 0 0 1 1 2 2 3 1 0 29 28 AA08 0 0 0 1 1 2 3 3 1 0 32 26 AA09 00 0 0 0.01 0.01 0.02 0.02 0.01 0 0.22 26 AA10 0 0 1 1 2 1 0 0 0 0 5 16AA11 0 0 1 1 2 1 0 0 0 0 5 16 AA12 0 0 0 0 0.01 0.01 0 0 0 0 0.02 16AA13 0 0 5 10 20 35 39 41 12 5 450 26 AA14 0 0 3 8 12 18 30 25 5 0 26620 AA15 0 0 5 10 25 15 0 0 0 0 55 16 AA16 0 0 0 1 1 2 3 4 1 0 37 26 AA170 0 0 1 2 2 4 4 1 0 40 26 AA18 0 0 0 1 1 2 2 1 0 0 14 22 AA19 0 0 0 1 23 2 1 0 0 16 18 AA20 0 0 0 1 1 2 2 4 1 0 34 28 AA21 0 0 0 1 1 2 1 1 0 012 18 AA22 0 0 1 1 2 1 0 0 0 0 5 16 AB01 0 0 0 100 12000 92000 29000092000 4200 150 1310630 22 AB02 0 0 0 0 0 0.01 0.01 0.01 0 0 0.085 24AB03 0 0 0 80 890 79500 200000 92000 4200 150 1062000 22 AB04 0 0 0 0 00 0.01 0.01 0 0 0.075 24 AB05 0 0 250 3000 5000 1000 0 0 0 0 9250 16AB06 0 0 0 0 0.007 0.005 0 0 0 0 0.012 16 AB07 0.07 0.07 0 0 0 0.01 0.010.01 0 0 0.085 22 AB08 0.05 0.05 0 0 0.007 0.005 0 0 0 0 0.012 16 AB09 00 0 0 0.007 0.005 0 0 0 0 0.012 16

TABLE 3 Alkene content (mass ppt) Table 1c1 C_(k)H_(2k) (upper columncarbon number/lower column ClogP) Chemical 6 10 12 20 30 40 50C_(n)H_(m) Total liquid   3.4   5.5   6.6   10.8   16.1   21.4   26.7(squalene) amount AA01 0 0 0 0 0 0 0 0 0 AA02 0 0 0 0 0 0 0 0 0 AA03 0 01 2 3 2 0 2 38 AA04 0 0 1 2 3 1 0 2 33 AA05 0 0 1 3 2 1 0 2 33 AA06 0 01 2 2 1 0 2 28 AA07 0 0 0 0 0 0 0 0 0 AA08 0 0 0 0 0 0 0 0 0 AA09 0 0 00 0 0 0 0 0 AA10 0 0 1 2 3 1 0 2 33 AA11 0 0 1 2 3 2 0 2 38 AA12 0 00.01 0.01 0.03 0.01 0 0.01 0.28 AA13 0 0 0 0 0 0 0 0 0 AA14 0 0 0 0 0 00 0 0 AA15 0 0 5 16 26 22 12 22 385 AA16 0 0 0 0 0 0 0 0 0 AA17 0 0 0 00 0 0 0 0 AA18 0 0 0 0 0 0 0 0 0 AA19 0 0 0 0 0 0 0 0 0 AA20 0 0 0 0 0 00 0 0 AA21 0 0 0 0 0 0 0 0 0 AA22 0 0 1 2 3 2 0 2 38 AB01 0 0 0 0 0 0 00 0 AB02 0 0 0 0 0 0 0 0 0 AB03 0 0 0 0 0 0 0 0 0 AB04 0 0 0 0 0 0 0 0 0AB05 0 0 3000 110000 220000 80000 500 120000 2178750 AB06 0 0 0 0.0050.006 0.004 0 0.006 0.081 AB07 0 0 0 0 0 0 0 0 0 AB08 0 0 0 0.005 0.0060.004 0 0.006 0.081 AB09 0 1 0 0.005 0.006 0.004 0 0.006 0.081

TABLE 4 Ratio 1 Ratio 2 Organic Metal component Organic Organic Ratio 3Table 1d1 component Metal component/ component/ Organic Chemical totalamount Total Metal ions particles Metal Metal component/ liquid (massppt) (mass ppt) (mass ppt) (mass ppt) component particles Metal ionsAA01 34 71.3 52.8 18.5 4.8 × 10⁻¹ 1.8 × 10⁰ 6.4 × 10⁻¹ AA02 12 69.9 51.818.1 1.6 × 10⁻¹  6.3 × 10⁻¹ 2.2 × 10⁻¹ AA03 43 71.8 53.2 18.6 5.9 × 10⁻¹2.3 × 10⁰ 8.0 × 10⁻¹ AA04 49 73.7 54.6 19.1 6.6 × 10⁻¹ 2.5 × 10⁰ 8.9 ×10⁻¹ AA05 49 74.4 55.1 19.3 6.5 × 10⁻¹ 2.5 × 10⁰ 8.8 × 10⁻¹ AA06 46 72.653.8 18.8 6.3 × 10⁻¹ 2.4 × 10⁰ 8.5 × 10⁻¹ AA07 29 0.011 0.008 0.003 2.7× 10³  1.0 × 10⁴ 3.6 × 10³  AA08 32 677.7 502.0 175.7 4.6 × 10⁻²  1.8 ×10⁻¹ 6.3 × 10⁻² AA09 0.22 70.9 52.5 18.4 3.1 × 10⁻³  1.2 × 10⁻² 4.2 ×10⁻³ AA10 38 0.011 0.008 0.003 3.5 × 10³  1.3 × 10⁴ 4.7 × 10³  AA11 43677.7 502.0 175.7 6.3 × 10⁻²  2.4 × 10⁻¹ 8.5 × 10⁻² AA12 0.30 71.4 52.918.5 4.1 × 10⁻³  1.6 × 10⁻² 5.6 × 10⁻³ AA13 450 70.1 51.9 18.2 6.4 ×10⁰  2.5 × 10¹ 8.7 × 10⁻⁰ AA14 266 72.0 53.3 18.7 3.7 × 10⁰  1.4 × 10¹5.0 × 10⁻⁰ AA15 440 73.8 54.7 19.1 6.0 × 10⁰  2.3 × 10¹ 8.0 × 10⁻⁰ AA1637 71.8 53.2 18.6 5.1 × 10⁻¹ 2.0 × 10⁰ 6.9 × 10⁻¹ AA17 40 71.1 52.7 18.45.6 × 10⁻¹ 2.2 × 10⁰ 7.6 × 10⁻¹ AA18 14 69.8 51.7 18.1 2.0 × 10⁻¹  7.7 ×10⁻¹ 2.7 × 10⁻¹ AA19 16 71.7 53.1 18.6 2.2 × 10⁻¹  8.6 × 10⁻¹ 3.0 × 10⁻¹AA20 34 73.6 54.5 19.1 4.6 × 10⁻¹ 1.8 × 10⁰ 6.2 × 10⁻¹ AA21 12 71.3 52.818.5 1.6 × 10⁻¹  6.2 × 10⁻¹ 2.2 × 10⁻¹ AA22 43 73.0 54.1 18.9 5.8 × 10⁻¹2.2 × 10⁰ 7.9 × 10⁻¹ AB01 1310630 0.010 0.007 0.003 1.3 × 10⁸  4.4 × 10⁸1.9 × 10⁸  AB02 0.085 754.2 532.6 221.6 1.1 × 10⁻⁴  3.8 × 10⁻⁴ 1.6 ×10⁻⁴ AB03 1062000 0.010 0.007 0.003 1.1 × 10⁸  3.5 × 10⁸ 1.5 × 10⁸  AB040.075 754.2 532.6 221.6 9.9 × 10⁻⁵  3.4 × 10⁻⁴ 1.4 × 10⁻⁴ AB05 21880000.011 0.008 0.003 2.0 × 10⁸  7.3 × 10⁸ 2.7 × 10⁸  AB06 0.093 767.4 542.2225.2 1.2 × 10⁻⁴  4.1 × 10⁻⁴ 1.7 × 10⁻⁴ AB07 0.085 754.2 532.6 221.6 1.1× 10⁻⁴  3.8 × 10⁻⁴ 1.6 × 10⁻⁴ AB08 0.093 767.4 542.2 225.2 1.2 × 10⁻⁴ 4.1 × 10⁻⁴ 1.7 × 10⁻⁴ AB09 0.093 767.4 542.2 225.2 1.2 × 10⁻⁴  4.1 ×10⁻⁴ 1.7 × 10⁻⁴

TABLE 5 Container Organic solvent Void volume HSP distance to HSPdistance to [% by Table 1a2 Type ClogP eicosene eicosane Filter Typevolume] Example BA01 CHN 0.87 10.5 9.1 UPE EP-SUS 10 Example BA02 CHN0.87 10.5 9.1 PTFE EP-SUS 10 Example BA03 CHN 0.87 10.5 9.1 Nylon EP-SUS10 Example BA04 CHN 0.87 10.5 9.1 Nylon-grafted EP-SUS 10 UPE ExampleBA05 CHN 0.87 10.5 9.1 Polyimide EP-SUS 10 Example BA06 CHN 0.87 10.59.1 Polyamide EP-SUS 10 Example BA07 CHN 0.87 10.5 9.1 UPE EP-SUS 10Example BA08 CHN 0.87 10.5 9.1 UPE EP-SUS 10 Example BA09 CHN 0.87 10.59.1 UPE EP-SUS 10 Example BA10 CHN 0.87 10.5 9.1 Nylon EP-SUS 10 ExampleBA11 CHN 0.87 10.5 9.1 Nylon EP-SUS 10 Example BA12 CHN 0.87 10.5 9.1Nylon EP-SUS 10 Example BA13 CHN 0.87 10.5 9.1 UPE EP-SUS 10 ExampleBA14 CHN 0.87 10.5 9.1 PTFE EP-SUS 10 Example BA15 CHN 0.87 10.5 9.1Nylon EP-SUS 10 Example BA16 CHN 0.87 10.5 9.1 UPE EP-SUS 30 ExampleBA17 CHN 0.87 10.5 9.1 UPE EP-SUS 50 Example BA18 CHN 0.87 10.5 9.1 UPEPFA 10 Example BA19 CHN 0.87 10.5 9.1 PTFE PFA 10 Example BA20 CHN 0.8710.5 9.1 Nylon PFA 10 Comparative CHN 0.87 10.5 9.1 UPE EP-SUS 10Example BB01 Comparative CHN 0.87 10.5 9.1 UPE EP-SUS 10 Example BB02Comparative CHN 0.87 10.5 9.1 PTFE EP-SUS 10 Example BB03 ComparativeCHN 0.87 10.5 9.1 PTFE EP-SUS 10 Example BB04 Comparative CHN 0.87 10.59.1 Nylon EP-SUS 10 Example BB05 Comparative CHN 0.87 10.5 9.1 NylonEP-SUS 10 Example BB06 Comparative CHN 0.87 10.5 9.1 UPE EP-SUS 10Example BB07 Comparative CHN 0.87 10.5 9.1 Nylon EP-SUS 10 Example BB08

TABLE 6 Maximum Table 1b2 Alkane content (mass ppt) (upper column carbonnumber/lower column ClogP) contained Chemical 6 10 12 14 16 18 20 30 4050 Total carbon liquid   3.9   6.0   7.0   8.1   9.2   10.2   11.3  16.6   21.9   27.1 amount number BA01 0 0 0 1 1 2 3 4 1 0 37 28 BA02 00 0 1 1 2 2 1 0 0 14 18 BA03 0 0 1 1 2 1 0 0 0 0 5 16 BA04 0 0 1 1 2 2 10 0 0 8.5 18 BA05 0 0 1 1 2 3 2 0 0 0 12 18 BA06 0 0 1 1 3 2 1 0 0 0 9.516 BA07 0 0 0 1 1 2 3 3 1 0 32 24 BA08 0 0 0 1 2 3 3 3 1 0 34 22 BA09 00 0 0 0.01 0.01 0.03 0.02 0.01 0 0.25 24 BA10 0 0 1 1 2 1 0 0 0 0 5 16BA11 0 0 1 2 2 1 0 0 0 0 6 16 BA12 0 0 0 0 0.01 0.01 0 0 0 0 0.02 16BA13 0 0 6 14 22 39 42 44 14 5 494 24 BA14 0 0 4 10 14 22 32 29 6 1 30920 BA15 0 0 5 12 28 17 0 0 0 0 62 16 BA16 0 0 0 1 1 2 4 4 1 0 39 24 BA170 0 0 1 2 3 4 4 1 0 41 24 BA18 0 0 0 1 1 2 2 4 1 0 34 26 BA19 0 0 0 1 22 1 1 0 0 13 18 BA20 0 0 1 1 2 1 0 0 0 0 5 16 BB01 0 0 0 120 12900 95000320000 126000 4500 130 1560980 22 BB02 0 0 0 0 0 0.01 0.01 0.01 0 00.085 20 BB03 0 0 0 75 980 80100 215000 93000 4300 110 1105540 22 BB04 00 0 0 0 0 0.01 0.01 0 0 0.075 24 BB05 0 0 290 3200 5500 1000 0 0 0 09990 16 BB06 0 0 0 0 0.007 0.005 0 0 0 0 0.012 16 BB07 0.07 0.07 0 0 00.01 0.01 0.01 0 0 0.085 24 BB08 0.05 0.05 0 0 0.007 0.005 0 0 0 0 0.01216

TABLE 7 Alkene content (mass ppt) Table 1c2 C_(k)H_(2k) (upper columncarbon number/lower column ClogP) Chemical 6 10 12 20 30 40 50C_(n)H_(m) Total liquid   3.4   5.5   6.6   10.8   16.1   21.4   26.7(squalene) amount BA01 0 0 0 0 0 0 0 0 0 BA02 0 0 0 0 0 0 0 0 0 BA03 0 01 3 3 1 0 2 38 BA04 0 0 1 2 3 2 0 2 38 BA05 0 0 1 2 2 2 0 2 33 BA06 0 01 3 3 1 0 2 38 BA07 0 0 0 0 0 0 0 0 0 BA08 0 0 0 0 0 0 0 0 0 BA09 0 0 00 0 0 0 0 0 BA10 0 0 1 3 3 1 0 2 38 BAH 0 0 1 3 3 2 0 2 43 BA12 0 0 0.010.01 0.03 0.01 0 0.01 0.28 BA13 0 0 0 0 0 0 0 0 0 BA14 0 0 0 0 0 0 0 0 0BA15 0 0 5 18 28 26 15 22 432 BA16 0 0 0 0 0 0 0 0 0 BA17 0 0 0 0 0 0 00 0 BA18 0 0 0 0 0 0 0 0 0 BA19 0 0 0 0 0 0 0 0 0 BA20 0 0 1 3 3 2 0 243 BB01 0 0 0 0 0 0 0 0 0 BB02 0 0 0 0 0 0 0 0 0 BB03 0 0 0 0 0 0 0 0 0BB04 0 0 0 0 0 0 0 0 0 BB05 0 0 3400 120000 242000 84000 400 1350002374500 BB06 0 0 0 0.005 0.007 0.004 0 0.007 0.087 BB07 0 0 0 0 0 0 0 00 BB08 0 0 0 0.004 0.007 0.004 0 0.007 0.082

TABLE 8 Table 1d2 Metal component Ratio 1 Ratio 2 Organic OrganicOrganic Ratio 3 component Metal component/ component/ Organic Chemicaltotal amount Total Metal ions particles Metal Metal component/ liquid(mass ppt) (mass ppt) (mass ppt) (mass ppt) component particles Metalions BA01 37 71.7 53.1 18.6 5.1 × 10⁻¹ 2.0 × 10⁰ 6.9 × 10⁻¹ BA02 14 71.052.6 18.4 2.0 × 10⁻¹ 7.6 × 10⁻¹ 2.7 × 10⁻¹ BA03 43 69.7 51.6 18.1 6.1 ×10⁻¹ 2.4 × 10⁰ 8.2 × 10⁻¹ BA04 46.5 71.6 53.0 18.6 6.4 × 10⁻¹ 2.5 × 10⁰8.7 × 10⁻¹ BA05 45 73.4 54.4 19.0 6.1 × 10⁻¹ 2.3 × 10⁰ 8.2 × 10⁻¹ BA0647.5 71.1 52.7 18.4 6.6 × 10⁻¹ 2.5 × 10⁰ 8.9 × 10⁻¹ BA07 32 0.011 0.0080.003 2.9 × 10³ 1.1 × 10⁴ 3.9 × 10³ BA08 34 691.2 512.0 179.2 4.8 × 10⁻²1.9 × 10⁻¹ 6.5 × 10⁻² BA09 0.25 73.4 54.4 19.0 3.3 × 10⁻³ 1.3 × 10⁻² 4.5× 10⁻³ BA10 43 0.011 0.008 0.003 3.9 × 10³ 1.5 × 10⁴ 5.3 × 10³ BA11 49691.2 512.0 179.2 7.0 × l 0⁻² 2.7 × 10⁻¹ 9.5 × 10⁻² BA12 0.30 69.7 51.618.1 4.2 × 10⁻³ 1.6 × 10⁻² 5.7 × 10⁻³ BA13 494 71.6 53.0 18.6 6.9 × 10⁰2.7 × 10¹ 9.3 × 10⁰ BA14 309 73.4 54.4 19.0 4.2 × 10⁰ 1.6 × 10¹ 5.7 ×10⁰ BA15 494 71.4 52.9 18.5 6.9 × 10⁰ 2.7 × 10¹ 9.3 × 10⁰ BA16 39 70.752.4 18.3 5.5 × 10⁻¹ 2.1 × 10⁰ 7.4 × 10⁻¹ BA17 41 69.4 51.4 18.0 5.9 ×10⁻¹ 2.3 × 10⁰ 8.0 × 10⁻¹ BA18 34 71.3 52.8 18.5 4.8 × 10⁻¹ 1.8 × 10⁰6.4 × 10⁻¹ BA19 13 73.2 54.2 19.0 1.7 × 10⁻¹ 6.6 × 10⁻¹ 2.3 × 10⁻¹ BA2048 70.9 52.5 18.4 6.7 × 10⁻¹ 2.6 × 10⁰ 9.0 × 10⁻¹ BB01 1560980 0.0100.007 0.003 1.6 × 10⁸ 5.2 × 10⁸ 2.2 × 10⁸ BB02 0.085 786.6 565.0 221.61.1 × 10⁻⁴ 3.8 × 10⁻⁴ 1.5 × 10⁻⁴ BB03 1105540 0.011 0.008 0.003 1.0 ×10⁸ 3.7 × 10⁸ 1.4 × 10⁸ BB04 0.075 786.6 565.0 221.6 9.5 × 10⁻⁵ 3.4 ×10⁻⁴ 1.3 × 10⁻⁴ BB05 2384490 0.010 0.007 0.003 2.4 × 10⁸ 7.9 × 10⁸ 3.4 ×10⁸ BB06 0.099 790.2 565.0 225.2 1.3 × 10⁻⁴ 4.4 × 10⁻⁴ 1.8 × 10⁻⁴ BB070.085 786.6 565.0 221.6 1.1 × 10⁻⁴ 3.8 × 10⁻⁴ 1.5 × 10⁻⁴ BB08 0.094790.2 565.0 225.2 1.2 × 10⁻⁴ 4.2 × 10⁻⁴ 1.7 × 10⁻⁴

TABLE 9 Table 1a3 Container Organic solvent Void volume HSP distance toHSP distance to [% by Type ClogP eicosane eicosene Filter Type volume]Example CA01 EL 0.33 14.6 12.9 UPE EP-SUS 10 Example CA02 EL 0.33 14.612.9 PTFE EP-SUS 10 Example CA03 EL 0.33 14.6 12.9 Nylon EP-SUS 10Example CA04 EL 0.33 14.6 12.9 UPE EP-SUS 10 Example CA05 EL 0.33 14.612.9 UPE EP-SUS 10 Example CA06 EL 0.33 14.6 12.9 UPE EP-SUS 10 ExampleCA07 EL 0.33 14.6 12.9 Nylon EP-SUS 10 Example CA08 EL 0.33 14.6 12.9Nylon EP-SUS 10 Example CA09 EL 0.33 14.6 12.9 Nylon EP-SUS 10 ExampleCA10 EL 0.33 14.6 12.9 UPE EP-SUS 10 Example CA11 EL 0.33 14.6 12.9 PTFEEP-SUS 10 Example CA12 EL 0.33 14.6 12.9 Nylon EP-SUS 10 Example CA13 EL0.33 14.6 12.9 UPE EP-SUS 30 Example CA14 EL 0.33 14.6 12.9 UPE EP-SUS50 Example CA15 EL 0.33 14.6 12.9 UPE PFA 10 Example CA16 EL 0.33 14.612.9 PTFE PFA 10 Example CA17 EL 0.33 14.6 12.9 Nylon PFA 10 ComparativeEL 0.33 14.6 12.9 UPE EP-SUS 10 Example CB01 Comparative EL 0.33 14.612.9 UPE EP-SUS 10 Example CB02 Comparative EL 0.33 14.6 12.9 PTFEEP-SUS 10 Example CB03 Comparative EL 0.33 14.6 12.9 PTFE EP-SUS 10Example CB04 Comparative EL 0.33 14.6 12.9 Nylon EP-SUS 10 Example CB05Comparative EL 0.33 14.6 12.9 Nylon EP-SUS 10 Example CB06 ComparativeEL 0.33 14.6 12.9 UPE EP-SUS 10 Example CB07 Comparative EL 0.33 14.612.9 Nylon EP-SUS 10 Example CB08

TABLE 10 Table 1b3 Maximum Alkane content (mass ppt) (upper columncarbon number / lower column ClogP) contained Chemical 6 10 12 14 16 1820 30 40 50 Total carbon liquid 3.9 6.0 7.0 8.1 9.2 10.2 11.3 16.6 21.927.1 amount number CA01 0 0 0 1 1 2 2 2 1 0 24 22 CA02 0 0 0 1 1 2 1 1 00 12 18 CA03 0 0 1 1 2 1 0 0 0 0 5 16 CA04 0 0 0 1 1 1 2 3 1 0 28 26CA05 0 0 0 1 1 2 2 3 1 0 29 26 CA06 0 0 0 0 0.01 0.01 0.02 0.02 0.01 00.22 24 CA07 0 0 1 1 2 1 0 0 0 0 5 16 CA08 0 0 1 1 2 1 0 0 0 0 5 16 CA090 0 0 0 0.01 0.01 0 0 0 0 0.02 16 CA10 0 0 5 8 18 32 35 30 5 5 343 22CA11 0 0 3 6 10 15 25 20 8 0 237 22 CA12 0 0 5 10 20 15 0 0 0 0 50 16CA13 0 0 0 1 1 2 4 4 1 0 39 24 CA14 0 0 0 1 2 3 4 4 1 0 41 24 CA15 0 0 01 1 2 2 4 1 0 34 28 CA16 0 0 0 1 1 2 1 1 0 0 12 18 CA17 0 0 1 1 2 1 0 00 0 5 16 CB01 0 0 0 90 10000 89000 250000 88000 4200 150 1185620 24 CB020 0 0 0 0 0.01 0.01 0.01 0 0 0.085 22 CB03 0 0 0 80 890 79500 21000093000 4300 150 1092500 24 CB04 0 0 0 0 0 0 0.01 0.01 0 0 0.075 24 CB05 00 250 2600 4800 700 0 0 0 0 8350 16 CB06 0 0 0 0 0.007 0.005 0 0 0 00.012 16 CB07 0.07 0.07 0 0 0 0.01 0.01 0.01 0 0 0.085 20 CB08 0.05 0.050 0 0.007 0.005 0 0 0 0 0.012 16

TABLE 11 Table 1c3 Alkene content (mass ppt) C_(k)H_(2k) (upper columncarbon number / lower column ClogP) Chemical 6 10 12 20 30 40 50C_(n)H_(m) Total liquid 3.4 5.5 6.6 10.8 16.1 21.4 26.7 (squalene)amount CA01 0 0 0 0 0 0 0 0 0 CA02 0 0 0 0 0 0 0 0 0 CA03 0 0 1 2 3 2 02 38 CA04 0 0 0 0 0 0 0 0 0 CA05 0 0 0 0 0 0 0 0 0 CA06 0 0 0 0 0 0 0 00 CA07 0 0 1 2 3 1 0 2 33 CA08 0 0 1 2 3 2 0 2 38 CA09 0 0 0.01 0.010.03 0.01 0 0.01 0.28 CA10 0 0 0 0 0 0 0 0 0 CA11 0 0 0 0 0 0 0 0 0 CA120 0 5 15 24 18 10 18 341 CA13 0 0 0 0 0 0 0 0 0 CA14 0 0 0 0 0 0 0 0 0CA15 0 0 0 0 0 0 0 0 0 CA16 0 0 0 0 0 0 0 0 0 CA17 0 0 1 2 3 2 0 2 38CB01 0 0 0 0 0 0 0 0 0 CB02 0 0 0 0 0 0 0 0 0 CB03 0 0 0 0 0 0 0 0 0CB04 0 0 0 0 0 0 0 0 0 CB05 0 0 2600 110000 190000 72000 200 1050001972000 CB06 0 0 0 0.005 0.005 0.004 0 0.006 0.076 CB07 0 0 0 0 0 0 0 00 CB08 0 0 0 0.005 0.006 0.004 0 0.006 0.081

TABLE 12 Table 1d3 Ratio 1 Ratio 2 Organic Metal component OrganicOrganic Ratio 3 component Metal component/ component/ Organic Chemicaltotal amount Total Metal ions particles Metal Metal component/ liquid(mass ppt) (mass ppt) (mass ppt) (mass ppt) component particles Metalions CA01 24 73.4 54.4 19.0 3.3 × 10⁻¹ 1.3 × 10⁰ 4.4 × 10⁻¹ CA02 12 71.452.9 18.5 1.6 × 10⁻¹ 6.2 × 10⁻¹ 2.2 × 10⁻¹ CA03 43 70.7 52.4 18.3 6.0 ×10⁻¹ 2.3 × 10⁰ 8.1 × 10⁻¹ CA04 28 0.009 0.007 0.002 3.0 × 10³ 1.1 × 10⁴4.0 × 10³ CA05 29 687.2 509.0 178.2 4.2 × 10⁻² 1.6 × 10⁻¹ 5.7 × 10⁻²CA06 0.22 71.6 53.0 18.6 3.1 × 10⁻³ 1.2 × 10⁻² 4.2 × 10⁻³ CA07 38 0.0110.008 0.003 3.5 × 10³ 1.3 × 10⁴ 4.7 × 10³ CA08 43 687.2 509.0 178.2 6.2× 10⁻² 2.4 × 10⁻¹ 8.3 × 10⁻² CA09 0.30 69.4 51.4 18.0 4.3 × 10⁻³ 1.6 ×10⁻² 5.7 × 10⁻³ CA10 343 71.3 52.8 18.5 4.8 × 10⁰ 1.9 × 10¹ 6.5 × 10⁰CA11 237 73.2 54.2 19.0 3.2 × 10⁰ 1.2 × 10¹ 4.4 × 10⁰ CA12 391 71.6 53.018.6 5.5 × 10⁰ 2.1 × 10¹ 7.4 × 10⁰ CA13 39 70.9 52.5 18.4 5.5 × 10⁻¹ 2.1× 10⁰ 7.4 × 10⁻¹ CA14 41 69.5 51.5 18.0 5.9 × 10⁻¹ 2.3 × 10⁰ 8.0 × 10⁻¹CA15 34 71.4 52.9 18.5 4.8 × 10⁻¹ 1.8 × 10⁰ 6.4 × 10⁻¹ CA16 12 73.3 54.319.0 1.6 × 10⁻¹ 6.1 × 10⁻¹ 2.1 × 10⁻¹ CA17 43 71.0 52.6 18.4 6.0 × 10⁻¹2.3 × 10⁰ 8.1 × 10⁻¹ CB01 1185620 0.010 0.007 0.003 1.2 × 10⁸ 4.0 × 10⁸1.7 × 10⁸ CB02 0.085 763.6 542.0 221.6 1.1 × 10⁻⁴ 3.8 × 10⁻⁴ 1.6 × 10⁻⁴CB03 1092500 0.010 0.007 0.003 1.1 × 10⁸ 3.6 × 10⁸ 1.6 × 10⁸ CB04 0.075763.6 542.0 221.6 9.8 × 10⁻⁵ 3.4 × 10⁻⁴ 1.4 × 10⁻⁴ CB05 1980350 0.0100.007 0.003 2.0 × 10⁸ 6.6 × 10⁸ 2.8 × 10⁸ CB06 0.088 767.2 542.0 225.21.1 × 10⁻⁴ 3.9 × 10⁻⁴ 1.6 × 10⁻⁴ CB07 0.085 763.6 542.0 221.6 1.1 × 10⁻⁴3.8 × 10⁻⁴ 1.6 × 10⁻⁴ CB08 0.093 767.2 542.0 225.2 1.2 × 10⁻⁴ 4.1 × 10⁻⁴1.7 × 10⁻⁴

TABLE 13 Table 1a4 Container Void Organic solvent volume HSP distance toHSP distance to [% by Type ClogP eicosane eicosene Filter Type volume]Example DA01 PGME/PGMEA = 7/3 −0.09 12.8 11.0 UPE EP-SUS 10 Example DA02PGME/PGMEA = 7/3 −0.09 12.8 11.0 PTFE EP-SUS 10 Example DA03 PGME/PGMEA= 7/3 −0.09 12.8 11.0 Nylon EP-SUS 10 Example DA04 PGME/PGMEA = 7/3−0.09 12.8 11.0 UPE EP-SUS 10 Example DA05 PGME/PGMEA = 7/3 −0.09 12.811.0 UPE EP-SUS 10 Example DA06 PGME/PGMEA = 7/3 −0.09 12.8 11.0 UPEEP-SUS 10 Example DA07 PGME/PGMEA = 7/3 −0.09 12.8 11.0 Nylon EP-SUS 10Example DA08 PGME/PGMEA = 7/3 −0.09 12.8 11.0 Nylon EP-SUS 10 ExampleDA09 PGME/PGMEA = 7/3 −0.09 12.8 11.0 Nylon EP-SUS 10 Example DA10PGME/PGMEA = 7/3 −0.09 12.8 11.0 UPE EP-SUS 10 Example DA11 PGME/PGMEA =7/3 −0.09 12.8 11.0 PTFE EP-SUS 10 Example DA12 PGME/PGMEA = 7/3 −0.0912.8 11.0 Nylon EP-SUS 10 Comparative PGME/PGMEA = 7/3 −0.09 12.8 11.0UPE EP-SUS 10 Example DB01 Comparative PGME/PGMEA = 7/3 −0.09 12.8 11.0UPE EP-SUS 10 Example DB02 Comparative PGME/PGMEA = 7/3 −0.09 12.8 11.0PTFE EP-SUS 10 Example DB03 Comparative PGME/PGMEA = 7/3 −0.09 12.8 11.0PTFE EP-SUS 10 Example DB04 Comparative PGME/PGMEA = 7/3 −0.09 12.8 11.0Nylon EP-SUS 10 Example DB05 Comparative PGME/PGMEA = 7/3 −0.09 12.811.0 Nylon EP-SUS 10 Example DB06 Comparative PGME/PGMEA = 7/3 −0.0912.8 11.0 UPE EP-SUS 10 Example DB07 Comparative PGME/PGMEA = 7/3 −0.0912.8 11.0 Nylon EP-SUS 10 Example DB08

TABLE 14 Table 1b4 Maximum Alkane content (mass ppt) (upper columncarbon number / lower column ClogP) contained Chemical 6 10 12 14 16 1820 30 40 50 Total carbon liquid 3.9 6.0 7.0 8.1 9.2 10.2 11.3 16.6 21.927.1 amount number DA01 0 0 0 1 1 2 1 0 0 0 6.5 18 DA02 0 0 0 0 1 2 1 00 0 5.5 18 DA03 0 0 1 1 2 1 0 0 0 0 5 16 DA04 0 0 0 1 1 2 1 1 0 0 12 18DA05 0 0 0 1 2 2 1 1 0 0 13 18 DA06 0 0 0 0 0.01 0.02 0.02 0.01 0 0 0.1320 DA07 0 0 1 1 2 1 0 0 0 0 5 16 DA08 0 0 0 1 2 1 0 0 0 0 4 16 DA09 0 00 0 0.01 0.01 0 0 0 0 0.02 18 DA10 0 0 5 12 26 30 22 10 2 0 188 18 DA110 0 4 12 24 28 20 6 1 0 153 18 DA12 0 0 5 10 13 8 0 0 0 0 36 16 DB01 0 00 60 35000 71000 270000 52000 4200 70 1062310 22 DB02 0 0 0 0 0 0.010.01 0.01 0 0 0.085 20 DB03 0 0 0 50 820 54000 210000 82000 3500 101007410 22 DB04 0 0 0 0 0 0 0.01 0.01 0 0 0.075 24 DB05 0 0 350 33004500 500 0 0 0 0 8650 16 DB06 0 0 0 0 0.007 0.005 0 0 0 0 0.012 16 DB070.07 0.07 0 0 0 0.01 0.01 0.01 0 0 0.085 20 DB08 0.05 0.05 0 0 0.0070.005 0 0 0 0 0.012 16

TABLE 15 Table 1c4 Alkene content (mass ppt) C_(k)H_(2k) (upper columncarbon number / lower column ClogP) Chemical 6 10 12 20 30 40 50C_(n)H_(m) Total liquid 3.4 5.5 6.6 10.8 16.1 21.4 26.7 (squalene)amount DA01 0 0 0 0 0 0 0 0 0 DA02 0 0 0 0 0 0 0 0 0 DA03 0 0 0 1 2 1 02 22 DA04 0 0 0 0 0 0 0 0 0 DA05 0 0 0 0 0 0 0 0 0 DA06 0 0 0 0 0 0 0 00 DA07 0 0 1 2 3 1 0 2 35 DA08 0 0 1 2 2 2 0 2 35 DA09 0 0 0.01 0.010.03 0.01 0 0.01 0.29 DA10 0 0 0 0 0 0 0 0 0 DA11 0 0 0 0 0 0 0 0 0 DA120 0 5 16 23 22 12 22 370 DB01 0 0 0 0 0 0 0 0 0 DB02 0 0 0 0 0 0 0 0 0DB03 0 0 0 0 0 0 0 0 0 DB04 0 0 0 0 0 0 0 0 0 DB05 0 0 2200 91200 19500079000 7000 120000 1969000 DB06 0 0 0 0.005 0.006 0.004 0 0.006 0.081DB07 0 0 0 0 0 0 0 0 0 DB08 0 0 0 0.005 0.006 0.004 0 0.006 0.081

TABLE 16 Table 1d4 Ratio 1 Ratio 2 Organic Metal component OrganicOrganic Ratio 3 component Metal component/ component/ Organic Chemicaltotal amount Total Metal ions particles Metal Metal component/ liquid(mass ppt) (mass ppt) (mass ppt) (mass ppt) component particles Metalions DA01 6.5 71.4 52.9 18.5 9.1 × 10⁻² 3.5 × 10⁻¹ 1.2 × 10⁻¹ DA02 5.570.7 52.4 18.3 7.8 × 10⁻² 3.0 × 10⁻¹ 1.0 × 10⁻¹ DA03 27 69.4 51.4 18.03.9 × 10⁻¹ 1.5 × 10⁰ 5.3 × 10⁻¹ DA04 12 0.009 0.007 0.002 1.2 × 10³ 4.7× 10³ 1.6 × 10³ DA05 13 694.2 514.2 180.0 1.8 × 10⁻² 6.9 × 10⁻² 2.4 ×10⁻² DA06 0.13 73.3 54.3 19.0 1.8 × 10⁻³ 6.8 × 10⁻³ 2.4 × 10⁻³ DA07 400.011 0.008 0.003 3.7 × 10³ 1.4 × 10⁴ 4.9 × 10³ DA08 39 691.2 512.0179.2 5.6 × 10⁻² 2.1 × 10⁻¹ 7.5 × 10⁻² DA09 0.31 72.9 54.0 18.9 4.2 ×10⁻³ 1.6 × 10⁻² 5.6 × 10⁻³ DA10 188 71.3 52.8 18.5 2.6 × 10⁰ 1.0 × 10¹3.6 × 10⁰ DA11 153 70.6 52.3 18.3 2.2 × 10⁰ 8.4 × 10⁰ 2.9 × 10⁰ DA12 40669.3 51.3 18.0 5.9 × 10⁰ 2.3 × 10¹ 7.9 × 10⁰ DB01 1062310 0.010 0.0070.003 1.1 × 10⁸ 3.5 × 10⁸ l.5 × 10⁸ DB02 0.085 757.4 532.2 225.2 1.1 ×10⁻⁴ 3.8 × 10⁻⁴ 1.6 × 10⁻⁴ DB03 1007410 0.010 0.007 0.003 1.0 × 10⁸ 3.4× 10⁸ 1.4 × 10⁸ DB04 0.075 763.7 542.1 221.6 9.8 × 10⁻⁵ 3.4 × 10⁻⁴ 1.4 ×10⁻⁴ DB05 1977650 0.010 0.007 0.003 2.0 × 10⁸ 6.6 × 10⁸ 2.8 × 10⁸ DB060.093 782.4 557.2 225.2 1.2 × 10⁻⁴ 4.1 × 10⁻⁴ 1.7 × 10⁻⁴ DB07 0.085757.4 532.2 225.2 1.1 × 10⁻⁴ 3.8 × 10⁻⁴ 1.6 × 10⁻⁴ DB08 0.093 782.4557.2 225.2 1.2 × 10⁻⁴ 4.1 × 10⁻⁴ 1.7 × 10⁻⁴

TABLE 17 Table 1a5 Container Void Organic solvent volume HSP distance toHSP distance to [% by Type ClogP eicosane eicosene Filter Type volume]Example EA01 PGMEA/PC = 5/5 0.04 14.8 13.5 UPE EP-SUS 10 Example EA02PGMEA/PC = 5/5 0.04 14.8 13.5 PTFE EP-SUS 10 Example EA03 PGMEA/PC = 5/50.04 14.8 13.5 Nylon EP-SUS 10 Example EA04 PGMEA/PC = 5/5 0.04 14.813.5 Nylon-grafted EP-SUS 10 UPE Example EA05 PGMEA/PC = 5/5 0.04 14.813.5 Polyimide EP-SUS 10 Example EA06 PGMEA/PC = 5/5 0.04 14.8 13.5Polyamide EP-SUS 10 Example EA07 PGMEA/PC = 5/5 0.04 14.8 13.5 UPEEP-SUS 10 Example EA08 PGMEA/PC = 5/5 0.04 14.8 13.5 UPE EP-SUS 10Example EA09 PGMEA/PC = 5/5 0.04 14.8 13.5 UPE EP-SUS 10 Example EA10PGMEA/PC = 5/5 0.04 14.8 13.5 Nylon EP-SUS 10 Example EA11 PGMEA/PC =5/5 0.04 14.8 13.5 Nylon EP-SUS 10 Example EA12 PGMEA/PC = 5/5 0.04 14.813.5 Nylon EP-SUS 10 Example EA13 PGMEA/PC = 5/5 0.04 14.8 13.5 UPEEP-SUS 10 Example EA14 PGMEA/PC = 5/5 0.04 14.8 13.5 PTFE EP-SUS 10Example EA15 PGMEA/PC = 5/5 0.04 14.8 13.5 Nylon EP-SUS 10 Example EA16PGMEA/PC = 5/5 0.04 14.8 13.5 UPE EP-SUS 30 Example EA17 PGMEA/PC = 5/50.04 14.8 13.5 UPE EP-SUS 50 Example EA18 PGMEA/PC = 5/5 0.04 14.8 13.5PTFE EP-SUS 30 Example EA19 PGMEA/PC = 5/5 0.04 14.8 13.5 PTFE EP-SUS 50Example EA20 PGMEA/PC = 5/5 0.04 14.8 13.5 UPE PFA 10 Example EA21PGMEA/PC = 5/5 0.04 14.8 13.5 PTFE PFA 10 Example EA22 PGMEA/PC = 5/50.04 14.8 13.5 Nylon PFA 10 Comparative PGMEA/PC = 5/5 0.04 14.8 13.5UPE EP-SUS 10 Example EB01 Comparative PGMEA/PC = 5/5 0.04 14.8 13.5 UPEEP-SUS 10 Example EB02 Comparative PGMEA/PC = 5/5 0.04 14.8 13.5 PTFEEP-SUS 10 Example EB03 Comparative PGMEA/PC = 5/5 0.04 14.8 13.5 PTFEEP-SUS 10 Example EB04 Comparative PGMEA/PC = 5/5 0.04 14.8 13.5 NylonEP-SUS 10 Example EB05 Comparative PGMEA/PC = 5/5 0.04 14.8 13.5 NylonEP-SUS 10 Example EB06 Comparative PGMEA/PC = 5/5 0.04 14.8 13.5 UPEEP-SUS 10 Example EB07 Comparative PGMEA/PC = 5/5 0.04 14.8 13.5 NylonEP-SUS 10 Example EB08

TABLE 18 Table 1b5 Alkane content (mass ppt) (upper column carbon number/ lower column ClogP) Maximum contained Chemical 6 10 12 14 16 18 20 3040 50 Total carbon liquid 3.9 6.0 7.0 8.1 9.2 10.2 11.3 16.6 21.9 27.1amount number EA01 0 0 0 1 1 1 2 2 1 0 23 28 EA02 0 0 0 1 1 2 1 1 0 0 1218 EA03 0 0 1 1 2 1 0 0 0 0 5 16 EA04 0 0 1 1 2 2 1 1 0 0 14 18 EA05 0 01 1 1 2 2 1 0 0 15 18 EA06 0 0 1 2 3 2 1 1 0 0 16 16 EA07 0 0 0 1 1 1 22 1 0 23 24 EA08 0 0 0 1 1 1 2 2 1 0 23 24 EA09 0 0 0 0 0.01 0.01 0.020.02 0.01 0 0.22 24 EA10 0 0 1 1 2 1 0 0 0 0 5 16 EA11 0 0 1 1 2 1 0 0 00 5 16 EA12 0 0 0 0 0.01 0.01 0 0 0 0 0.02 18 EA13 0 0 5 10 20 35 39 4112 5 450 22 EA14 0 0 3 8 12 18 30 25 5 0 266 22 EA15 0 0 5 10 25 15 0 00 0 55 16 EA16 0 0 0 1 2 2 3 4 1 0 38 26 EA17 0 0 0 1 2 3 4 4 1 0 41 26EA18 0 0 0 1 1 3 2 1 0 0 15 18 EA19 0 0 0 1 2 3 2 1 0 0 16 18 EA20 0 0 01 1 2 2 4 1 0 34 28 EA21 0 0 0 1 1 2 1 1 0 0 12 18 EA22 0 0 1 1 2 1 0 00 0 5 16 EB01 0 0 0 100 12000 98000 310000 92000 4200 150 1366630 22EB02 0 0 0 0 0 0.01 0.01 0.01 0 0 0.085 20 EB03 0 0 0 80 890 79500190000 92000 3900 150 1035500 22 EB04 0 0 0 0 0 0 0.01 0.01 0 0 0.075 22EB05 0 0 240 2900 5000 1100 0 0 0 0 9240 16 EB06 0 0 0 0 0.007 0.005 0 00 0 0.012 16 EB07 0.07 0.07 0 0 0 0.01 0.01 0.01 0 0 0.085 22 EB08 0.050.05 0 0 0.007 0.005 0 0 0 0 0.012 16

TABLE 19 Table 1c5 Alkene content (mass ppt) C_(k)H_(2k) (upper columncarbon number / lower column ClogP) Chemical 6 10 12 20 30 40 50C_(n)H_(m) Total liquid 3.4 5.5 6.6 10.8 16.1 21.4 26.7 (squalene)amount EA01 0 0 0 0 0 0 0 0 0 EA02 0 0 0 0 0 0 0 0 0 EA03 0 0 1 2 3 2 02 38 EA04 0 0 1 2 3 1 0 2 33 EA05 0 0 1 3 2 1 0 2 33 EA06 0 0 1 2 2 1 02 28 EA07 0 0 0 0 0 0 0 0 0 EA08 0 0 0 0 0 0 0 0 0 EA09 0 0 0 0 0 0 0 00 EA10 0 0 1 2 3 1 0 2 33 EA11 0 0 1 2 3 2 0 2 38 EA12 0 0 0.01 0.010.03 0.01 0 0.01 0.28 EA13 0 0 0 0 0 0 0 0 0 EA14 0 0 0 0 0 0 0 0 0 EA150 0 5 16 26 22 12 22 385 EA16 0 0 0 0 0 0 0 0 0 EA17 0 0 0 0 0 0 0 0 0EA18 0 0 0 0 0 0 0 0 0 EA19 0 0 0 0 0 0 0 0 0 EA20 0 0 0 0 0 0 0 0 0EA21 0 0 0 0 0 0 0 0 0 EA22 0 0 1 2 3 2 0 2 38 EB01 0 0 0 0 0 0 0 0 0EB02 0 0 0 0 0 0 0 0 0 EB03 0 0 0 0 0 0 0 0 0 EB04 0 0 0 0 0 0 0 0 0EB05 0 0 2900 110000 220000 80000 500 120000 2178500 EB06 0 0 0 0.0050.006 0.004 0 0.006 0.081 EB07 0 0 0 0 0 0 0 0 0 EB08 0 0 0 0.005 0.0060.004 0 0.006 0.081

TABLE 20 Table 1d5 Organic Ratio 1 Ratio 2 component Metal componentOrganic Organic Ratio 3 Total Metal component/ component/ OrganicChemical amount Total Metal ions particles Metal Metal component/ liquid(mass ppt) (mass ppt) (mass ppt) (mass ppt) component particles Metalions EA01 23 70.7 52.4 18.3 3.3 × 10⁻¹ 1.3 × 10⁰ 4.4 × 10⁻¹ EA02 12 72.653.8 18.8 1.6 × 10⁻¹ 6.1 × 10⁻¹ 2.1 × 10⁻¹ EA03 43 71.0 52.6 18.4 6.0 ×10⁻¹ 2.3 × 10⁰ 8.1 × 10⁻¹ EA04 47 70.3 52.1 18.2 6.5 × 10⁻¹ 2.5 × 10⁰8.8 × 10⁻¹ EA05 48 69.0 51.1 17.9 6.9 × 10⁻¹ 2.7 × 10⁰ 9.3 × 10⁻¹ EA0644 70.9 52.5 18.4 6.1 × 10⁻¹ 2.3 × 10⁰ 8.2 × 10⁻¹ EA07 23 0.011 0.0080.003 2.1 × 10³ 8.2 × 10³ 2.9 × 10³ EA08 23 693.9 514.0 179.9 3.3 × 10⁻²1.3 × 10⁻¹ 4.5 × 10⁻² EA09 0.22 71.1 52.7 18.4 3.1 × 10⁻³ 1.2 × 10⁻² 4.2× 10⁻³ EA10 38 0.009 0.007 0.002 4.0 × 10³ 1.5 × 10⁴ 5.4 × 10³ EA11 43693.9 514.0 179.9 6.1 × 10⁻² 2.4 × 10⁻¹ 8.3 × 10⁻² EA12 0.30 69.5 51.518.0 4.2 × 10⁻³ 1.6 × 10⁻² 5.7 × 10⁻³ EA13 450 71.4 52.9 18.5 6.3 × 10⁰2.4 × 10¹ 8.5 × 10⁰ EA14 266 73.3 54.3 19.0 3.6 × 10⁰ 1.4 × 10¹ 4.9 ×10⁰ EA15 440 71.7 53.1 18.6 6.1 × 10⁰ 2.4 × 10¹ 8.3 × 10⁰ EA16 38 71.052.6 18.4 5.3 × 10⁻¹ 2.0 × 10⁰ 7.1 × 10⁻¹ EA17 41 69.7 51.6 18.1 5.9 ×10⁻¹ 2.3 × 10⁰ 7.9 × 10⁻¹ EA18 15 73.6 54.5 19.1 2.0 × 10⁻¹ 7.9 × 10⁻¹2.8 × 10⁻¹ EA19 16 71.6 53.0 18.6 2.2 × 10⁻¹ 8.6 × 10⁻¹ 3.0 × 10⁻¹ EA2034 70.9 52.5 18.4 4.8 × 10⁻¹ 1.9 × 10⁰ 6.5 × 10⁻¹ EA21 12 69.5 51.5 18.01.7 × 10⁻¹ 6.4 × 10⁻¹ 2.2 × 10⁻¹ EA22 43 71.4 52.9 18.5 6.0 × 10⁻¹ 2.3 ×10⁰ 8.0 × 10⁻¹ EB01 1366630 0.010 0.007 0.003 1.4 × 10⁸ 4.6 × 10⁸ 2.0 ×10⁸ EB02 0.085 756.4 534.8 221.6 1.1 × 10⁻⁴ 3.8 × 10⁻⁴ 1.6 × 10⁻⁴ EB031035500 0.010 0.007 0.003 1.0 × 10⁸ 3.5 × 10⁸ 1.5 × 10⁸ EB04 0.075 756.4534.8 221.6 9.9 × 10⁻⁵ 3.4 × 10⁻⁴ 1.4 × 10⁻⁴ EB05 2187740 0.011 0.0080.003 2.0 × 10⁸ 7.3 × 10⁸ 2.7 × 10⁸ EB06 0.093 760.0 534.8 225.2 1.2 ×10⁻⁴ 4.1 × 10⁻⁴ 1.7 × 10⁻⁴ EB07 0.085 756.4 534.8 221.6 1.1 × 10⁻⁴ 3.8 ×10⁻⁴ 1.6 × 10⁻⁴ EB08 0.093 760.0 534.8 225.2 1.2 × 10⁻⁴ 4.1 × 10⁻⁴ 1.7 ×10⁻⁴

TABLE 21 Table 1a5′ Container Organic solvent Void volume HSP distanceto HSP distance to [% by Type ClogP eicosane eicosene Filter Typevolume] Example EA023 PGMEA/PC = 3/7 −0.14 16.9 15.8 UPE EP-SUS 10Example EA024 PGMEA/PC = 9/1 0.48 11.6 9.8 PTFE EP-SUS 10 Example EA025PGMEA/PC = 8/2 0.36 12.1 10.5 Nylon EP-SUS 10 Example EA026 PGMEA/PC =9/1 0.48 11.6 9.8 Nylon-grafted EP-SUS 10 UPE Example EA027 PGMEA/PC =7/3 0.25 12.9 11.4 UPE EP-SUS 10 Example EA028 MMP/PC = 9/1 0.21 11.59.8 PTFE EP-SUS 10 Example EA029 MMP/PC = 7/3 0.07 12.7 11.1 NylonEP-SUS 10 Example EA030 MMP/PC = 6/4 0.00 13.6 12.1 Nylon-grafted EP-SUS10 UPE Example EA031 MMP/PC = 5/5 −0.07 15.7 14.3 Polyimide EP-SUS 10Example EA032 MMP/PC = 5/5 −0.07 15.7 14.3 Polyamide EP-SUS 10 ExampleEA033 MMP/PC = 5/5 −0.07 15.7 14.3 UPE EP-SUS 10 Example EA034 MMP/PC =5/5 −0.07 15.7 14.3 UPE EP-SUS 10 Example EA035 MMP/PC = 5/5 −0.07 15.714.3 UPE EP-SUS 10 Example EA036 MMP/PC = 5/5 −0.07 15.7 14.3 NylonEP-SUS 10 Example EA037 MMP/PC = 5/5 −0.07 15.7 14.3 Nylon EP-SUS 10Example EA038 MMP/PC = 5/5 −0.07 15.7 14.3 Nylon EP-SUS 10 Example EA039MMP/PC = 5/5 −0.07 15.7 14.3 UPE EP-SUS 10 Example EA040 MMP/PC = 5/5−0.07 15.7 14.3 PTFE EP-SUS 10 Example EA041 MMP/PC = 5/5 −0.07 15.714.3 Nylon EP-SUS 10 Example EA042 MMP/PC = 5/5 −0.07 15.7 14.3 UPEEP-SUS 30 Example EA043 MMP/PC = 5/5 −0.07 15.7 14.3 UPE EP-SUS 50Example EA044 MMP/PC = 5/5 −0.07 15.7 14.3 PTFE EP-SUS 30 Example EA045MMP/PC = 5/5 −0.07 15.7 14.3 PTFE EP-SUS 50 Example EA046 MMP/PC = 5/5−0.07 15.7 14.3 UPE PFA 10 Example EA047 MMP/PC = 5/5 −0.07 15.7 14.3PTFE PFA 10 Example EA048 MMP/PC = 5/5 −0.07 15.7 14.3 Nylon PFA 10Comparative MMP/PC = 5/5 −0.07 15.7 14.3 UPE EP-SUS 10 Example EB09Comparative MMP/PC = 5/5 −0.07 15.7 14.3 UPE EP-SUS 10 Example EB10Comparative MMP/PC = 5/5 −0.07 15.7 14.3 PTFE EP-SUS 10 Example EB11Comparative MMP/PC = 5/5 −0.07 15.7 14.3 PTFE EP-SUS 10 Example EB12Comparative MMP/PC = 5/5 −0.07 15.7 14.3 Nylon EP-SUS 10 Example EB13Comparative MMP/PC = 5/5 −0.07 15.7 14.3 Nylon EP-SUS 10 Example EB14Comparative MMP/PC = 5/5 −0.07 15.7 14.3 UPE EP-SUS 10 Example EB15Comparative MMP/PC = 5/5 −0.07 15.7 14.3 Nylon EP-SUS 10 Example EB16

TABLE 22 Table 1b5′ Alkane content (mass ppt) (upper column carbonnumber / lower column ClogP) Maximum Chemical 6 10 12 14 16 18 20 30 4050 Total contained carbon liquid 3.9 6.0 7.0 8.1 9.2 10.2 11.3 16.6 21.927.1 amount number EA023 0 0 0 1 1 2 1 1 0 0 12 18 EA024 0 0 0 1 2 3 2 10 0 16 18 EA025 0 0 1 1 2 1 0 0 0 0 5 16 EA026 0 0 1 1 1 2 1 1 0 0 13 18EA027 0 0 0 1 1 2 3 4 1 0 37 28 EA028 0 0 0 1 1 2 1 1 0 0 12 18 EA029 00 1 1 2 1 0 0 0 0 5 16 EA030 0 0 1 1 2 2 2 1 0 0 16 18 EA031 0 0 1 1 2 32 1 0 0 17 18 EA032 0 0 1 2 3 3 2 1 0 0 19 16 EA033 0 0 0 1 1 2 2 3 1 029 20 EA034 0 0 0 1 1 2 3 3 1 0 32 24 EA035 0 0 0 0 0.01 0.01 0.02 0.020.01 0 0.22 24 EA036 0 0 1 2 2 1 0 0 0 0 6 16 EA037 0 0 1 2 2 1 0 0 0 06 16 EA038 0 0 0 0 0.01 0.01 0 0 0 0 0.02 18 EA039 0 0 5 10 20 38 42 4112 5 461 22 EA040 0 0 3 8 12 20 32 25 5 0 273 22 EA041 0 0 5 10 26 16 00 0 0 57 16 EA042 0 0 0 1 2 2 4 4 1 0 40 26 EA043 0 0 0 1 2 3 4 4 1 0 4126 EA044 0 0 0 1 2 3 2 1 0 0 16 18 EA045 0 0 0 1 2 3 2 1 0 0 16 18 EA0460 0 0 1 1 2 3 4 1 0 37 28 EA047 0 0 0 1 1 2 2 1 0 0 14 18 EA048 0 0 1 12 1 0 0 0 0 5 16 EB09 0 0 0 120 13200 99000 315000 94000 3800 1201389240 22 EB10 0 0 0 0 0 0.01 0.01 0.01 0 0 0.085 20 EB11 0 0 0 80 92081000 205000 93500 2800 130 1076460 22 EB12 0 0 0 0 0 0 0.01 0.01 0 00.075 22 EB13 0 0 220 3200 5100 1200 0 0 0 0 9720 16 EB14 0 0 0 0 0.0080.006 0 0 0 0 0.014 16 EB15 0.07 0.08 0 0 0 0.01 0.01 0.01 0 0 0.085 22EB16 0.06 0.05 0 0 0.008 0.006 0 0 0 0 0.014 16

TABLE 23 Alkene content (mass ppt) Table 1c5′ C_(k)H_(2k) (upper columncarbon number/lower column ClogP) Chemical 6 10 12 20 30 40 50C_(n)H_(m) Total liquid 3.4 5.5 6.6 10.8 16.1 21.4 26.7 (squalene)amount EA023 0 0 0 0 0 0 0 0 0 EA024 0 0 0 0 0 0 0 0 0 EA025 0 0 1 2 3 20 2 38 EA026 0 0 1 2 3 1 0 2 33 EA027 0 0 0 0 0 0 0 0 0 EA028 0 0 0 0 00 0 0 0 EA029 0 0 1 2 3 2 0 2 38 EA030 0 0 1 2 3 1 0 2 33 EA031 0 0 1 32 1 0 2 33 EA032 0 0 1 2 2 1 0 2 28 EA033 0 0 0 0 0 0 0 0 0 EA034 0 0 00 0 0 0 0 0 EA035 0 0 0 0 0 0 0 0 0 EA036 0 0 1 2 3 1 0 2 33 EA037 0 0 12 3 2 0 2 38 EA038 0 0 0.01 0.01 0.03 0.01 0 0.01 0.28 EA039 0 0 0 0 0 00 0 0 EA040 0 0 0 0 0 0 0 0 0 EA041 0 0 5 16 26 22 12 22 385 EA042 0 0 00 0 0 0 0 0 EA043 0 0 0 0 0 0 0 0 0 EA044 0 0 0 0 0 0 0 0 0 EA045 0 0 00 0 0 0 0 0 EA046 0 0 0 0 0 0 0 0 0 EA047 0 0 0 0 0 0 0 0 0 EA048 0 0 12 3 2 0 2 38 EB09 0 0 0 0 0 0 0 0 0 EB10 0 0 0 0 0 0 0 0 0 EB11 0 0 0 00 0 0 0 0 EB12 0 0 0 0 0 0 0 0 0 EB13 0 0 2900 110000 220000 80000 500120000 2178500 EB14 0 0 0 0.005 0.006 0.004 0 0.006 0.081 EB15 0 0 0 0 00 0 0 0 EB16 0 0 0 0.005 0.006 0.004 0 0.006 0.081

TABLE 24 Organic Metal component Ratio 1 Ratio 2 Ratio 3 Table componentMetal Metal Organic Organic Organic 1d5′ total Total ions particlescomponent/ component/ component/ Chemical amount (mass (mass (mass MetalMetal Metal liquid (mass ppt) ppt) ppt) ppt) component particles ionsEA023 12 70.7 52.4 18.3 1.6 × 10⁻¹ 6.3 × 10⁻¹ 2.2 × 10⁻¹ EA024 16 72.653.8 18.8 2.2 × 10⁻¹ 8.5 × 10⁻¹ 3.0 × 10⁻¹ EA025 43 71.0 52.6 18.4 6.0 ×10⁻¹ 2.3 × 10⁰ 8.1 × 10⁻¹ EA026 46 70.3 52.1 18.2 6.4 × 10⁻¹ 2.5 × 10⁰8.6 × 10⁻¹ EA027 37 70.7 52.4 18.3 5.2 × 10⁻¹ 2.0 × 10⁰ 7.0 × 10⁻¹ EA02812 72.6 53.8 18.8 1.6 × 10⁻¹ 6.1 × 10⁻¹ 2.1 × 10⁻¹ EA029 43 71.0 52.618.4 6.0 × 10⁻¹ 2.3 × 10⁰ 8.1 × 10⁻¹ EA030 49 70.3 52.1 18.2 6.9 × 10⁻¹2.7 × 10⁰ 9.3 × 10⁻¹ EA031 50 69.0 51.1 17.9 7.2 × 10⁻¹ 2.8 × 10⁰ 9.7 ×10⁻¹ EA032 47 70.9 52.5 18.4 6.6 × 10⁻¹ 2.5 × 10⁰ 8.9 × 10⁻¹ EA033 290.011 0.008 0.003 2.7 × 10³ 1.0 × 10⁴ 3.6 × 10³ EA034 32 693.9 514.0179.9 4.5 × 10⁻² 1.8 × 10⁻¹ 6.1 × 10⁻² EA035 0.22 71.1 52.7 18.4 3.1 ×10⁻³ 1.2 × 10⁻² 4.2 × 10⁻³ EA036 39 0.009 0.007 0.002 4.1 × 10³ 1.6 ×10⁴ 5.5 × 10³ EA037 44 693.9 514.0 179.9 6.3 × 10^(.2) 2.4 × 10⁻¹ 8.5 ×10⁻² EA038 0.30 69.5 51.5 18.0 4.2 × 10⁻³ 1.6 × 10⁻² 5.7 × 10⁻³ EA039461 71.4 52.9 18.5 6.4 × 10⁰ 2.5 × 10¹ 8.7 × 10⁰ EA040 273 73.3 54.319.0 3.7 × 10⁰ 1.4 × 10¹ 5.0 × 10⁰ EA041 442 71.7 53.1 18.6 6.2 × 10⁰2.4 × 10¹ 8.3 × 10⁰ EA042 40 71.0 52.6 18.4 5.6 × 10⁻¹ 2.2 × 10⁰ 7.6 ×10⁻¹ EA043 41 69.7 51.6 18.1 5.9 × 10⁻¹ 2.3 × 10⁰ 7.9 × 10⁻¹ EA044 1673.6 54.5 19.1 2.2 × 10⁻¹ 8.4 × 10⁻¹ 2.9 × 10⁻¹ EA045 16 71.6 53.0 18.62.2 × 10⁻¹ 8.6 × 10⁻¹ 3.0 × 10⁻¹ EA046 37 70.9 52.5 18.4 5.1 × 10⁻¹ 2.0× 10⁰ 7.0 × 10⁻¹ EA047 14 69.5 51.5 18.0 2.0 × 10⁻¹ 7.8 × 10⁻¹ 2.7 ×10⁻¹ EA048 43 71.4 52.9 18.5 6.0 × 10⁻¹ 2.3 × 10⁰ 8.0 × 10⁻¹ EB091389240 0.010 0.007 0.003 1.4 × 10⁸ 4.6 × 10⁸ 2.0 × 10⁸ EB10 0.085 756.4534.8 221.6 1.1 × 10⁻⁴ 3.8 × 10⁻⁴ 1.6 × 10⁻⁴ EB11 1076460 0.010 0.0070.003 1.1 × 10⁸ 3.6 × 10⁸ 1.5 × 10⁸ EB12 0.075 756.4 534.8 221.6 9.9 ×10⁻⁵ 3.4 × 10⁻⁴ 1.4 × 10⁻⁴ EB13 2188220 0.011 0.008 0.003 2.0 × 10⁸ 7.3× 10⁸ 2.7 × 10⁸ EB14 0.095 760.0 534.8 225.2 1.3 × 10⁻⁴ 4.2 × 10⁻⁴ 1.8 ×10⁻⁴ EB15 0.085 756.4 534.8 221.6 1.1 × 10⁻⁴ 3.8 × 10⁻⁴ 1.6 × 10⁻⁴ EB160.095 760.0 534.8 225.2 1.3 × 10⁻⁴ 4.2 × 10⁻⁴ 1.8 × 10⁻⁴

TABLE 25 Organic solvent Container HSP HSP Void distance distance volumeto to [% by Table 1a6 Type ClogP eicosane eicosene Filter Type volume]Example FA01 IPA 0.07 17.5 15.8 UPE EP-SUS 10 Example FA02 IPA 0.07 17.515.8 PTFE EP-SUS 10 Example FA03 IPA 0.07 17.5 15.8 Nylon EP-SUS 10Example FA04 IPA 0.07 17.5 15.8 UPE EP-SUS 10 Example FA05 IPA 0.07 17.515.8 UPE EP-SUS 10 Example FA06 IPA 0.07 17.5 15.8 UPE EP-SUS 10 ExampleFA07 IPA 0.07 17.5 15.8 Nylon EP-SUS 10 Example FA08 IPA 0.07 17.5 15.8Nylon EP-SUS 10 Example FA09 IPA 0.07 17.5 15.8 Nylon EP-SUS 10 ExampleFA10 IPA 0.07 17.5 15.8 UPE EP-SUS 10 Example FA11 IPA 0.07 17.5 15.8PTFE EP-SUS 10 Example FA12 IPA 0.07 17.5 15.8 Nylon EP-SUS 10Comparative IPA 0.07 17.5 15.8 UPE EP-SUS 10 Example FB01 ComparativeIPA 0.07 17.5 15.8 UPE EP-SUS 10 Example FB02 Comparative IPA 0.07 17.515.8 PTFE EP-SUS 10 Example FB03 Comparative IPA 0.07 17.5 15.8 PTFEEP-SUS 10 Example FB04 Comparative IPA 0.07 17.5 15.8 Nylon EP-SUS 10Example FB05 Comparative IPA 0.07 17.5 15.8 Nylon EP-SUS 10 Example FB06Comparative IPA 0.07 17.5 15.8 UPE EP-SUS 10 Example FB07 ComparativeIPA 0.07 17.5 15.8 Nylon EP-SUS 10 Example FB08

TABLE 26 Table Maximum 1b6 Alkane content (mass ppt) (upper columncarbon number/lower column ClogP) contained Chemical 6 10 12 14 16 18 2030 40 50 Total carbon liquid 3.9 6.0 7.0 8.1 9.2 10.2 11.3 16.6 21.927.1 amount number FA01 0 0 0 1 1 2 2 1 0 0 14 22 FA02 0 0 0 0 1 1 2 1 00 12 22 FA03 0 0 1 1 2 1 0 0 0 0 5 16 FA04 0 0 0 1 1 2 2 I 0 0 14 20FA05 0 0 0 1 1 2 2 1 0 0 14 20 FA06 0 0 0 0 0.01 0.02 0.02 0.01 0 0 0.1320 FA07 0 0 1 I 2 1 0 0 0 0 5 16 FA08 0 0 0 1 2 1 0 0 0 0 4 16 FA09 0 00 0 0.01 0.01 0 0 0 0 0.02 18 FA10 0 0 5 10 25 43 40 20 5 0 308 18 FA110 0 2 6 14 26 18 10 2 0 153 18 FA12 0 0 5 10 15 10 0 0 0 0 40 16 FB01 00 0 40 9700 82000 264000 92000 4100 60 1232450 22 FB02 0 0 0 0 0 0.010.01 0.01 0 0 0.085 22 FB03 0 0 0 58 890 69000 205000 82000 3900 101011980 22 FB04 0 0 0 0 0 0 0.01 0.01 0 0 0.08 24 FB05 0 0 190 2200 39001000 0 0 0 0 7290 16 FB06 0 0 0 0 0.007 0.005 0 0 0 0 0.012 16 FB07 0.070.07 0 0 0 0.01 0.01 0.01 0 0 0.085 20 FB08 0.05 0.05 0 0 0.007 0.005 00 0 0 0.012 16

TABLE 27 Table Alkene content (mass ppt) 1c6 C_(k)H_(2k) (upper columncarbon number/lower column ClogP) Chemical 6 10 12 20 30 40 50C_(n)H_(m) Total liquid 3.4 5.5 6.6 10.8 16.1 21.4 26.7 (squalene)amount FA01 0 0 0 0 0 0 0 0 0 FA02 0 0 0 0 0 0 0 0 0 FA03 0 0 1 1 2 1 02 25 FA04 0 0 0 0 0 0 0 0 0 FA05 0 0 0 0 0 0 0 0 0 FA06 0 0 0 0 0 0 0 00 FA07 0 0 1 2 3 1 0 2 35 FA08 0 0 1 2 2 2 0 2 35 FA09 0 0 0.01 0.010.03 0.01 0 0.01 0.29 FA10 0 0 0 0 0 0 0 0 0 FA11 0 0 0 0 0 0 0 0 0 FA120 0 5 16 23 22 12 22 370 FB01 0 0 0 0 0 0 0 0 0 FB02 0 0 0 0 0 0 0 0 0FB03 0 0 0 0 0 0 0 0 0 FB04 0 0 0 0 0 0 0 0 0 FB05 0 0 2000 89000 14000060000 2000 90000 1545000 FB06 0 0 0 0.005 0.006 0.004 0 0.006 0.081 FB070 0 0 0 0 0 0 0 0 FB08 0 0 0 0.005 0.006 0.004 0 0.005 0.08

TABLE 28 Organic Metal component Ratio 1 Ratio 2 Ratio 3 Table componentMetal Metal Organic Organic Organic 1d6 total Total ions particlescomponent/ component/ component/ Chemical amount (mass (mass (mass MetalMetal Metal liquid (mass ppt) ppt) ppt) ppt) component particles ionsFA01 14 71.0 52.6 18.4 2.0 × 10⁻¹ 7.6 × 10⁻¹ 2.7 × 10⁻¹ FA02 12 72.954.0 18.9 1.6 × 10⁻¹ 6.3 × 10⁻¹ 2.2 × 10⁻¹ FA03 30 71.3 52.8 18.5 4.1 ×10⁻¹ 1.6 × 10⁰ 5.6 × 10⁻¹ FA04 14 0.011 0.008 0.003 1.3 × 10³ 5.0 × 10³1.8 × 10³ FA05 14 680.4 504.0 176.4 2.1 × 10⁻² 7.9 × 10⁻² 2.8 × 10⁻²FA06 0.13 71.7 53.1 18.6 1.8 × 10⁻³ 7.0 × 10⁻³ 2.4 × 10⁻³ FA07 40 0.0110.008 0.003 3.7 × 10³ 1.4 × 10⁴ 4.9 × 10³ FA08 39 691.2 512.0 179.2 5.6× 10⁻² 2.1 × 10⁻¹ 7.5 × 10⁻² FA09 0.31 69.5 51.5 18.0 4.4 × 10⁻³ 1.7 ×10⁻² 5.9 × 10⁻³ FA10 308 73.4 54.4 19.0 4.2 × 10⁰ 1.6 × 10¹ 5.7 × 10⁰FA11 153 71.4 52.9 18.5 2.1 × 10⁰ 8.3 × 10⁰ 2.9 × 10⁰ FA12 410 70.7 52.418.3 5.8 × 10⁰ 2.2 × 10¹ 7.8 × 10⁰ FB01 1232450 0.010 0.007 0.003 1.2 ×10⁸ 4.1 × 10⁸ 1.8 × 10⁸ FB02 0.085 773.2 548.0 225.2 1.1 × 10⁻⁴ 3.8 ×10⁻⁴ 1.6 × 10⁻⁴ FB03 1011980 0.010 0.007 0.003 1.0 × 10⁸ 3.4 × 10⁸ 1.4 ×10⁸ FB04 0.075 769.6 548.0 221.6 9.7 × 10⁻⁵ 3.4 × 10⁻⁴ 1.4 × 10⁻⁴ FB051552290 0.010 0.007 0.003 1.6 × 10⁸ 5.2 × 10⁸ 2.2 × 10⁸ FB06 0.093 773.2548.0 225.2 1.2 × 10⁻⁴ 4.1 × 10⁻⁴ 1.7 × 10⁻⁴ FB07 0.085 773.2 548.0225.2 1.1 × 10⁻⁴ 3.8 × 10⁻⁴ 1.6 × 10⁻⁴ FB08 0.092 773.2 548.0 225.2 1.2× 10⁻⁴ 4.1 × 10⁻⁴ 1.7 × 10⁻⁴

TABLE 29 Organic solvent HSP HSP Container distance distance Void to tovolume Table 1a7 Type ClogP eicosane eicosene Filter Type [% by volume]Example GA01 MIBC 1.53 12.8 11.1 UPE EP-SUS 10 Example GA02 MIBC 1.5312.8 11.1 PTFE EP-SUS 10 Example GA03 MIBC 1.53 12.8 11.1 Nylon EP-SUS10 Example GA04 MIBC 1.53 12.8 11.1 UPE EP-SUS 10 Example GA05 MIBC 1.5312.8 11.1 UPE EP-SUS 10 Example GA06 MIBC 1.53 12.8 11.1 UPE EP-SUS 10Example GA07 MIBC 1.53 12.8 11.1 Nylon EP-SUS 10 Example GA08 MIBC 1.5312.8 11.1 Nylon EP-SUS 10 Example GA09 MIBC 1.53 12.8 11.1 Nylon EP-SUS10 Example GA10 MIBC 1.53 12.8 11.1 UPE EP-SUS 10 Example GA11 MIBC 1.5312.8 11.1 PTFE EP-SUS 10 Example GA12 MIBC 1.53 12.8 11.1 Nylon EP-SUS10 Comparative MIBC 1.53 12.8 11.1 UPE EP-SUS 10 Example GB01Comparative MIBC 1.53 12.8 11.1 UPE EP-SUS 10 Example GB02 ComparativeMIBC 1.53 12.8 11.1 PTFE EP-SUS 10 Example GB03 Comparative MIBC 1.5312.8 11.1 PTFE EP-SUS 10 Example GB04 Comparative MIBC 1.53 12.8 11.1Nylon EP-SUS 10 Example GB05 Comparative MIBC 1.53 12.8 11.1 NylonEP-SUS 10 Example GB06 Comparative MIBC 1.53 12.8 11.1 UPE EP-SUS 10Example GB07 Comparative MIBC 1.53 12.8 11.1 Nylon EP-SUS 10 ExampleGB08

TABLE 30 Table Maximum 1b7 Alkane content (mass ppt) (upper columncarbon number/lower column ClogP) contained Chemical 6 10 12 14 16 18 2030 40 50 Total carbon liquid 3.9 6.0 7.0 8.1 9.2 10.2 11.3 16.6 21.927.1 amount number GA01 0 0 0 1 1 2 1 1 0 0 12 18 GA02 0 0 0 0 1 1 2 1 00 12 22 GA03 0 0 1 1 2 1 0 0 0 0 5 16 GA04 0 0 0 1 1 2 2 1 0 0 14 20GA05 0 0 0 1 1 2 1 1 0 0 12 18 GA06 0 0 0 0 0.01 0.02 0.02 0.01 0 0 0.1320 GA07 0 0 1 1 2 1 0 0 0 0 5 16 GA08 0 0 0 1 2 1 0 0 0 0 4 16 GA09 0 00 0 0.01 0.01 0 0 0 0 0.02 16 GA10 0 0 5 10 22 40 35 12 5 0 250 18 GA110 0 2 8 16 28 20 8 2 0 154 18 GA12 0 0 5 10 15 10 0 0 0 0 40 16 GB01 0 00 60 10500 84000 284000 82000 4200 70 1235810 22 GB02 0 0 0 0 0 0.010.01 0.01 0 0 0.085 22 GB03 0 0 0 48 820 72000 200000 82000 3500 101000400 24 GB04 0 0 0 0 0 0 0.01 0.01 0 0 0.075 24 GB05 0 0 220 28004700 800 0 0 0 0 8520 16 GB06 0 0 0 0 0.007 0.005 0 0 0 0 0.012 16 GB070.07 0.07 0 0 0 0.01 0.01 0 0 0.035 20 GB08 0.05 0.05 0 0 0.007 0.005 00 0 0 0.012 16

TABLE 31 Table Alkene content (mass ppt) 1c7 C_(k)H_(2k) (upper columncarbon number/lower column ClogP) Chemical 6 10 12 20 30 40 50C_(n)H_(m) Total liquid 3.4 5.5 6.6 10.8 16.1 21.4 26.7 (squalene)amount GA01 0 0 0 0 0 0 0 0 0 GA02 0 0 0 0 0 0 0 0 0 GA03 0 0 0 1 2 1 02 22 GA04 0 0 0 0 0 0 0 0 0 GA05 0 0 0 0 0 0 0 0 0 GA06 0 0 0 0 0 0 0 00 GA07 0 0 1 2 3 1 0 2 35 GA08 0 0 1 2 2 2 0 2 35 GA09 0 0 0.01 0.010.03 0.01 0 0.01 0.29 GA10 0 0 0 0 0 0 0 0 0 GA11 0 0 0 0 0 0 0 0 0 GA120 0 5 16 23 22 12 22 370 GB01 0 0 0 0 0 0 0 0 0 GB02 0 0 0 0 0 0 0 0 0GB03 0 0 0 0 0 0 0 0 0 GB04 0 0 0 0 0 0 0 0 0 GB05 0 0 2200 89000 18500070200 650 120000 1848130 GB06 0 0 0 0.005 0.007 0.004 0 0.006 0.086 GB070 0 0 0 0 0 0 0 0 GB08 0 0 0 0.005 0.006 0.004 0 0.006 0.081

TABLE 32 Organic Metal component Ratio 1 Ratio 2 Ratio 3 Table componentMetal Metal Organic Organic Organic 1d7 total Total ions particlescomponent/ component/ component/ Chemical amount (mass (mass (mass MetalMetal Metal liquid (mass ppt) ppt) ppt) ppt) component particles ionsGA01 12 71.6 53.0 18.6 1.6 × 10⁻¹ 6.2 × 10⁻¹ 2.2 × 10⁻¹ GA02 12 73.454.4 19.0 1.6 × 10⁻¹ 6.3 × 10⁻¹ 2.2 × 10⁻¹ GA03 27 71.8 53.2 18.6 3.8 ×10⁻¹ 1.5 × 10⁰ 5.1 × 10⁻¹ GA04 14 0.011 0.008 0.003 1.3 × 10³ 5.0 × 10³1.8 × 10³ GA05 12 677.7 502.0 175.7 1.7 × 10⁻² 6.5 × 10⁻² 2.3 × 10⁻²GA06 0.13 71.4 52.9 18.5 1.8 × 10⁻³ 7.0 × 10⁻³ 2.5 × 10⁻³ GA07 40 0.0110.008 0.003 3.7 × 10³ 1.4 × 10⁴ 4.9 × 10³ GA08 39 677.7 502.0 175.7 5.7× 10⁻² 2.2 × 10⁻¹ 7.7 × 10⁻² GA09 0.31 69.8 51.7 18.1 4.4 × 10⁻³ 1.7 ×10⁻² 5.9 × 10⁻³ GA10 250 73.7 54.6 19.1 3.4 × 10⁰ 1.3 × 10¹ 4.6 × 10⁰GA11 154 71.7 53.1 18.6 2.1 × 10⁰ 8.3 × 10⁰ 2.9 × 10⁰ GA12 410 71.0 52.618.4 5.8 × 10⁰ 2.2 × 10¹ 7.8 × 10⁰ GB01 1235810 0.010 0.007 0.003 1.2 ×10⁸ 4.1 × 10⁸ 1.8 × 10⁸ GB02 0.085 767.4 542.2 225.2 1.1 × 10⁻⁴ 3.8 ×10⁻⁴ 1.6 × 10⁻⁴ GB03 1000400 0.010 0.007 0.003 1.0 × 10⁸ 3.3 × 10⁸ 1.4 ×10⁸ GB04 0.075 754.2 532.6 221.6 9.9 × 10⁻⁵ 3.4 × 10⁻⁴ 1.4 × 10⁻⁴ GB051856650 0.010 0.007 0.003 1.9 × 10⁸ 6.2 × 10⁸ 2.7 × 10⁸ GB06 0.098 767.4542.2 225.2 1.3 × 10⁻⁴ 4.4 × 10⁻⁴ 1.8 × 10⁻⁴ GB07 0.035 767.4 542.2225.2 4.6 × 10⁻⁵ 1.6 × 10⁻⁴ 6.5 × 10⁻⁵ GB08 0.093 767.4 542.2 225.2 1.2× 10⁻⁴ 4.1 × 10⁻⁴ 1.7 × 10⁻⁴

TABLE 33 Container Organic solvent Void HSP HSP volume distance todistance to [% by Table 1a8 Type ClogP eicosene eicosene Filter Typevolume] Example HA01 nBA 0.76 7.3 5.6 UPE EP-SUS 10 Example HA02 nBA0.76 7.3 5.6 PTFE EP-SUS 10 Example HA03 nBA 0.76 7.3 5.6 Nylon EP-SUS10 Example HA04 nBA 0.76 7.3 5.6 UPE EP-SUS 10 Example HA05 nBA 0.76 7.35.6 UPE EP-SUS 10 Example HA06 nBA 0.76 7.3 5.6 UPE EP-SUS 10 ExampleHA07 nBA 0.76 7.3 5.6 Nylon EP-SUS 10 Example HA08 nBA 0.76 7.3 5.6Nylon EP-SUS 10 Example HA09 nBA 0.76 7.3 5.6 Nylon EP-SUS 10 ExampleHA10 nBA 0.76 7.3 5.6 UPE EP-SUS 10 Example HA11 nBA 0.76 7.3 5.6 PTFEEP-SUS 10 Example HA12 nBA 0.76 7.3 5.6 Nylon EP-SUS 10 Example HA13 nBA0.76 7.3 5.6 UPE EP-SUS 30 Example HA14 nBA 0.76 7.3 5.6 UPE EP-SUS 50Example HA15 nBA 0.76 7.3 5.6 UPE PFA 10 Example HA16 nBA 0.76 7.3 5.6PTFE PFA 10 Example HA17 nBA 0.76 7.3 5.6 Nylon PFA 10 ComparativeExample nBA 0.76 7.3 5.6 UPE EP-SUS 10 HB01 Comparative Example nBA 0.767.3 5.6 UPE EP-SUS 10 HB02 Comparative Example nBA 0.76 7.3 5.6 PTFEEP-SUS 10 HB03 Comparative Example nBA 0.76 7.3 5.6 PTFE EP-SUS 10 HB04Comparative Example nBA 0.76 7.3 5.6 Nylon EP-SUS 10 HB05 ComparativeExample nBA 0.76 7.3 5.6 Nylon EP-SUS 10 HB06 Comparative Example nBA0.76 7.3 5.6 UPE EP-SUS 10 HB07 Comparative Example nBA 0.76 7.3 5.6Nylon EP-SUS 10 HB08

TABLE 34 Table Maximum 1b8 Alkane content (mass ppt) (upper columncarbon number/lower column ClogP) contained Chemical 6 10 12 14 16 18 2030 40 50 Total carbon liquid 3.9 6.0 7.0 8.1 9.2 10.2 11.3 16.6 21.927.1 amount number HA01 0 0 0 1 1 2 3 4 1 0 37 28 HA02 0 0 0 1 1 2 2 1 00 14 20 HA03 0 0 1 1 2 1 0 0 0 0 5 16 HA04 0 0 0 1 1 2 3 3 1 0 32 24HA05 0 0 0 1 1 2 4 3 1 0 34 22 HA06 0 0 0 0 0.01 0.01 0.02 0.02 0.01 00.22 24 HA07 0 0 1 1 2 1 0 0 0 0 5 16 HA08 0 0 1 1 2 1 0 0 0 0 5 16 HA090 0 0 0 0.01 0.01 0 0 0 0 0.02 18 HA10 0 0 5 10 25 40 48 42 12 2 477 22HA11 0 0 3 8 12 20 32 29 5 0 293 22 HA12 0 0 5 10 25 15 0 0 0 0 55 16HA13 0 0 0 1 1 2 3 4 1 0 37 28 HA14 0 0 0 1 2 3 3 4 1 0 39 28 HA15 0 0 01 1 2 2 4 1 0 34 28 HA16 0 0 0 I 1 2 1 1 0 0 12 18 HA17 0 0 1 1 2 1 0 00 0 5 16 HB01 0 0 0 120 14000 96000 310000 89000 4200 110 1351510 22HB02 0 0 0 0 0 0.01 0.01 0.01 0 0 0.085 22 HB03 0 0 0 89 980 82500240000 98000 4100 120 1194490 24 HB04 0 0 0 0 0 0 0.01 0.01 0 0 0.075 24HB05 0 0 250 3100 5100 1000 0 0 0 0 9450 16 HB06 0 0 0 0 0.007 0.005 0 00 0 0.012 16 HB07 0.07 0.07 0 0 0 0.01 0.01 0.01 0 0 0.085 22 HB08 0.050.05 0 0 0.007 0.005 0 0 0 0 0.012 16

TABLE 35 Table Alkene content (mass ppt) 1c8 C_(k)H_(2k) (upper columncarbon number/lower column ClogP) Chemical 6 10 12 20 30 40 50C_(n)H_(m) Total liquid 3.4 5.5 6.6 10.8 16.1 21.4 26.7 (squalene)amount HA01 0 0 0 0 0 0 0 0 0 HA02 0 0 0 0 0 0 0 0 0 HA03 0 0 1 3 3 2 02 43 HA04 0 0 0 0 0 0 0 0 0 HA05 0 0 0 0 0 0 0 0 0 HA06 0 0 0 0 0 0 0 00 HA07 0 0 1 2 3 1 0 2 33 HA08 0 0 1 2 3 2 0 2 38 HA09 0 0 0.01 0.010.03 0.01 0 0.01 0.28 HA10 0 0 0 0 0 0 0 0 0 HA11 0 0 0 0 0 0 0 0 0 HA120 0 5 18 24 28 12 22 415 HA13 0 0 0 0 0 0 0 0 0 HA14 0 0 0 0 0 0 0 0 0HA15 0 0 0 0 0 0 0 0 0 HA16 0 0 0 0 0 0 0 0 0 HA17 0 0 1 2 3 2 0 2 38HB01 0 0 0 0 0 0 0 0 0 HB02 0 0 0 0 0 0 0 0 0 HB03 0 0 0 0 0 0 0 0 0HB04 0 0 0 0 0 0 0 0 0 HB05 0 0 3800 13500 222000 80500 500 1350001725750 HB06 0 0 0 0.005 0.006 0.004 0 0.006 0.081 HB07 0 0 0 0 0 0 0 00 HB08 0 0 0 0.005 0.006 0.004 0 0.006 0.081

TABLE 36 Organic component Metal component Ratio 1 Ratio 2 Ratio 3 Tabletotal Metal Metal Organic Organic Organic 1d8 amount Total ionsparticles component/ component/ component/ Chemical (mass (mass (mass(mass Metal Metal Metal liquid ppt) ppt) ppt) ppt) component particlesions HA01 37 71.8 53.2 18.6 5.1 × 10⁻¹ 2.0 × 10⁰ 6.9 × 10⁻¹ HA02 14 73.254.2 19.0 1.9 × 10⁻¹ 7.4 × 10⁻¹ 2.6 × 10⁻¹ HA03 48 69.9 51.8 18.1 6.8 ×10⁻¹ 2.6 × 10⁰ 9.2 × 10⁻¹ HA04 32 0.009 0.007 0.002 3.3 × 10³ 1.3 × 10⁴4.5 × 10³ HA05 34 691.5 512.2 179.3 4.9 × 10⁻² 1.9 × 10⁻¹ 6.6 × 10⁻²HA06 0.22 72.6 53.8 18.8 3.0 × 10⁻³ 1.2 × 10⁻² 4.1 × 10⁻³ HA07 38 0.0110.008 0.003 3.5 × 10³ 1.3 × 10⁴ 4.7 × 10³ HA08 43 691.5 512.2 179.3 6.1× 10⁻² 2.4 × 10⁻¹ 8.3 × 10⁻² HA09 0.30 71.7 53.1 18.6 4.1 × 10⁻³ 1.6 ×10⁻² 5.6 × 10⁻³ HA10 477 73.6 54.5 19.1 6.5 × 10⁰ 2.5 × 10¹ 8.8 × 10⁰HA11 293 72.0 53.3 18.7 4.1 × 10⁰ 1.6 × 10¹ 5.5 × 10⁰ HA12 470 71.3 52.818.5 6.6 × 10⁰ 2.5 × 10¹ 8.9 × 10⁰ HA13 37 69.8 51.7 18.1 5.2 × 10⁻¹ 2.0× 10⁰ 7.1 × 10⁻¹ HA14 39 71.7 53.1 18.6 5.4 × 10⁻¹ 2.1 × 10⁰ 7.3 × 10⁻¹HA15 34 73.6 54.5 19.1 4.6 × 10⁻¹ 1.8 × 10⁰ 6.2 × 10⁻¹ HA16 12 72.0 53.318.7 1.6 × 10⁻¹ 6.2 × 10⁻¹ 2.2 × 10⁻¹ HA17 43 71.3 52.8 18.5 6.0 × 10⁻¹2.3 × 10⁰ 8.0 × 10⁻¹ HB01 1351510 0.010 0.007 0.003 1.4 × 10⁸ 4.5 × 10⁸1.9 × 10⁸ HB02 0.085 795.8 574.2 221.6 1.1 × 10⁻⁴ 3.8 × 10⁻⁴ 1.5 × 10⁻⁴HB03 1194490 0.011 0.008 0.003 1.1 × 10⁸ 4.0 × 10⁸ 1.5 × 10⁸ HB04 0.075795.8 574.2 221.6 9.4 × 10⁻⁵ 3.4 × 10⁻⁴ 1.3 × 10⁻⁴ HB05 1735200 0.0100.007 0.003 1.7 × 10⁸ 5.8 × 10⁸ 2.5 × 10⁸ HB06 0.093 799.4 574.2 225.21.2 × 10⁻⁴ 4.1 × 10⁻⁴ 1.6 × 10⁻⁴ HB07 0.085 795.8 574.2 221.6 1.1 × 10⁻⁴3.8 × 10⁻⁴ 1.5 × 10⁻⁴ HB08 0.093 799.4 574.2 225.2 1.2 × 10⁻⁴ 4.1 × 10⁻⁴1.6 × 10⁻⁴

TABLE 37 Organic solvent Container HSP HSP Void distance distance volumeto to [% by Table 1a9 Type ClogP eicosene eicosene Filter Type volume]Example IA01 PGMEA 0.26 11.3 9.5 UPE EP-SUS 10 Example IA02 PGMEA 0.2611.3 9.5 PTFE EP-SUS 10 Example IA03 PGMEA 0.26 11.3 9.5 Nylon EP-SUS 10Example IA04 PGMEA 0.26 11.3 9.5 Nylon-grafted UPE EP-SUS 10 ExampleIA05 PGMEA 0.26 11.3 9.5 Polyimide EP-SUS 10 Example 1A06 PGMEA 0.2611.3 9.5 Polyamide EP-SUS 10 Example IA07 PGMEA 0.26 11.3 9.5 UPE EP-SUS10 Example IA08 PGMEA 0.26 11.3 9.5 UPE EP-SUS 10 Example IA09 PGMEA0.26 11.3 9.5 UPE EP-SUS 10 Example IA10 PGMEA 0.26 11.3 9.5 NylonEP-SUS 10 Example IA11 PGMEA 0.26 11.3 9.5 Nylon EP-SUS 10 Example IA12PGMEA 0.26 11.3 9.5 Nylon EP-SUS 10 Example IA13 PGMEA 0.26 11.3 9.5 UPEEP-SUS 10 Example IA14 PGMEA 0.26 11.3 9.5 PTFE EP-SUS 10 Example IA15PGMEA 0.26 11.3 9.5 Nylon EP-SUS 10 Example IA16 PGMEA 0.26 11.3 9.5 UPEEP-SUS 30 Example IA17 PGMEA 0.26 11.3 9.5 UPE PFA 10 Comparative PGMEA0.26 11.3 9.5 UPE EP-SUS 10 Example IB01 Comparative PGMEA 0.26 11.3 9.5UPE EP-SUS 10 Example IB02 Comparative PGMEA 0.26 11.3 9.5 PTFE EP-SUS10 Example IB03 Comparative PGMEA 0.26 11.3 9.5 PTFE EP-SUS 10 ExampleIB04 Comparative PGMEA 0.26 11.3 9.5 Nylon EP-SUS 10 Example IB05Comparative PGMEA 0.26 11.3 9.5 Nylon EP-SUS 10 Example IB06

TABLE 38 Table 1b9 Maximum Che- Alkane content (mass ppt) (upper columncarbon number/lower column ClogP) contained mical 6 10 12 14 16 18 20 3040 50 Total carbon liquid 3.9 6.0 7.0 8.1 9.2 10.2 11.3 16.6 21.9 27.1amount number IA01 0 0 0 1 1 2 3 2 1 0 27 22 IA02 0 0 0 1 1 2 1 1 0 0 1218 IA03 0 0 1 1 2 1 0 0 0 0 5 16 IA04 0 0 1 1 2 3 1 1 0 0 15 18 IA05 0 01 1 2 2 1 1 0 0 14 18 IA06 0 0 1 2 3 2 2 1 0 0 18 16 IA07 0 0 0 1 1 2 22 1 0 24 22 IA08 0 0 0 1 1 2 3 2 1 0 27 24 IA09 0 0 0 0 0.01 0.01 0.020.02 0.01 0 0.22 22 IA10 0 0 1 1 2 1 0 0 0 0 5 16 IA11 0 0 1 1 2 1 0 0 00 5 16 IA12 0 0 0 0 0.01 0.01 0 0 0 0 0.02 18 IA13 0 0 5 10 20 35 37 3512 5 415 20 IA14 0 0 3 8 12 18 30 25 5 0 266 22 IA15 0 0 5 10 25 15 0 00 0 55 16 IA16 0 0 0 1 2 3 3 2 1 0 29 18 IA17 0 0 0 1 1 2 2 1 0 0 14 20IB01 0 0 0 100 13000 94000 270000 91000 4100 150 1258130 22 IB02 0 0 0 00 0.01 0.01 0.01 0 0 0.085 22 IB03 0 0 0 64 920 81500 220000 93000 4000150 1118010 22 IB04 0 0 0 0 0 0 0.01 0.01 0 0 0.075 22 IB05 0 0 243 31004700 970 0 0 0 0 9013 16 IB06 0 0 0 0 0.007 0.005 0 0 0 0 0.012 16

TABLE 39 Table Alkene content (mass ppt) 1c9 C_(k)H_(2k) (upper columncarbon number/lower column ClogP) Chemical 6 10 12 20 30 40 50C_(n)H_(m) liquid 3.4 5.5 6.6 10.8 16.1 21.4 26.7 (squalene) Totalamount IA01 0 0 0 0 0 0 0 0 0 IA02 0 0 0 0 0 0 0 0 0 IA03 0 0 1 2 3 2 02 38 IA04 0 0 1 2 3 1 0 2 33 IA05 0 0 1 3 2 1 0 2 33 IA06 0 0 1 2 2 1 02 28 IA07 0 0 0 0 0 0 0 0 0 IA08 0 0 0 0 0 0 0 0 0 IA09 0 0 0 0 0 0 0 00 IA10 0 0 1 2 3 1 0 2 33 IA11 0 0 1 2 3 2 0 2 38 IA12 0 0 0.01 0.010.03 0.01 0 0.01 0.28 IA13 0 0 0 0 0 0 0 0 0 IA14 0 0 0 0 0 0 0 0 0 IA150 0 5 16 26 22 12 22 385 IA16 0 0 0 0 0 0 0 0 0 IA17 0 0 0 0 0 0 0 0 0IB01 0 0 0 0 0 0 0 0 0 IB02 0 0 0 0 0 0 0 0 0 IB03 0 0 0 0 0 0 0 0 0IB04 0 0 0 0 0 0 0 0 0 IB05 0 0 2900 120000 210000 85500 550 1250002211130 IB06 0 0 0 0.005 0.006 0.004 0 0.006 0.081

TABLE 40 Ratio 1 Ratio 2 Ratio 3 Organic Metal component Organic OrganicOrganic Table 1d9 component Metal component/ component/ component/Chemical total amount Total Metal ions particles Metal Metal Metalliquid (mass ppt) (mass ppt) (mass ppt) (mass ppt) component particlesions IA01 27 71.7 53.1 18.6 3.7 × 10⁻¹ 1.4 × 10⁰ 5.0 × 10⁻¹ IA02 12 70.352.1 18.2 1.6 × 10⁻¹ 6.3 × 10⁻¹ 2.2 × 10⁻¹ IA03 43 72.0 53.3 18.7 5.9 ×10⁻¹ 2.3 × 10⁰ 8.0 × 10⁻¹ IA04 48 74.1 54.9 19.2 6.3 × 10⁻¹ 2.4 × 10⁰8.6 × 10⁻¹ IA05 47 74.5 55.2 19.3 6.2 × 10⁻¹ 2.4 × 10⁰ 8.3 × 10⁻¹ IA0646 73.0 54.1 18.9 6.2 × 10⁻¹ 2.4 × 10⁰ 8.4 × 10⁻¹ IA07 24 0.416 0.3080.108 5.8 × 10⁻¹ 2.2 × 10² 7.8 × 10¹ IA08 27 678.1 502.3 175.8 3.9 ×10⁻² 1.5 × 10⁻¹ 5.3 × 10⁻² IA09 0.22 71.3 52.8 18.5 3.1 × 10⁻³ 1.2 ×10⁻² 4.2 × 10⁻³ IA10 38 0.416 0.308 0.108 9.0 × 10⁻¹ 3.5 × 10² 1.2 × 10²IA11 43 677.8 502.1 175.7 6.3 × 10⁻² 2.4 × 10⁻¹ 8.5 × 10⁻² IA12 0.3071.8 53.2 18.6 4.1 × 10⁻³ 1.6 × 10⁻² 5.5 × 10⁻³ IA13 415 70.5 52.2 18.35.9 × 10⁰ 2.3 × 10¹ 8.0 × 10⁰ IA14 266 72.4 53.6 18.8 3.7 × 10⁰ 1.4 ×10¹ 5.0 × 10⁰ IA15 440 74.0 54.8 19.2 5.9 × 10⁰ 2.3 × 10¹ 8.0 × 10⁰ IA1629 72.2 53.5 18.7 3.9 × 10⁻¹ 1.5 × 10⁰ 5.3 × 10⁻¹ IA17 14 74.0 54.8 19.21.9 × 10⁻¹ 7.3 × 10⁻¹ 2.6 × 10⁻¹ IB01 1258130 0.310 0.307 0.003 4.1 ×10⁶ 4.2 × 10⁸ 4.1 × 10⁶ IB02 0.085 754.5 532.9 221.6 1.1 × 10⁻⁴ 3.8 ×10⁻⁴ 1.6 × 10⁻⁴ IB03 1118010 0.379 0.281 0.10 3.0 × 10⁶ 1.1 × 10⁷ 4.0 ×10⁶ IB04 0.075 754.3 532.7 221.6 9.9 × 10⁻⁵ 3.4 × 10⁻⁴ 1.4 × 10⁻⁴ IB052220143 0.011 0.008 0.003 2.0 × 10⁸ 7.4 × 10⁸ 2.8 × 10⁸ IB06 0.093 767.4542.2 225.2 1.2 × 10⁻⁴ 4.1 × 10⁻⁴ 1.7 × 10⁻⁴

TABLE 41 Container Organic solvent Void volume HSP distance to HSPdistance to [% by Table 1a10 Type ClogP eicosane eicosene Filter Typevolume] Example JA01 MIBC 1.53 12.8 11.1 UPE EP-SUS 10 Example JA02 MIBC1.53 12.8 11.1 PTFE EP-SUS 10 Example JA03 MIBC 1.53 12.8 11.1 NylonEP-SUS 10 Example JA04 MIBC 1.53 12.8 11.1 UPE EP-SUS 10 Example JA05MIBC 1.53 12.8 11.1 UPE EP-SUS 10 Example JA06 MIBC 1.53 12.8 11.1 UPEEP-SUS 10 Example JA07 MIBC 1.53 12.8 11.1 Nylon EP-SUS 10 Example JA08MIBC 1.53 12.8 11.1 Nylon EP-SUS 10 Example JA09 MIBC 1.53 12.8 11.1Nylon EP-SUS 10 Example JA10 MIBC 1.53 12.8 11.1 UPE EP-SUS 10 ExampleJA11 MIBC 1.53 12.8 11.1 PTFE EP-SUS 10 Example JA12 MIBC 1.53 12.8 11.1Nylon EP-SUS 10 Comparative MIBC 1.53 12.8 11.1 UPE EP-SUS 10 ExampleJB01 Comparative MIBC 1.53 12.8 11.1 UPE EP-SUS 10 Example JB02Comparative MIBC 1.53 12.8 11.1 PTFE EP-SUS 10 Example JB03 ComparativeMIBC 1.53 12.8 11.1 PTFE EP-SUS 10 Example JB04 Comparative MIBC 1.5312.8 11.1 Nylon EP-SUS 10 Example JB05 Comparative MIBC 1.53 12.8 11.1Nylon EP-SUS 10 Example JB06

TABLE 42 Table Maximum 1b10 Alkane content (mass ppt) (upper columncarbon number/lower column ClogP) contained Chemical 6 10 12 14 16 18 2030 40 50 Total carbon liquid 3.9 6.0 7.0 8.1 9.2 10.2 11.3 16.6 21.927.1 amount number JA01 0 0 0 1 1 2 I 1 0 0 12 18 JA02 0 0 0 0 1 I 2 1 00 12 22 JA03 0 0 1 1 2 1 0 0 0 0 5 16 JA04 0 0 0 1 1 2 2 1 0 0 14 22JA05 0 0 0 1 1 2 1 1 0 0 12 18 JA06 0 0 0 0 0.01 0.02 0.02 0.01 0 0 0.1320 JA07 0 0 1 1 2 1 0 0 0 0 5 16 JA08 0 0 0 1 2 1 0 0 0 0 4 16 JA09 0 00 0 0.01 0.01 0 0 0 0 0.02 18 JA10 0 0 5 10 23 42 33 11 4 0 238 18 JA110 0 2 8 16 32 20 8 1 0 153 18 JA12 0 0 5 10 15 8 0 0 0 0 38 16 JB01 0 00 68 12000 89000 290000 92000 4200 70 1307310 22 JB02 0 0 0 0 0 0.010.01 0.01 0 0 0.085 22 JB03 0 0 0 47 820 71000 200000 83000 3600 101004900 22 JB04 0 0 0 0 0 0 0.01 0.01 0 0 0.075 24 JB05 0 0 220 28004500 800 0 0 0 0 8320 16 JB06 0 0 0 0 0.007 0.005 0 0 0 0 0.012 16

TABLE 43 Table Alkene content (mass ppt) 1c10 C_(k)H_(2k) (upper columncarbon number/lower column ClogP) Chemical 6 10 12 20 30 40 50C_(n)H_(m) liquid 3.4 5.5 6.6 10.8 16.1 21.4 26.7 (squalene) Totalamount JA01 0 0 0 0 0 0 0 0 0 JA02 0 0 0 0 0 0 0 0 0 JA03 0 0 0 1 2 1 02 22 JA04 0 0 0 0 0 0 0 0 0 JA05 0 0 0 0 0 0 0 0 0 JA06 0 0 0 0 0 0 0 00 JA07 0 0 1 2 3 1 0 2 35 JA08 0 0 1 2 2 2 0 2 35 JA09 0 0 0.01 0.010.03 0.01 0 0.01 0.29 JA10 0 0 0 0 0 0 0 0 0 JA11 0 0 0 0 0 0 0 0 0 JA120 0 5 16 23 22 12 22 370 JB01 0 0 0 0 0 0 0 0 0 JB02 0 0 0 0 0 0 0 0 0JB03 0 0 0 0 0 0 0 0 0 JB04 0 0 0 0 0 0 0 0 0 JB05 0 0 2200 89000 18000069000 7000 120000 1833000 JB06 0 0 0 0.005 0.006 0.004 0 0.006 0.081

TABLE 44 Organic Ratio 1 Ratio 2 component Metal component OrganicOrganic Ratio 3 Table 1d10 total Metal component/ component/ OrganicChemical amount Total Metal ions particles Metal Metal component/ liquid(mass ppt) (mass ppt) (mass ppt) (mass ppt) component particles Metalions JA01 12 71.3 52.8 18.5 1.6 × 10⁻¹ 6.2 × 10⁻¹ 2.2 × 10⁻¹ JA02 1273.2 54.2 19.0 1.6 × 10⁻¹ 6.3 × 10⁻¹ 2.2 × 10⁻¹ JA03 27 71.6 53.0 18.63.8 × 10⁻¹ 1.5 × 10⁰ 5.1 × 10⁻¹ JA04 14 0.008 0.006 0.002 1.7 × 10³ 6.7× 10³ 2.3 × 10³ JA05 12 677.4 501.8 175.6 1.7 × 10⁻² 6.5 × 10⁻² 2.3 ×10⁻² JA06 0.13 71.1 52.7 18.4 1.8 × 10⁻³ 7.0 × 10⁻³ 2.5 × 10⁻³ JA07 400.009 0.007 0.002 4.2 × 10³ 1.6 × 10⁴ 5.6 × 10³ JA08 39 677.4 501.8175.6 5.7 × 10⁻² 2.2 × 10⁻¹ 7.7 × 10⁻² JA09 0.31 69.5 51.5 18.0 4.4 ×10⁻³ I .7 × 10⁻² 5.9 × 10⁻³ JA10 238 73.4 54.4 19.0 3.2 × 10⁰ 1.2 × 10¹4.4 × 10⁰ JA11 153 71.4 52.9 18.5 2.1 × 10⁰ 8.3 × 10⁰ 2.9 × 10⁰ JA12 40870.7 52.4 18.3 5.8 × 10⁰ 2.2 × 10¹ 7.8 × 10⁰ JB01 1307310 0.010 0.0070.003 1.3 × 10⁸ 4.4 × 10⁹ 1.9 × 10⁸ JB02 0.085 767.2 542.0 225.2 1.1 ×10⁻⁴ 3.8 × 10⁻⁴ 1.6 × 10⁻⁴ JB03 1004900 0.011 0.008 0.003 9.1 × 10⁷ 3.3× 10⁸ 1.3 × 10⁸ JB04 0.075 754.0 532.4 221.6 9.9 × 10⁻³ 3.4 × 10⁻⁴ 1.4 ×10⁻¹ JB05 1841320 0.011 0.008 0.003 1.7 × 10⁸ 6.1 × 10⁸ 2.3 × 10⁸ JB060.093 767.2 542.0 225.2 1.2 × 10⁻⁴ 4.1 × 10⁻⁴ 1.7 × 10⁻¹

TABLE 45 Container Organic solvent Void volume HSP distance to HSPdistance to [% by Table 1a11 Type ClogP eicosane eicosene Filter Typevolume] Example KA01 MeOH 0.07 25.5 23.7 UPE EP-SUS 10 Example KA02 MeOH0.07 25.5 23.7 PTFE EP-SUS 10 Example KA03 MeOH 0.07 25.5 23.7 NylonEP-SUS 10 Comparative MeOH 0.07 25.5 23.7 UPE EP-SUS 10 Example KB01Comparative MeOH 0.07 25.5 23.7 PTFE EP-SUS 10 Example KB02 ComparativeMeOH 0.07 25.5 23.7 Nylon EP-SUS 10 Example KB03

TABLE 46 Table Maximum 1b11 Alkane content (mass ppt) (upper columncarbon number/lower column ClogP) contained Chemical 6 10 12 14 16 18 2030 40 50 Total carbon liquid 3.9 6.0 7.0 8.1 9.2 10.2 11.3 16.6 21.927.1 amount number KA01 0 0 0 0.1 0.2 0.5 0.5 0.1 0 0 2.55 22 KA02 0 0 00 0.1 0.2 0.4 0.2 0 0 2.3 22 KA03 0 0 0.1 0.2 0.5 0.2 0 0 0 0 1 16 KB010 0 0 0.01 0.02 0.03 0.01 0 0 0 0.085 18 KB02 0 0 0 0 0.01 0.02 0.01 0 00 0.055 18 KB03 0 0 0 0 0.01 0.01 0 0 0 0 0.02 18

TABLE 47 Alkene content (mass ppt) Table 1c11 C_(k)H_(2k) (upper columncarbon number/lower column ClogP) Chemical 6 10 12 20 30 40 50C_(n)H_(m) Total liquid 3.4 5.5 6.6 10.8 16.1 21.4 26.7 (squalene)amount KA01 0 0 0 0 0 0 0 0 0 KA02 0 0 0 0 0 0 0 0 0 KA03 0 0 0.1 0.20.6 0.1 0 0.2 4.95 KB01 0 0 0 0 0 0 0 0 0 KB02 0 0 0 0 0 0 0 0 0 KB03 00 0 0 0.01 0 0 0.01 0.06

TABLE 48 Organic Ratio 1 component Metal component Organic Ratio 2 Ratio3 Table 1d11 total Metal ions Metal component/ Organic Organic Chemicalamount Total (mass particles Metal component/ component/ liquid (massppt) (mass ppt) ppt) (mass ppt) component Metal particles Metal ionsKA01 2.55 69.9 51.8 18.1 3.6 × 10⁻² 1.4 × 10⁻¹ 4.9 × 10⁻² KA02 2.3 71.853.2 18.6 3.2 × 10⁻² 1.2 × 10⁻¹ 4.3 × 10⁻² KA03 5.95 70.5 52.2 18.3 8.4× 10⁻² 3.3 × 10⁻¹ 1.1 × 10⁻¹ KB01 0.085 88.4 64.6 23.8 9.6 × 10⁻⁴ 3.6 ×10⁻³ 1.3 × 10⁻³ KB02 0.055 91.1 66.2 24.9 6.0 × 10⁻⁴ 2.2 × 10⁻³ 8.3 ×10⁻⁴ KB03 0.08 92.5 67.6 24.9 8.6 × 10⁻⁴ 3.2 × 10⁻³ 1.2 × 10⁻³

TABLE 49 Organic solvent Container HSP Void distance to HSP distance tovolume [% Table 1a12 Type ClogP eicosane eicosene Filter Type by volume]Example LA01 Undecane 6.51 0.0 1.8 UPE EP-SUS 10 Example LA02 Undecane6.51 0.0 1.8 PTFE EP-SUS 10 Example LA03 Undecane 6.51 0.0 1.8 NylonEP-SUS 10 Comparative Undecane 6.51 0.0 1.8 UPE EP-SUS 10 Example LB01Comparative Undecane 6.51 0.0 1.8 PTFE EP-SUS 10 Example LB02Comparative Undecane 6.51 0.0 1.8 Nylon EP-SUS 10 Example LB03

TABLE 50 Table Maximum 1b12 Alkane content (mass ppt) (upper columncarbon number/lower column ClogP) contained Chemical 6 10 12 14 16 18 2030 40 50 Total carbon liquid 3.9 6.0 7.0 8.1 9.2 10.2 11.3 16.6 21.927.1 amount number LA01 0 0 0 4 4 8 12 16 4 0 146 28 LA02 0 0 0 4 4 8 84 0 0 56 20 LA03 0 0 4 4 8 4 0 0 0 0 20 16 LB01 0 0 10 579 2850 98000410000 82000 3500 10 1553970 22 LB02 0 0 3 214 1710 91000 210000 790001050 2 1018180 22 LB03 0 0 9 214 2890 288 0 0 0 0 3401 16

TABLE 51 Table Alkene content (mass ppt) 1c12 C_(k)H_(2k) (upper columncarbon number/lower column ClogP) Chemical 6 10 12 20 30 40 50C_(n)H_(m) liquid 3.4 5.5 6.6 10.8 16.1 21.4 26.7 (squalene) Totalamount LA01 0 0 0 0 0 0 0 0 0 LA02 0 0 0 0 0 0 0 0 0 LA03 0 0 4 12 12 80 8 170 LB01 0 0 0 0 0 0 0 0 0 LB02 0 0 0 0 0 0 0 0 0 LB03 0 0 110075000 120000 59000 4200 120000 1403250

TABLE 52 Ratio 1 Organic Organic Ratio 2 Ratio 3 Table 1d12 componenttotal Metal component component/ Organic Organic Chemical amount TotalMetal ions Metal particles Metal component/ component/ liquid (mass ppt)(mass ppt) (mass ppt) (mass ppt) component Metal particles Metal ionsLA01 146 71.8 53.2 18.6 2.0 × 10⁰ 7.8 × 10⁰ 2.7 × 10⁰ LA02 56 71.3 52.818.5 7.9 × 10⁻¹ 3.0 × 10⁰ 1.1 × 10⁰ LA03 190 69.7 51.6 18.1 2.7 × 10⁰1.1 × 10¹ 3.7 × 10⁰ LB01 1553970 71.0 52.6 18.4 2.2 × 10⁴ 8.4 × 10⁴ 3.0× 10⁴ LB02 1018180 72.9 54.0 18.9 1.4 × 10⁴ 5.4 × 10⁴ 1.9 × 10⁴ LB031406651 71.3 52.8 18.5 2.0 × 10⁴ 7.6 × 10⁴ 2.7 × 10⁴

TABLE 53 Organic solvent Container HSP distance HSP distance Void volumeTable 1a13 Type ClogP to eicosane to eicosene Filter Type [% by volume]Example MA01 Butyl Butyrate 2.83 6.4 4.6 UPE EP-SUS 10 Example MA02Butyl Butyrate 2.83 6.4 4.6 PTFE EP-SUS 10 Example MA03 Butyl Butyrate2.83 6.4 4.6 Nylon EP-SUS 10 Comparative Example Butyl Butyrate 2.83 6.44.6 UPE EP-SUS 10 MB01 Comparative Example Butyl Butyrate 2.83 6.4 4.6PTFE EP-SUS 10 MB02 Comparative Example Butyl Butyrate 2.83 6.4 4.6Nylon EP-SUS 10 MB03

TABLE 54 Table Alkane content (mass ppt) Maximum 1b13 (upper columncarbon number/lower column ClogP) contained Chemical 6 10 12 14 16 18 2030 40 50 Total carbon liquid 3.9 6.0 7.0 8.1 9.2 10.2 11.3 16.6 21.927.1 amount number MA01 0 0 0 1 2 3 4 5 2 0 51 28 MA02 0 0 0 1 1 2 3 2 10 27 20 MA03 0 0 1 1 3 2 0 0 0 0 7 16 MB01 0 0 5 220 4700 97000 36000087000 4000 90 1351510 22 MB02 0 0 2 120 1480 82500 220000 85000 3100 801074880 22 MB03 0 0 60 4200 5700 1700 20 0 0 0 11710 16

TABLE 55 Table Alkene content (mass ppt) 1c13 C_(k)H_(2k) (upper columncarbon number/lower column ClogP) Chemical 6 10 12 20 30 40 50C_(n)H_(m) Total liquid 3.4 5.5 6.6 10.8 16.1 21.4 26.7 (squalene)amount MA01 0 0 0 0 0 0 0 0 0 MA02 0 0 0 0 0 0 0 0 0 MA03 0 0 3 7 8 7 08 118 MB01 0 0 0 0 0 0 0 0 0 MB02 0 0 0 0 0 0 0 0 0 MB03 0 0 4200 14200231000 82500 600 115000 1765500

TABLE 56 Organic Metal component Ratio 1 Ratio 2 Ratio 3 Table componentMetal Metal Organic Organic Organic 1d13 total Total ions particlescomponent/ component/ component/ Chemical amount (mass (mass (mass MetalMetal Metal liquid (mass ppt) ppt) ppt) ppt) component particles ionsMA01    51 72.1 53.4 18.7 7.1 × 10⁻¹ 2.7 × 10⁰ 9.6 × 10⁻¹ MA02    2771.7 53.1 18.6 3.7 × 10⁻¹ 1.4 × 10⁰ 5.0 × 10⁻¹ MA03   125 69.4 51.4 18.01.8 × 10⁰ 6.9 × 10⁰ 2.4 × 10⁰ MB01 1351510 71.3 52.8 18.5 1.9 × 10⁴ 7.3× 10⁴ 2.6 × 10⁴ MB02 1074880 73.7 54.6 19.1 1.5 × 10⁴ 5.6 × 10⁴ 2.0 ×10⁴ MB03 1777210 70.3 52.1 18.2 2.5 × 10⁴ 9.7 × 10⁴ 3.4 × 10⁴

TABLE 57 Organic solvent Container HSP distance HSP distance Void volumeTable 1a14 Type ClogP to eicosane to eicosene Filter Type [% by volume]Example NA01 Isoamyl Ether 3.78 3.6 2.1 UPE EP-SUS 10 Example NA02Isoamyl Ether 3.78 3.6 2.1 PTFE EP-SUS 10 Example NA03 Isoamyl Ether3.78 3.6 2.1 Nylon EP-SUS 10 Comparative Isoamyl Ether 3.78 3.6 2.1 UPEEP-SUS 10 Example NB01 Comparative Isoamyl Ether 3.78 3.6 2.1 PTFEEP-SUS 10 Example NB02 Comparative Isoamyl Ether 3.78 3.6 2.1 NylonEP-SUS 10 Example NB03

TABLE 58 Table Alkane content (mass ppt) Maximum 1b14 (upper columncarbon number/lower column ClogP) contained Chemical 6 10 12 14 16 18 2030 40 50 Total carbon liquid 3.9 6.0 7.0 8.1 9.2 10.2 11.3 16.6 21.927.1 amount number NA01 0 0 0 3 3 6 8 10 3 0 96 28 NA02 0 0 0 3 3 5 5 31 0 40 20 NA03 0 0 3 3 5 3 0 0 0 0 13 16 NB01 0 0 8 400 3800 97500385000 84500 3750 50 1351510 22 NB02 0 0 3 160 1600 86750 215000 820002050 40 1046400 22 NB03 0 0 35 2200 4300 950 10 0 0 0 7510 16

TABLE 59 Table Alkene content (mass ppt) 1c14 C_(k)H_(2k) (upper columncarbon number/lower column ClogP) Chemical 6 10 12 20 30 40 50C_(n)H_(m) Total liquid 3.4 5.5 6.6 10.8 16.1 21.4 26.7 (squalene)amount NA01 0 0 0 0 0 0 0 0 0 NA02 0 o 0 0 0 0 0 0 0 NA03 0 0 3 7 8 7 08 118 NB01 0 0 0 0 0 0 0 0 0 NB02 0 0 0 0 0 0 0 0 0 NB03 0 0 2600 44500165500 70750 2400 118000 1416250

TABLE 60 Organic Metal component Ratio 1 Ratio 2 Ratio 3 Table componentMetal Metal Organic Organic Organic 1d13 total Total ions particlescomponent/ component/ component/ Chemical amount (mass (mass (mass MetalMetal Metal liquid (mass ppt) ppt) ppt) ppt) component particles ionsNA01    96 67.9 50.3 17.6 1.4 × 10⁰ 5.5 × 10⁰ 1.9 × 10⁰ NA02    40 69.151.2 17.9 5.8 × 10⁻¹ 2.2 × 10⁰ 7.8 × 10⁻¹ NA03   131 67.9 50.3 17.6 1.9× 10⁰ 7.4 × 10⁰ 2.6 × 10⁰ NB01 1351510 67.8 50.2 17.6 2.0 × 10⁴ 7.7 ×10⁴ 2.7 × 10⁴ NB02 1046400 69.7 51.6 18.1 1.5 × 10⁴ 5.8 × 10⁴ 2.0 × 10⁴NB03 1423760 69.4 51.4 18.0 2.1 × 10⁴ 7.9 × 10⁴ 2.8 × 10⁴

TABLE 61 Organic solvent Container HSP distance HSP distance Void volumeTable 1a15 Type ClogP to eicosane to eicosene Filter Type [% by volume]Example OA01 Ethylcyclohexane 4.40 0.4 1.8 UPE EP-SUS 10 Example OA02Ethylcyclohexane 4.40 0.4 1.8 PTFE EP-SUS 10 Example OA03Ethylcyclohexane 4.40 0.4 1.8 Nylon EP-SUS 10 ComparativeEthylcyclohexane 4.40 0.4 1.8 UPE EP-SUS 10 Example OB01 ComparativeEthylcyclohexane 4.40 0.4 1.8 PTFE EP-SUS 10 Example OB02 ComparativeEthylcyclohexane 4.40 0.4 1.8 Nylon EP-SUS 10 Example OB03

TABLE 62 Table Alkane content (mass ppt) Maximum 1b15 (upper columncarbon number/lower column ClogP) contained Chemical 6 10 12 14 16 18 2030 40 50 Total carbon liquid 3.9 6.0 7.0 8.1 9.2 10.2 11.3 16.6 21.927.1 amount number OA01 0 0 0 3 3 6 10 13 3 0 117 28 OA02 0 0 0 3 3 6 63 0 0 45 20 OA03 0 0 3 3 6 3 0 0 0 0 16 16 OB01 0 0 8 470 2280 98500375000 75500 2800 8 1430290 22 OB02 0 0 2 150 1380 86800 215000 75500840 2 1007540 22 OB03 0 0 7 170 2300 230 0 0 0 0 2707 16

TABLE 63 Table Alkene content (mass ppt) 1c15 C_(k)H_(2k) (upper columncarbon number/lower column ClogP) Chemical 6 10 12 20 30 40 50C_(n)H_(m) Total liquid 3.4 5.5 6.6 10.8 16.1 21.4 26.7 (squalene)amount OA01 0 0 0 0 0 0 0 0 0 OA02 0 0 0 0 0 0 0 0 0 OA03 0 0 3 8 8 7 06 123 OB01 0 0 0 0 0 0 0 0 0 OB02 0 0 0 0 0 0 0 0 0 OB03 0 0 770 52500114000 63500 2940 114000 1159280

TABLE 64 Organic Metal component Ratio 1 Ratio 2 Ratio 3 Table componentMetal Metal Organic Organic Organic 1d15 total Total ions particlescomponent/ component/ component/ Chemical amount (mass (mass (mass MetalMetal Metal liquid (mass ppt) ppt) ppt) ppt) component particles ionsOA01   117 75.3 55.8 19.5 1.6 × 10⁰ 6.0 × 10⁰ 2.1 × 10⁰ OA02    45 75.956.2 19.7 5.9 × 10⁻¹ 2.3 × 10⁰ 8.0 × 10⁻¹ OA03   139 77.2 57.2 20.0 1.8× 10⁰ 6.9 × 10⁰ 2.4 × 10⁰ OB01 1430290 76.8 56.9 19.9 1.9 × 10⁴ 7.2 ×10⁴ 2.5 × 10⁴ OB02 1007540 78.0 57.8 20.2 1.3 × 10⁴ 5.0 × 10⁴ 1.7 × 10⁴OB03 1161987 78.4 58.1 20.3 1.5 × 10⁴ 5.7 × 10⁴ 2.0 × 10⁴

TABLE 65 Organic solvent Container HSP distance HSP distance Void volumeTable 1a16 Type ClogP to eicosane to eicosene Filter Type [% by volume]Example PA01 iAA 2.17 7.8 6.0 UPE EP-SUS 10 Example PA02 iAA 2.17 7.86.0 PTFE EP-SUS 10 Example PA03 iAA 2.17 7.8 6.0 Nylon EP-SUS 10 ExamplePA04 iAA 2.17 7.8 6.0 UPE EP-SUS 10 Example PA05 iAA 2.17 7.8 6.0 UPEEP-SUS 10 Example PA06 iAA 2.17 7.8 6.0 UPE EP-SUS 10 Example PA07 iAA2.17 7.8 6.0 Nylon EP-SUS 10 Example PA08 iAA 2.17 7.8 6.0 Nylon EP-SUS10 Example PA09 iAA 2.17 7.8 6.0 Nylon EP-SUS 10 Example PA10 iAA 2.177.8 6.0 UPE EP-SUS 10 Example PA11 iAA 2.17 7.8 6.0 PTFE EP-SUS 10Example PA12 iAA 2.17 7.8 6.0 Nylon EP-SUS 10 Example PA13 iAA 2.17 7.86.0 UPE EP-SUS 30 Example PA14 iAA 2.17 7.8 6.0 UPE EP-SUS 50 ExamplePA15 iAA 2.17 7.8 6.0 UPE PFA 10 Example PA16 iAA 2.17 7.8 6.0 PTFE PFA10 Example PA17 iAA 2.17 7.8 6.0 Nylon PFA 10 Comparative iAA 2.17 7.86.0 UPE EP-SUS 10 Example PB01 Comparative iAA 2.17 7.8 6.0 UPE EP-SUS10 Example PB02 Comparative iAA 2.17 7.8 6.0 PTFE EP-SUS 10 Example PB03Comparative iAA 2.17 7.8 6.0 PTFE EP-SUS 10 Example PB04 Comparative iAA2.17 7.8 6.0 Nylon EP-SUS 10 Example PB05 Comparative iAA 2.17 7.8 6.0Nylon EP-SUS 10 Example PB06 Comparative iAA 2.17 7.8 6.0 UPE EP-SUS 10Example PB07 Comparative iAA 2.17 7.8 6.0 Nylon EP-SUS 10 Example PB08

TABLE 66 Table Alkane content (mass ppt) Maximum 1b16 (upper columncarbon number/lower column ClogP) contained Chemical 6 10 12 14 16 18 2030 40 50 Total carbon liquid 3.9 6.0 7.0 8.1 9.2 10.2 11.3 16.6 21.927.1 amount number PA01 0 0 0 1 1 2 4 4 1 0 39 28 PA02 0 0 0 1 1 2 3 1 00 17 20 PA03 0 0 1 2 3 1 0 0 0 0 7 16 PA04 0 0 0 1 1 2 4 3 1 0 34 24PA05 0 0 0 1 1 2 4 4 1 0 39 22 PA06 0 0 0 0 0.01 0.01 0.02 0.02 0.01 00.22 24 PA07 0 0 1 1 2 1 0 0 0 0 5 16 PA08 0 0 1 1 2 1 0 0 0 0 5 16 PA090 0 0 0 0.01 0.01 0 0 0 0 0.02 18 PA10 0 0 5 10 25 40 46 44 12 2 482 22PA11 0 0 3 8 12 22 30 29 5 0 290 22 PA12 0 0 5 10 25 15 0 0 0 0 55 16PA13 0 0 0 1 1 2 3 4 1 0 37 28 PA14 0 0 0 1 2 3 3 4 1 0 39 28 PA15 0 0 01 1 2 2 4 1 0 34 28 PA16 0 0 0 1 1 2 1 1 0 0 12 18 PA17 0 0 1 1 2 1 0 00 0 5 16 PB01 0 0 0 120 14000 98000 300000 88000 4200 110 1323510 22PB02 0 0 0 0 0 0.01 0.01 0.01 0 0 0.085 22 PB03 0 0 0 89 980 82000240000 98000 4000 120 1193490 24 PB04 0 0 0 0 0 0 0.01 0.01 0 0 0.075 24PB05 0 0 250 3100 5000 1100 0 0 0 0 9450 16 PB06 0 0 0 0 0.007 0.005 0 00 0 0.012 16 PB07 0.07 0.07 0 0 0 0.01 0.01 0.01 0 0 0.085 22 PB08 0.050.05 0 0 0.007 0.005 0 0 0 0 0.012 16

TABLE 67 Table Alkene content (mass ppt) 1c16 C_(k)H_(2k) (upper columncarbon number/lower column ClogP) Chemical 6 10 12 20 30 40 50C_(n)H_(m) Total liquid 3.4 5.5 6.6 10.8 16.1 21.4 26.7 (squalene)amount PA01 0 0 0 0 0 0 0 0 0 PA02 0 0 0 0 0 0 0 0 0 PA03 0 0 1 3 3 2 02 43 PA04 0 0 0 0 0 0 0 0 0 PA05 0 0 0 0 0 0 0 0 0 PA06 0 0 0 0 0 0 0 00 PA07 0 0 1 2 3 1 0 2 33 PA08 0 0 1 2 3 2 0 2 38 PA09 0 0 0.01 0.010.03 0.01 0 0.01 0.28 PA10 0 0 0 0 0 0 0 0 0 PA11 0 0 0 0 0 0 0 0 0 PA120 0 5 18 24 26 12 22 383 PA13 0 0 0 0 0 0 0 0 0 PA14 0 0 0 0 0 0 0 0 0PA15 0 0 0 0 0 0 0 0 0 PA16 0 0 0 0 0 0 0 0 0 PA17 0 0 1 2 3 2 0 2 38PB01 0 0 0 0 0 0 0 0 0 PB02 0 0 0 0 0 0 0 0 0 PB03 0 0 0 0 0 0 0 0 0PB04 0 0 0 0 0 0 0 0 0 PB05 0 0 3600 13500 224000 81000 500 1400001602750 PB06 0 0 0 0.005 0.006 0.004 0 0.006 0.075 PB07 0 0 0 0 0 0 0 00 PB08 0 0 0 0.005 0.006 0.004 0 0.006 0.075

TABLE 68 Organic Ratio 1 component Organic Ratio 2 Ratio 3 Table 1d16total Metal component component/ Organic Organic Chemical amount TotalMetal ions Metal particles Metal component/ component/ liquid (mass ppt)(mass ppt) (mass ppt) (mass ppt) component Metal particles Metal ionsPA01 39 71.6 53.0 18.6 5.5 × 10⁻¹ 2.1 × 10⁰   7.4 × 10⁻¹ PA02 17 72.653.8 18.8 2.3 × 10⁻¹ 8.8 × 10⁻¹ 3.1 × 10⁻¹ PA03 50 69.1 51.2 17.9 7.2 ×10⁻¹ 2.8 × 10⁰   9.7 × 10⁻¹ PA04 34 0.008 0.006 0.002 4.2 × 10³   1.6 ×10⁴   5.7 × 10³   PA05 39 688.8 510.2 178.6 5.7 × 10⁻² 2.2 × 10⁻¹ 7.6 ×10⁻² PA06 0.22 71.4 52.9 18.5 3.1 × 10⁻³ 1.2 × 10⁻² 4.2 × 10⁻³ PA07 380.009 0.007 0.002 4.0 × 10³   1.5 × 10⁴   5.4 × 10³   PA08 43 689.6510.8 178.8 6.2 × 10⁻² 2.4 × 10⁻¹ 8.3 × 10⁻² PA09 0.30 70.9 52.5 18.44.2 × 10⁻³ 1.6 × 10⁻² 5.6 × 10⁻³ PA10 482 73.2 54.2 19.0 6.6 × 10⁰   2.5× 10¹   8.9 × 10⁰   PA11 290 71.8 53.2 18.6 4.0 × 10⁰   1.6 × 10¹   5.5× 10⁰   PA12 438 71.0 52.6 18.4 6.2 × 10⁰   2.4 × 10¹   8.3 × 10⁰   PA1337 69.7 51.6 18.1 5.2 × 10⁻¹ 2.0 × 10⁰   7.1 × 10⁻¹ PA14 39 71.8 53.218.6 5.4 × 10⁻¹ 2.1 × 10⁰   7.2 × 10⁻¹ PA15 34 72.9 54.0 18.9 4.7 × 10⁻¹1.8 × 10⁰   6.3 × 10⁻¹ PA16 12 72.6 53.8 18.8 1.6 × 10⁻¹ 6.1 × 10⁻¹ 2.1× 10⁻¹ PA17 43 70.9 52.5 18.4 6.0 × 10⁻¹ 2.3 × 10⁰   8.1 × 10⁻¹ PB011323510 0.010 0.007 0.003 1.3 × 10⁸   4.4 × 10⁸   1.9 × 10⁸   PB02 0.085800.8 579.2 221.6 1.1 × 10⁻⁴ 3.8 × 10⁻⁴ 1.5 × 10⁻⁴ PB03 1193490 0.0110.008 0.003 1.1 × 10⁸   4.0 × 10⁸   1.5 × 10⁸   PB04 0.075 798.4 576.8221.6 9.4 × 10⁻⁵ 3.4 × 10⁻⁴ 1.3 × 10⁻⁴ PB05 1612200 0.010 0.007 0.0031.6 × 10⁸   5.4 × 10⁸   2.3 × 10⁸   PB06 0.087 802.0 576.8 225.2 1.1 ×10⁻⁴ 3.9 × 10⁻⁴ 1.5 × 10⁻⁴ PB07 0.085 798.4 576.8 221.6 1.1 × 10⁻⁴ 3.8 ×10⁻⁴ 1.5 × 10⁻⁴ PB08 0.087 802.0 576.8 225.2 1.1 × 10⁻⁴ 3.9 × 10⁻⁴ 1.5 ×10⁻⁴

TABLE 69 Organic solvent Container HSP distance HSP distance Void volume[% Table 1a17 Type ClogP to eicosane to eicosene Filter Type by volume]Example QA01 Isobutyl isobutyrate 2.48 5.3 3.6 UPE EP-SUS 10 ExampleQA02 Isobutyl isobutyrate 2.48 5.3 3.6 PTFE EP-SUS 10 Example QA03Isobutyl isobutyrate 2.48 5.3 3.6 Nylon EP-SUS 10 Comparative Isobutylisobutyrate 2.48 5.3 3.6 UPE EP-SUS 10 Example QB01 Comparative Isobutylisobutyrate 2.48 5.3 3.6 PTFE EP-SUS 10 Example QB02 ComparativeIsobutyl isobutyrate 2.48 5.3 3.6 Nylon EP-SUS 10 Example QB03

TABLE 70 Maximum Table 1b17 Alkane content (mass ppt) (upper columncarbon number/lower column ClogP) contained Chemical 6 10 12 14 16 18 2030 40 50 Total carbon liquid 3.9 6.0 7.0 8.1 9.2 10.2 11.3 16.6 21.927.1 amount number QA01 0 0 0 1 2 3 5 6 2 0 59 28 QA02 0 0 0 1 1 2 4 3 10 34 20 QA03 0 0 1 2 4 2 0 0 0 0 9 16 QB01 0 0 6 240 5150 106700 39500095500 4400 100 1351510 22 QB02 0 0 2 130 1620 90750 240000 93500 3400 901177320 22 QB03 0 0 65 4600 6270 1850 22 0 0 0 12840 16

TABLE 71 Alkene content (mass ppt) Table 1c17 CkH2k (upper column carbonnumber/lower column ClogP) Chemical 6 10 12 20 30 40 50 C_(n)H_(m) Totalliquid 3.4 5.5 6.6 10.8 16.1 21.4 26.7 (squalene) amount QA01 0 0 0 0 00 0 0 0 QA02 0 0 0 0 0 0 0 0 0 QA03 0 0 3 8 9 7 0 8 128 QB01 0 0 0 0 0 00 0 0 QB02 0 0 0 0 0 0 0 0 0 QB03 0 0 4300 14500 185000 73000 750 1150001375130

TABLE 72 Ratio 1 Organic Organic Ratio 2 Ratio 3 Table 1d17 componenttotal Metal component component/ Organic Organic Chemical amount TotalMetal ions Metal particles Metal component/ component/ liquid (mass ppt)(mass ppt) (mass ppt) (mass ppt) component Metal particles Metal ionsQA01 59 70.7 52.4 18.3 8.3 × 10⁻¹ 3.2 × 10⁰ 1.1 × 10⁰   QA02 34 70.552.2 18.3 4.8 × 10⁻¹ 1.9 × 10⁰ 6.5 × 10⁻¹ QA03 137 68.3 50.6 17.7 2.0 ×10⁰   7.7 × 10⁰ 2.7 × 10⁰   QB01 1351510 69.1 51.2 17.9 2.0 × 10⁴   7.5× 10⁴ 2.6 × 10⁴   QB02 1177320 70.9 52.5 18.4 1.7 × 10⁴   6.4 × 10⁴ 2.2× 10⁴   QB03 1387970 69.9 51.8 18.1 2.0 × 10⁴   7.7 × 10⁴ 2.7 × 10⁴  

TABLE 73 Organic solvent Container HSP distance to HSP distance to Voidvolume [% Table 1a18 Type ClogP eicosane eicosene Filter Type by volume]Example Methyl Malonate 0.07 12.0 10.3 UPE EP-SUS 10 RA01 Example MethylMalonate 0.07 12.0 10.3 PTFE EP-SUS 10 RA02 Example Methyl Malonate 0.0712.0 10.3 Nylon EP-SUS 10 RA03 Comparative Methyl Malonate 0.07 12.010.3 UPE EP-SUS 10 Example RB01 Comparative Methyl Malonate 0.07 12.010.3 PTFE EP-SUS 10 Example RB02 Comparative Methyl Malonate 0.07 12.010.3 Nylon EP-SUS 10 Example RB03

TABLE 74 Table Maximum 1b18 Alkane content (mass ppt) (upper columncarbon number/lower column ClogP) contained Chemical 6 10 12 14 16 18 2030 40 50 Total carbon liquid 3.9 6.0 7.0 8.1 9.2 10.2 11.3 16.6 21.927.1 amount number RA01 0 0 0 1 1 2 3 2 1 0 27 22 RA02 0 0 0 1 1 2 1 1 00 12 18 RA03 0 0 1 1 2 1 0 0 0 0 5 16 RB01 0 0 2 150 720 94500 37250020500 850 3 1133380 20 RB02 0 0 1 50 420 22750 352500 19750 250 11004470 20 RB03 0 0 2 50 730 80 0 0 0 0 862 18

TABLE 75 Alkene content (mass ppt) Table 1c18 CkH2k (upper column carbonnumber/lower column ClogP) Chemical 6 10 12 20 30 40 50 C_(n)H_(m) Totalliquid 3.4 5.5 6.6 10.8 16.1 21.4 26.7 (squalene) amount RA01 0 0 0 0 00 0 0 0 RA02 0 0 0 0 0 0 0 0 0 RA03 0 0 3 8 9 7 0 8 128 RB01 0 0 0 0 0 00 0 0 RB02 0 0 0 0 0 0 0 0 0 RB03 0 0 2500 52000 95000 65000 400 1200001187250

TABLE 76 Ratio 1 Organic Organic Ratio 2 Ratio 3 Table 1d18 componenttotal Metal component component/ Organic Organic Chemical amount TotalMetal ions Metal particles Metal component/ component/ liquid (mass ppt)(mass ppt) (mass ppt) (mass ppt) component Metal particles Metal ionsRA01 27 72.2 53.5 18.7 3.7 × 10⁻¹ 1.4 × 10⁰   5.0 × 10⁻¹ RA02 12 72.653.8 18.8 1.6 × 10⁻¹ 6.1 × 10⁻¹ 2.1 × 10⁻¹ RA03 133 73.2 54.2 19.0 1.8 ×10⁰   7.0 × 10⁰   2.4 × 10⁰   RB01 1133380 79.0 58.5 20.5 1.4 × 10⁴  5.5 × 10⁴   1.9 × 10⁴   RB02 1004470 75.3 55.8 19.5 1.3 × 10⁴   5.1 ×10⁴   1.8 × 10⁴   RB03 1188112 73.6 54.5 19.1 1.6 × 10⁴   6.2 × 10⁴  2.2 × 10⁴  

TABLE 77 Container Void Organic solvent volume HSP distance to HSPdistance to [% by Table 1a19 Type ClogP eicosane eicosene Filter Typevolume] Example SA01 Methyl Malonate:Isoamyl Ether = 5:5 1.93 7.6 5.9UPE EP-SUS 10 Example SA02 Methyl Malonate:Isoamyl Ether = 5:5 1.93 7.65.9 PTFE EP-SUS 10 Example SA03 Methyl Malonate:Isoamyl Ether = 5:5 1.937.6 5.9 Nylon EP-SUS 10 Example SA04 Methyl Malonate:Isoamyl Ether = 9:10.44 11.1 9.4 UPE EP-SUS 10 Example SA05 Methyl Malonate:Isoamyl Ether =1:9 3.41 4.3 2.7 UPE EP-SUS 10 Comparative Methyl Malonate:Isoamyl Ether= 5:5 1.93 7.6 5.9 UPE EP-SUS 10 Example SB01 Comparative MethylMalonate:Isoamyl Ether = 5:5 1.93 7.6 5.9 PTFE EP-SUS 10 Example SB02Comparative Methyl Malonate:Isoamyl Ether = 5:5 1.93 7.6 5.9 NylonEP-SUS 10 Example SB03

TABLE 78 Table Maximum 1b19 Alkane content (mass ppt) (upper columncarbon number/lower column ClogP) contained Chemical 6 10 12 14 16 18 2030 40 50 Total carbon liquid 3.9 6.0 7.0 8.1 9.2 10.2 11.3 16.6 21.927.1 amount number SA01 0 0 0 2 2 4 6 6 2 0 61 26 SA02 0 0 0 2 2 4 3 2 00 26 18 SA03 0 0 2 2 4 2 0 0 0 0 9 16 SA04 0 0 0 1 1 2 5 4 1 0 43 20SA05 0 0 0 3 3 5 7 9 3 0 88 30 SB01 0 0 5 280 2250 61000 355000 525002300 25 1225120 26 SB02 0 0 2 105 1010 54750 233750 75900 1100 201025310 20 SB03 0 0 20 1120 2510 520 5 0 0 0 4183 16

TABLE 79 Alkene content (mass ppt) Table 1c19 C_(k)H_(2k) (upper columncarbon number/lower column ClogP) Chemical 6 10 12 20 30 40 50C_(n)H_(m) Total liquid 3.4 5.5 6.6 10.8 16.1 21.4 26.7 (squalene)amount SA01 0 0 0 0 0 0 0 0 0 SA02 0 0 0 0 0 0 0 0 0 SA03 0 0 2 4 5 4 08 64 SA04 0 0 0 0 0 0 0 0 0 SA05 0 0 0 0 0 0 0 0 0 SB01 0 0 0 0 0 0 0 00 SB02 0 0 0 0 0 0 0 0 0 SB03 0 0 2550 35500 95550 71500 1400 1050001022630

TABLE 80 Ratio 1 Organic Organic Ratio 2 Ratio 3 Table 1d19 componenttotal Metal component component/ Organic Organic Chemical amount TotalMetal ions Metal particles Metal component/ component/ liquid (mass ppt)(mass ppt) (mass ppt) (mass ppt) component Metal particles Metal ionsSA01 61 72.2 53.5 18.7 8.5 × 10⁻¹ 3.3 × 10⁰ 1.1 × 10⁰   SA02 26 72.653.8 18.8 3.5 × 10⁻¹ 1.4 × 10⁰ 4.8 × 10⁻¹ SA03 73 73.2 54.2 19.0 9.9 ×10⁻¹ 3.8 × 10⁰ 1.3 × 10⁰   SA04 43 72.6 53.8 18.8 5.9 × 10⁻¹ 2.3 × 10⁰8.0 × 10⁻¹ SA05 88 73.2 54.2 19.0 1.2 × 10⁰   4.6 × 10⁰ 1.6 × 10⁰   SB011225120 79.0 58.5 20.5 1.6 × 10⁴   6.0 × 10⁴ 2.1 × 10⁴   SB02 102531075.3 55.8 19.5 1.4 × 10⁴   5.2 × 10⁴ 1.8 × 10⁴   SB03 1026813 73.6 54.519.1 1.4 × 10⁴   5.4 × 10⁴ 1.9 × 10⁴  

[Test]

The prepared chemical liquids were preserved in a container at 30° C.for 90 days and then subjected to the following tests.

[Evaluation of Coating Defect Suppressing Properties]

The defect suppressing property of the chemical liquid was evaluated bythe following method.

A bare silicon wafer having a diameter of about 300 mm was prepared, andwhile rotating the wafer at 500 rpm, 100 ml of each chemical liquid wastransferred from the container to the discharge device via pipe(manufactured by NICHIAS; liquid contact portion: stainless steel; φ:inner diameter 4.35 mm, outer diameter 6.35 mm; length: 10 m; used afterwashing by passing a washing solution obtained by distillationpurification of commercially available PGMEA therethrough), anddischarged at a discharge rated of 5 ml/s over 20 seconds. Thereafter,the wafer was rotated at 2000 rpm for 30 seconds to perform spin drytreatment.

This was used as a wafer for evaluation. Next, the number of defectswith a size of 17 nm or larger and their composition on the entiresurface of the wafer were examined using the wafer inspection device“SP-5” manufactured by KLA-Tencor and the fully automated defect reviewclassifier “SEMVision G6” manufactured by Applied Materials.

Among the measured defects, the particulate foreign matters wereclassified into “metal residue defects” containing a metal as a maincomponent and “particulate organic residue defects” containing anorganic substance as a main component, and measured. Further, defectsother than the particulate foreign matter were counted as “spotdefects”. The measurement results were evaluated according to thefollowing criteria. Furthermore, based on the total number of thesedefects, the “comprehensive evaluation” was made according to thefollowing criteria.

It can be evaluated that the fewer the coating defects are, the moreexcellent the performance is in a case where the chemical liquid is usedas a prewet solution, a developer, or a rinsing solution.

(Evaluation Criteria for Metal Residue Defects)

-   -   A: The number of defects was 20 or less per wafer.    -   B: The number of defects was 21 or more per wafer and 100 or        less per wafer.    -   C: The number of defects was 101 or more per wafer and 500 or        less per wafer.    -   D: The number of defects was 501 or more per wafer and 1000 or        less per wafer.    -   E: The number of defects was 1001 or more per wafer and 5000 or        less per wafer.    -   F: The number of defects was 5001 or more per wafer.

(Evaluation Criteria for Particulate Organic Residue Defects)

-   -   A: The number of defects was 50 or less per wafer.    -   B: The number of defects was 51 or more per wafer and 200 or        less per wafer.    -   C: The number of defects was 201 or more per wafer and 500 or        less per wafer.    -   D: The number of defects was 501 or more per wafer and 1000 or        less per wafer.    -   E: The number of defects was 1001 or more per wafer and 5000 or        less per wafer.    -   F: The number of defects was 5001 or more per wafer.

(Evaluation Criteria for Spot Defects)

-   -   A: The number of defects was 50 or less per wafer.    -   B: The number of defects was 51 or more per wafer and 200 or        less per wafer.    -   C: The number of defects was 201 or more per wafer and 500 or        less per wafer.    -   D: The number of defects was 501 or more per wafer and 1000 or        less per wafer.    -   E: The number of defects was 1001 or more per wafer and 5000 or        less per wafer.    -   F: The number of defects was 5001 or more per wafer.

(Evaluation Criteria in Comprehensive Evaluation)

-   -   A: The total number of defects of each defect was 100 or less        per wafer.    -   B: The total number of defects of each defect was 101 or more        per wafer and 500 or less per wafer.    -   C: The total number of defects of each defect was 501 or more        per wafer and 1000 or less per wafer.    -   D: The total number of defects of each defect was 1001 or more        per wafer and 5000 or less per wafer.    -   E: The total number of defects of each defect was 5001 or more        per wafer and 30000 or less per wafer.    -   F: The total number of defects of each defect was 30001 or more        per wafer.

[Evaluation for Pattern Defect Suppressing Properties]

Resist compositions of the following formulations were prepared andpatterns were made using the chemical liquid.

At this time, the chemical liquid AA01 was used as the prewet solutiondescribed later, the chemical liquid HA01 was used as the developer, andthe chemical liquid FA01 was used as the rinsing solution.

However, in the case of evaluating the performance of a chemical liquidas a prewet solution, each chemical liquid to be evaluated was used asthe prewet solution. Similarly, in the case of evaluating theperformance of a chemical liquid as a developer, each chemical liquid tobe evaluated was used as the developer. In the case of evaluating theperformance of a chemical liquid as the rinsing solution, each chemicalliquid to be evaluated was used as the rinsing solution.

In the discharge of the chemical liquid in the case of using as a prewetsolution, a developer, or a rinsing solution, the chemical liquid wastransferred from the container to the discharge port of the coatingapparatus or the like via pipe (manufactured by NICHIAS; liquid contactportion: stainless steel: φ: inner diameter 4.35 mm, outer diameter 6.35mm; length: 1 m; used after washing by passing a washing solutionobtained by distillation purification of commercially available PGMEAtherethrough).

<Resist Composition>

Resist composition 1 was obtained by mixing the components in thefollowing composition.

-   -   Resin (A-1): 0.77 g    -   Photo-acid generator (B-1): 0.03 g    -   Basic compound (E-3): 0.03 g    -   PGMEA (commercially available product, high-purity grade): 67.5        g    -   EL (commercially available product, high-purity grade): 75 g

(Resin)

The following resins were used as the resins.

Composition Ratio Resin (molar ratio) from left Mw Mw/Mn A-1

30/60/10 11,200 1.45

(Photo-Acid Generator)

The following compounds were used as the photo-acid generators.

(Basic Compound)

The following compounds were used as the basic compounds.

<Pattern Formation and Evaluation>

The residue defect suppressing property, the bridge defect suppressingproperty, and the spot defect suppressing property of the chemicalliquids were evaluated by the following methods. A coater developer“RF³⁵” manufactured by SOKUDO was used for the test.

First, AL412 (manufactured by Brewer Science) was applied on a diameterof silicon wafer of 300 mm and baked at 200° C. for 60 seconds to form aresist lower layer film having a film thickness of 20 nm. A prewetsolution was applied thereon, and a resist composition was appliedthereon and baked at 100° C. for 60 seconds (PB: Prebake) to form aresist film having a film thickness of 30 nm.

This resist film was exposed through a reflective mask using an EUVexposure machine (manufactured by ASML; NXE3350, NA0.33, Dipole 90°,outer sigma 0.87, inner sigma 0.35). Thereafter, it was heated at 85° C.for 60 seconds (PEB:Post Exposure Bake). Next, a developer was sprayedfor 30 seconds for development by a spray method, and a rinsing solutionwas discharged on a silicon wafer for 20 seconds by a spin coatingmethod for rinsing. Subsequently, the silicon wafer was rotated at arotation speed of 2000 rpm for 40 seconds to form a line-and-spacepattern having a space width of 20 nm and a pattern line width of 15 nm.

The image of the pattern was acquired, the acquired image was analyzedusing the aforementioned analyzer, the number of defects per unit areawas measured, and evaluated as “comprehensive evaluation” based on thetotal number of defects according to the following criteria.

Further, among the defects, the numbers of “PLOT defects”, which areprotruding defects, “BRIDGE defects”, which are pattern-to-patterncrosslinking-like defects, and “GEL defects”, which are film residuedefects, were measured and evaluated according to the followingcriteria.

(Evaluation Criteria in Comprehensive Evaluation)

-   -   A: The total number of defects was 50 or less per wafer.    -   B: The total number of defects was 51 or more per wafer and 200        or less per wafer.    -   C: The total number of defects was 201 or more per wafer and 500        or less per wafer.    -   D: The total number of defects was 501 or more per wafer and        1000 or less per wafer.    -   E: The total number of defects was 1001 or more per wafer and        5000 or less per wafer.    -   F: The total number of defects was 5001 or more per wafer.

(Evaluation Criteria for PLOT Defects)

-   -   A: The number of defects was 20 or less per wafer.    -   B: The number of defects was 21 or more per wafer and 50 or less        per wafer.    -   C: The number of defects was 51 or more per wafer and 100 or        less per wafer.    -   D: The number of defects was 101 or more per wafer and 500 or        less per wafer.    -   E: The number of defects was 501 or more per wafer and 1000 or        less per wafer.    -   F: The number of defects was 1001 or more per wafer.

(Evaluation Criteria for BRIDGE Defects)

-   -   A: The number of defects was 20 or less per wafer.    -   B: The number of defects was 21 or more per wafer and 50 or less        per wafer.    -   C: The number of defects was 51 or more per wafer and 100 or        less per wafer.    -   D: The number of defects was 101 or more per wafer and 500 or        less per wafer.    -   E: The number of defects was 501 or more per wafer and 1000 or        less per wafer.    -   F: The number of defects was 1001 or more per wafer.

(Evaluation Criteria for GEL Defects)

-   -   A: The number of defects was 20 or less per wafer.    -   B: The number of defects was 21 or more per wafer and 50 or less        per wafer.    -   C: The number of defects was 51 or more per wafer and 100 or        less per wafer.    -   D: The number of defects was 101 or more per wafer and 500 or        less per wafer.    -   E: The number of defects was 501 or more per wafer and 1000 or        less per wafer.    -   F: The number of defects was 1001 or more per wafer.

[Pipe Washing Performance]

1000 ml of the chemical liquid to be evaluated was passed through pipeimmediately after purchase (manufactured by NICHIAS; liquid contactportion: PFA; φ: inner diameter 4.35 mm, outer diameter 6.35 mm; length:10 m) at 100 ml/min, and the pipe was washed.

Next, the same test as the above-mentioned evaluation of the coatingdefect suppressing properties was performed except that the chemicalliquid AA01 was discharged onto the wafer through this pipe.

It can be evaluated that the better the test result of the coatingdefect suppressing properties performed as above is, the better the pipewashing performance of the chemical liquid used for washing the pipe is.

The test results are shown in Tables below.

TABLE 81 Coating defect suppressing properties Particulate organicPattern defect suppressing properties Comprehensive Metal residueresidue Comprehensive PLOT BRIDGE Table 2-1 Use evaluation defectsdefects Spot defects evaluation defects defects GEL defects Example AA01Prewet A A A A A A A A Example AA02 solution A A A A A A A A ExampleAA03 A A A A A A A A Example AA04 A A A A A A A A Example AA05 A A A A AA A A Example AA06 A A A A A A A A Example AA07 A A B A A B A A ExampleAA08 B C A A B C C A Example AA09 A A B A A B A A Example AA10 A A B A AB A A Example AA11 B C A A B C C A Example AA12 A A B A A B A A ExampleAA13 C A B C C A A C Example AA14 C A B C C A A C Example AA15 C A B C CA A C Example AA16 A A A A A A A A Example AA17 A A A A A A A A ExampleAA18 A A A A A A A A Example AA19 A A A A A A A A Example AA20 A A A A AA A A Example AA21 A A A A A A A A Example AA22 A A A A A A A AComparative F A F F F A A F Example AB01 Comparative F F A A E F F AExample AB02 Comparative F A F F F A A F Example AB03 Comparative F F AA E F F A Example AB04 Comparative F A F F F A A F Example AB05Comparative F F A A E F F A Example AB06 Comparative F F A A E F F AExample AB07 Comparative F F A A E F F A Example AB08 Comparative F F AB E F F B Example AB09

TABLE 82 Coating defect suppressing properties Particulate Metal organicPattern defect suppressing properties Comprehensive residue residueComprehensive PLOT BRIDGE Table 2-2 Use evaluation defects defects Spotdefects evaluation defects defects GEL defects Example BA01 Prewet A A AA A A A A Example BA02 solution A A A A A A A A Example BA03 A A A A A AA A Example BA04 A A A A A A A A Example BA05 A A A A A A A A ExampleBA06 A A A A A A A A Example BA07 A A B A A B A A Example BA08 B C A A BC C A Example BA09 A A B A A B A A Example BA10 A A B A A B A A ExampleBA11 B C A A B C C A Example BA12 A A B A A B A A Example BA13 D A B D DA A D Example BA14 D A B D D A A D Example BA15 D A B D D A A D ExampleBA16 A A A A A A A A Example BA17 A A A A A A A A Example BA18 A A A A AA A A Example BA19 A A A A A A A A Example BA20 A A A A A A A AComparative F A F F F A A F Example BB01 Comparative F F A A E F F AExample BB02 Comparative F A E F F A A F Example BB03 Comparative F F AA E F F A Example BB04 Comparative F A F F F A A F Example BB05Comparative F F A A E F F A Example BB06 Comparative F F A A E F F AExample BB07 Comparative F F A A E F F A Example BB08

TABLE 83 Coating defect suppressing properties Particulate Patterndefect suppressing properties Com- Metal organic Com- prehensive residueresidue Spot prehensive PLOT BRIDGE GEL Table 2-3 Use evaluation defectsdefects defects evaluation defects defects defects Example CA01 Prewet AA A A A A A A Example CA02 solution A A A A A A A A Example CA03 A A A AA A A A Example CA04 B A B A B B A A Example CA05 B C A A B C C AExample CA06 A A B A A B A A Example CA07 A A B A A B A A Example CA08 BC A A B C C A Example CA09 A A B A A B A A Example CA10 C A B C C A A CExample CA11 C A B C C A A C Example CA12 C A B C C A A C Example CA13 AA A A A A A A Example CA14 A A A A A A A A Example CA15 A A A A A A A AExample CA16 A A A A A A A A Example CA17 A A A A A A A A Comparative FA F F F A A F Example CB01 Comparative F F A A E F F A Example CB02Comparative F A E F F A A F Example CB03 Comparative F F A A E F F AExample CB04 Comparative F A F F F A A F Example CB05 Comparative F F AA E F F A Example CB06 Comparative F F A A E F F A Example CB07Comparative F F A A E F F A Example CB08

TABLE 84 Coating defect suppressing properties Particulate Patterndefect suppressing properties Com- Metal organic Com- prehensive residueresidue Spot prehensive PLOT BRIDGE GEL Table 2-4 Use evaluation defectsdefects defects evaluation defects defects defects Example DA01 solutionA A A A A A A A Example DA02 Prewet A A A A A A A A Example DA03 A A A AA A A A Example DA04 A A B A A B A A Example DA05 B C A A B C C AExample DA06 A A B A A B A A Example DA07 A A B A A B A A Example DA08 BC A A B C C A Example DA09 A A B A A B A A Example DA10 D A B D D C C BExample DA11 D A B D D C C B Example DA12 D A B D D C C C Comparative FA F F F A A F Example DB01 Comparative F F A A E F F A Example DB02Comparative F A E F F A A F Example DB03 Comparative F F A A E F F AExample DB04 Comparative F A F F F A A F Example DB05 Comparative F F AA E F F A Example DB06 Comparative F F A A E F F A Example DB07Comparative F F A A E F F A Example DB08

TABLE 85 Coating defect suppressing properties Particulate Patterndefect suppressing properties Com- Metal organic Com- prehensive residueresidue Spot prehensive PLOT BRIDGE GEL Table 2-5 Use evaluation defectsdefects defects evaluation defects defects defects Example EA01 Prewet AA A A A A A A Example EA02 solution A A A A A A A A Example EA03 A A A AA A A A Example EA04 A A A A A A A A Example EA05 A A A A A A A AExample EA06 A A A A A A A A Example EA07 A A B A A B A A Example EA08 BC A A B C C A Example EA09 A A B A A B A A Example EA10 B A B A B B A AExample EA11 B C A A B C C A Example EA12 A A B A A B A A Example EA13 CA B C C A A C Example EA14 C A B C C A A C Example EA15 C A B C C A A CExample EA16 A A A A A A A A Example EA17 A A A A A A A A Example EA18 AA A A A A A A Example EA19 A A A A A A A A Example EA20 A A A A A A A AExample EA21 A A A A A A A A Example EA22 A A A A A A A A Comparative FA F F F A A F Example EB01 Comparative F F A A E F F A Example EB02Comparative F A E F F A A F Example EB03 Comparative F F A A E F F AExample EB04 Comparative F A F F F A A F Example EB05 Comparative F F AA E F F A Example EB06 Comparative F F A A E F F A Example EB07Comparative F F A A E F F A Example EB08

TABLE 86 Coating defect suppressing properties Particulate Patterndefect suppressing properties Com- Metal organic Com- prehensive residueresidue Spot prehensive PLOT BRIDGE GEL Table 2-5′ Use evaluationdefects defects defects evaluation defects defects defects Example EA023Prewet A A A A A A A A Example EA024 solution A A A A A A A A ExampleEA025 A A A A A A A A Example EA026 A A A A A A A A Example EA027 A A AA A A A A Example EA028 A A A A A A A A Example EA029 A A A A A A A AExample EA030 A A A A A A A A Example EA031 A A A A A A A A ExampleEA032 A A A A A A A A Example EA033 A A B A A B A A Example EA034 B C AA B C C A Example EA035 A A B A A B A A Example EA036 B A B A B B A AExample EA037 B C A A B C C A Example EA038 A A B A A B A A ExampleEA039 C A B C C A A C Example EA040 C A B C C A A C Example EA041 C A BC C A A C Example EA042 A A A A A A A A Example EA043 A A A A A A A AExample EA044 A A A A A A A A Example EA045 A A A A A A A A ExampleEA046 A A A A A A A A Example EA047 A A A A A A A A Example EA048 A A AA A A A A Comparative F A F F F A A F Example EB09 Comparative F F A A EF F A Example EB10 Comparative F A E F F A A F Example EB11 ComparativeF F A A E F F A Example EB12 Comparative F A F F F A A F Example EB13Comparative F F A A E F F A Example EB14 Comparative F F A A E F F AExample EB15 Comparative F F A A E F F A Example EB16

TABLE 87 Coating defect suppressing properties Particulate Patterndefect suppressing properties Com- Metal organic Com- prehensive residueresidue Spot prehensive PLOT BRIDGE GEL Table 2-6 Use evaluation defectsdefects defects evaluation defects defects defects Example FA01 Prewet AA A A A A A A Example FA02 solution A A A A A A A A Example FA03 A A A AA A A A Example FA04 A A A A A A A A Example FA05 B C A A B C C AExample FA06 A A B A A B A A Example FA07 A A B A A B A A Example FA08 BC A A B C C A Example FA09 A A B A A B A A Example FA10 D A B E D C C BExample FA11 D A B E D C C B Example FA12 D A B E D C C C Comparative FA F F F A A F Example FB01 Comparative F F A A E F F A Example FB02Comparative F A E F F A A F Example FB03 Comparative F F A A E F F AExample FB04 Comparative F A F F F A A F Example FB05 Comparative F F AA E F F A Example FB06 Comparative F F A A E F F A Example FB07Comparative F F A A E F F A Example FB08

TABLE 88 Coating defect suppressing properties Particulate Patterndefect suppressing properties Com- Metal organic Com- prehensive residueresidue Spot prehensive PLOT BRIDGE GEL Table 2-7 Use evaluation defectsdefects defects evaluation defects defects defects Example GA01 RinsingA A A A A A A A Example GA02 solution A A A A A A A A Example GA03 A A AA A A A A Example GA04 A A A A A A A A Example GA05 B C A A B C C AExample GA06 A A B A A B A A Example GA07 A A B A A B A A Example GA08 BC A A B C C A Example GA09 A A B A A B A A Example GA10 D A B D D C C BExample GA11 D A B D D C C B Example GA12 D A B D D C C C Comparative FA F F F A A F Example GB01 Comparative F F A A E F F A Example GB02Comparative F A E F F A A F Example GB03 Comparative F F A A E F F AExample GB04 Comparative F A F F F A A F Example GB05 Comparative F F AA E F F A Example GB06 Comparative F F A A E F F A Example GB07Comparative F F A A E F F A Example GB08

TABLE 89 Coating defect suppressing properties Particulate Patterndefect suppressing properties Com- Metal organic Com- prehensive residueresidue Spot prehensive PLOT BRIDGE GEL Table 2-8 Use evaluation defectsdefects defects evaluation defects defects defects Example HA01Developer A A A A A A A A Example HA02 A A A A A A A A Example HA03 A AA A A A A A Example HA04 B A B A B B A A Example HA05 B C A A B C C AExample HA06 A A B A A B A A Example HA07 A A B A A B A A Example HA08 BC A A B C C A Example HA09 A A B A A B A A Example HA10 C A B C C A A CExample HA11 C A B C C A A C Example HA12 C A B C C A A C Example HA13 AA A A A A A A Example HA14 A A A A A A A A Example HA15 A A A A A A A AExample HA16 A A A A A A A A Example HA17 A A A A A A A A Comparative FA F F F A A F Example HB01 Comparative F F A A E F F A Example HB02Comparative F A E F F A A F Example HB03 Comparative F F A A E F F AExample HB04 Comparative F A F F F A A F Example HB05 Comparative F F AA E F F A Example HB06 Comparative F F A A E F F A Example HB07Comparative F F A A E F F A Example HB08

TABLE 2-9 Coating defect suppressing properties Comprehensive Metalresidue Particulate organic Spot Use evaluation defects residue defectsdefects Example IA01 Pipe washing A A A A Example IA02 solution A A A AExample IA03 A A A A Example IA04 A A A A Example IA05 A A A A ExampleIA06 A A A A Example IA07 A A A A Example IA08 B C A A Example IA09 A AB A Example IA10 A A A A Example IA11 B C A A Example IA12 A A B AExample IA13 C A B C Example IA14 C A B C Example IA15 C A B C ExampleIA16 A A A A Example IA17 A A A A Comparative F A F F Example IB01Comparative F F A A Example IB02 Comparative F A F F Example IB03Comparative F F A A Example IB04 Comparative F A F F Example IB05Comparative F F A A Example IB06

TABLE 2-10 Coating defect suppressing properties Comprehensive Metalresidue Particulate organic Spot Use evaluation defects residue defectsdefects Example JA01 Pipe washing A A A A Example JA02 solution A A A AExample JA03 A A A A Example JA04 A A B A Example JA05 B C A A ExampleJA06 A A B A Example JA07 B A B A Example JA08 B C A A Example JA09 A AB A Example JA10 D A B D Example JA11 D A B D Example JA12 D A B DComparative F A F F Example JB01 Comparative F F A A Example JB02Comparative F A F F Example JB03 Comparative F F A A Example JB04Comparative F A F F Example JB05 Comparative F F A A Example JB06

TABLE 2-11 Coating defect suppressing properties Comprehensive Metalresidue Particulate organic Spot Use evaluation defects residue defectsdefects Example KA01 Pipe washing B A B B Example KA02 solution B A B BExample KA03 B A B B Comparative F A D F Example KB01 Comparative F A CF Example KB02 Comparative F B D F Example KB03

TABLE 93 Coating defect suppressing properties Particulate Patterndefect suppressing properties Com- Metal organic Com- prehensive residueresidue Spot prehensive PLOT BRIDGE GEL Table 2-12 Use evaluationdefects defects defects evaluation defects defects defects Example LA01Rinsing C A B C C A B C Example LA02 solution C A B C C A B C ExampleLA03 D B C D D B C D Comparative F A E F F C E F Example LB01Comparative F A D F E B E E Example LB02 Comparative F B E F F C E FExample LB03

TABLE 94 Coating defect suppressing properties Particulate Patterndefect suppressing properties Com- Metal organic Com- prehensive residueresidue Spot prehensive PLOT BRIDGE GEL Table 2-13 Use evaluationdefects defects defects evaluation defects defects defects Example MA01Rinsing A A A A A A A A Example MA02 solution A A A A A A A A ExampleMA03 A A A B A A A B Comparative F A F F F A A F Example MB01Comparative F A E F F A A F Example MB02 Comparative F A F F F A A FExample MB03

TABLE 95 Coating defect suppressing properties Particulate Patterndefect suppressing properties Com- Metal organic Com- prehensive residueresidue Spot prehensive PLOT BRIDGE GEL Table 2-14 Use evaluationdefects defects defects evaluation defects defects defects Example NA01Rinsing C A B C C A B C Example NA02 solution C A B C C A B C ExampleNA03 B A A C D B C D Comparative F A F F F A A F Example NB01Comparative F A E F F A A F Example NB02 Comparative F A F F F A A FExample NB03

TABLE 96 Coating defect suppressing properties Particulate Patterndefect suppressing properties Com- Metal organic Com- prehensive residueresidue Spot prehensive PLOT BRIDGE GEL Table 2-15 Use evaluationdefects defects defects evaluation defects defects defects Example OA01Rinsing C A B C C A B C Example OA02 solution C A B C C A B C ExampleOA03 D B C D D B C D Comparative F A E F F C E F Example OB01Comparative F A D F E B E E Example OB02 Comparative F B E F F C E FExample OB03

TABLE 97 Coating defect suppressing properties Particulate Patterndefect suppressing properties Com- Metal organic Com- prehensive residueresidue Spot prehensive PLOT BRIDGE GEL Table 2-16 Use evaluationdefects defects defects evaluation defects defects defects Example PA01Developer A A A A A A A A Example PA02 A A A A A A A A Example PA03 A AA A A A A A Example PA04 B A B A B B A A Example PA05 B C A A B C C AExample PA06 A A B A A B A A Example PA07 B A B A B B A A Example PA08 BC A A B C C A Example PA09 A A B A A B A A Example PA10 C A B C C A A CExample PA11 C A B C C A A C Example PA12 C A B C C A A C Example PA13 AA A A A A A A Example PA14 A A A A A A A A Example PA15 A A A A A A A AExample PA16 A A A A A A A A Example PA17 A A A A A A A A Comparative FA F F F A A F Example PB01 Comparative F F A A E F F A Example PB02Comparative F A E F F A A F Example PB03 Comparative F F A A E F F AExample PB04 Comparative F A F F F A A F Example PB05 Comparative F F AA E F F A Example PB06 Comparative F F A A E F F A Example PB07Comparative F F A A E F F A Example PB08

TABLE 98 Coating defect suppressing properties Particulate Patterndefect suppressing properties Com- Metal organic Com- prehensive residueresidue Spot prehensive PLOT BRIDGE GEL Table 2-17 Use evaluationdefects defects defects evaluation defects defects defects Example QA01Rinsing A A A A A A A A Example QA02 solution A A A A A A A A ExampleQA03 A A A B A A A B Comparative F A F F F A A F Example QB01Comparative F A E F F A A F Example QB02 Comparative F A F F F A A FExample QB03

TABLE 99 Coating defect suppressing properties Particulate Patterndefect suppressing properties Com- Metal organic Com- prehensive residueresidue Spot prehensive PLOT BRIDGE GEL Table 2-18 Use evaluationdefects defects defects evaluation defects defects defects Example RA01Rinsing A A A A A A A A Example RA02 solution A A A A A A A A ExampleRA03 A A A B A A A B Comparative F A F F F A A F Example RB01Comparative F A E F F A A F Example RB02 Comparative F A F F F A A FExample RB03

TABLE 100 Coating defect suppressing properties Particulate Patterndefect suppressing properties Com- Metal organic Com- prehensive residueresidue Spot prehensive PLOT BRIDGE GEL Table 2-19 Use evaluationdefects defects defects evaluation defects defects defects Example SA01Rinsing A A A A A A A A Example SA02 solution A A A A A A A A ExampleSA03 A A A B A A A B Example SA04 B A A B C A B B Example SA05 C B B C CB B C Comparative F A F F F A A F Example SB01 Comparative F A E F F A AF Example SB02 Comparative F A F F F A A F Example SB03

From the results shown in the table, it was confirmed that the chemicalliquid of the present invention had excellent defect suppressingproperties.

It was confirmed that in a case where the content of the organiccomponent of the chemical liquid was 0.5 to 150 mass ppt (preferably 1to 60 mass ppt), the defect suppressing properties tend to be moreexcellent (results of Examples AA09 and 12 to 15, and the like).

It was confirmed that in a case where the content of the metal componentof the chemical liquid was 0.01 to 500 mass ppt (preferably 0.01 to 250mass ppt, more preferably 0.01 to 100 mass ppt), the defect suppressingproperties tend to be more excellent (results of Examples AA08 and 11,comparison of Examples CA04 and CA07, and the like).

It was confirmed that in a case where the content of metal ions in thechemical liquid was 0.01 to 400 mass ppt (preferably 0.01 to 200 massppt, more preferably 0.01 to 80 mass ppt), the defect suppressingproperties tend to be more excellent (results of Examples AA08 and 11,and the like).

It was confirmed that in a case where the content of the metal particlesin the chemical liquid is 0.01 to 400 mass ppt (preferably 0.01 to 150mass ppt, more preferably 0.01 to 40 mass ppt), the defect suppressingproperties tend to be more excellent (results of Examples AA08 and 11,and the like).

It was confirmed that in a case where the mass ratio of the content ofthe organic component to the content of the metal component of thechemical liquid is 0.05 to 2000 (preferably 0.1 to 2000), the defectsuppressing properties tend to be more excellent (comparison of ExamplesFA04 and FA07, and the like).

It was confirmed that in a case where the Hansen solubility parameterdistance to eicosene of the organic solvent of the chemical liquid was 3to 20 MPa^(0.5), the defect suppressing properties tend to be moreexcellent (results of Examples KA, LA, NA, and OA, and the like).

Further, it was confirmed that in a case where the chemical liquidcontains both an organic solvent satisfying the range of the Hansensolubility parameter and an organic solvent not satisfying the range ofthe Hansen solubility parameter, and contains the organic solventsatisfying the range of the Hansen solubility parameter in an amount of20% to 80% by mass with respect to the total mass of the chemicalliquid, and contains the organic solvent not satisfying the range of theHansen solubility parameter in an amount of 20% to 80% by mass(preferably 30% to 70% by mass) with respect to the total mass of thechemical liquid, the defect suppressing properties tend to be moreexcellent (comparison of Examples SA01 to 05, and the like).

What is claimed is:
 1. A chemical liquid comprising: a compound otherthan an alkane and an alkene; and one or more organic solvents selectedfrom the group consisting of decane and undecane, wherein the chemicalliquid further contains one or more organic components selected from thegroup consisting of alkanes having 12 to 50 carbon atoms and alkeneshaving 12 to 50 carbon atoms, and a content of the organic component is0.10 to 1,000,000 mass ppt with respect to a total mass of the chemicalliquid.
 2. The chemical liquid according to claim 1, wherein the organiccomponent contained in the chemical liquid is two or more organiccomponents.
 3. The chemical liquid according to claim 1, wherein thechemical liquid contains both one or more of the alkanes having 12 to 50carbon atoms and one or more of the alkenes having 12 to 50 carbonatoms.
 4. The chemical liquid according to claim 1, wherein the organicsolvent has a Hansen solubility parameter distance to eicosene of 3 to20 MPa^(0.5).
 5. The chemical liquid according to claim 1, wherein theorganic solvent contained in the chemical liquid has a content of anorganic solvent having a Hansen solubility parameter distance toeicosene of 3 to 20 MPa^(0.5) of 20% to 80% by mass with respect to thetotal mass of the chemical liquid, and the organic solvent contained inthe chemical liquid has a content of an organic solvent having a Hansensolubility parameter distance to eicosene of not 3 to 20 MPa^(0.5) of20% to 80% by mass with respect to the total mass of the chemicalliquid.
 6. The chemical liquid according to claim 1, wherein the organicsolvent contained in the chemical liquid is one or more organic solventsselected from the group consisting of propylene glycol monomethyl etheracetate, propylene glycol monomethyl ether, cyclohexanone, ethyllactate, propylene carbonate, isopropanol, 4-methyl-2-pentanol, butylacetate, methyl methoxypropionate, propylene glycol monoethyl ether,propylene glycol monopropyl ether, cyclopentanone, γ-butyrolactone,diisoamyl ether, isoamyl acetate, dimethyl sulfoxide,N-methylpyrrolidone, diethylene glycol, ethylene glycol, dipropyleneglycol, propylene glycol, ethylene carbonate, sulfolane, cycloheptanone,2-heptanone, butyl butyrate, isobutyl isobutyrate, pentyl propionate,isopentyl propionate, ethylcyclohexane, mesitylene, decane, undecane,3,7-dimethyl-3-octanol, 2-ethyl-1-hexanol, 1-octanol, 2-octanol, ethylacetoacetate, dimethyl malonate, methyl pyruvate, and dimethyl oxalate.7. The chemical liquid according to claim 1, wherein a content of theorganic component is 1 to 150 mass ppt with respect to the total mass ofthe chemical liquid.
 8. The chemical liquid according to claim 1,further comprising a metal component, wherein a content of the metalcomponent is 0.01 to 500 mass ppt with respect to the total mass of thechemical liquid.
 9. The chemical liquid according to claim 1, furthercomprising a metal component, wherein a mass ratio of the content of theorganic component to a content of the metal component is 0.001 to 10000.10. The chemical liquid according to claim 8, wherein a mass ratio ofthe content of the organic component to the content of the metalcomponent is 0.05 to
 2000. 11. The chemical liquid according to claim 8,wherein a mass ratio of the content of the organic component to thecontent of the metal component is 0.1 to
 100. 12. The chemical liquidaccording to claim 8, wherein the metal component contains metalparticles and metal ions.
 13. The chemical liquid according to claim 12,wherein a mass ratio of the content of the organic component to acontent of the metal particles is 0.01 to
 1000. 14. The chemical liquidaccording to claim 12, wherein a mass ratio of the content of theorganic component to a content of the metal particles is 0.1 to
 10. 15.The chemical liquid according to claim 12, wherein a mass ratio of thecontent of the organic component to a content of the metal particles is0.28 to 3.5.
 16. The chemical liquid according to claim 12, wherein amass ratio of the content of the organic component to the content of themetal ions is 0.01 to
 1000. 17. The chemical liquid according to claim12, wherein a mass ratio of the content of the organic component to thecontent of the metal ions is 0.1 to
 5. 18. The chemical liquid accordingto claim 12, wherein a mass ratio of the content of the organiccomponent to a content of the metal ions is 0.2 to 1.3.
 19. The chemicalliquid according to claim 1, wherein the organic component contained inthe chemical liquid is two or more organic components, and one or moreof the two or more organic components have a boiling point of 380° C. orhigher.
 20. The chemical liquid according to claim 1, wherein theorganic component contained in the chemical liquid is two or moreorganic components selected from the group consisting of the alkaneshaving 12 to 50 carbon atoms, and among the two or more alkanes having12 to 50 carbon atoms, any one of alkanes having 16 to 34 carbon atomshas a largest mass content.
 21. A chemical liquid storage bodycomprising: a container; and the chemical liquid according to claim 1stored in the container, wherein a liquid contact portion in contactwith the chemical liquid in the container is an electropolishedstainless steel or a fluororesin.
 22. The chemical liquid storage bodyaccording to claim 21, wherein a void volume calculated by theexpression (1) is 2% to 50% by volume:void volume={1−(volume of the chemical liquid in the container/volume ofthe container)}×100.  Expression (1):